Compact three-dimensional mask-programmed read-only memory
A compact three-dimensional mask-programmed read-only memory (3D-MPROM C ) is disclosed. Its memory array and a decoding stage thereof are formed on a same memory level above the substrate. The memory layers of the memory devices in the memory array have at least two different thicknesses, while the middle layer of the decoding device in the decoding stage has the same thickness as the thinnest memory layer.
1. A compact three-dimensional mask-programmed read-only memory (3D-MPROM C ), comprising:
a semiconductor substrate with transistors thereon;
a memory level stacked above said semiconductor substrate, said memory level comprising at least a memory array and at least an above-substrate decoding stage thereof;
at least a contact via coupling said memory level with said semiconductor substrate;
wherein said memory array comprises:
a first address-line extending from said memory array to said above-substrate decoding stage;
a second address-line intersecting said first address-line;
a memory device located at the intersection of said first and second address-lines, said memory device comprising a memory layer between said first and second address-lines, wherein the thickness of said memory layer represents digital information stored in said memory device;
said above-substrate decoding stage comprises:
a control line intersecting said first address-line, wherein said first address-line is physically continuous in said above-substrate decoding stage;
a decoding device located at the intersection of said first address-line and said control line, said decoding device comprising a middle layer between said first address-line and said control line, wherein said decoding device has a conduction mode and a blocking mode;
wherein,
said first address-line is a conductive line except for a semi-conductive portion intersecting said control line;
the memory layers of different memory devices have different thicknesses; and
said middle layer of said decoding device has the same thickness as the thinnest memory layer.
2. The memory according to claim 1 , wherein said memory device comprises a diode or a diode-like device.
3. The memory according to claim 1 , wherein said memory device is a two-terminal device.
4. The memory according to claim 1 , wherein said memory device is a mask-programmed read-only memory (mask-ROM) cell.
5. The memory according to claim 4 , wherein said mask-ROM cell stores more than one bit.
6. The memory according to claim 1 , wherein said decoding device comprises a transistor or a transistor-like device.
7. The memory according to claim 1 , wherein said decoding device is a three-terminal device.
8. The memory according to claim 1 , wherein said decoding device comprises a pass-transistor.
9. The memory according to claim 1 , wherein said decoding device comprises a MOSFET.
10. The memory according to claim 1 , wherein said decoding device is positioned between said memory device and said contact via.
11. A compact three-dimensional mask-programmed read-only memory (3D-MPROM C ), comprising:
a semiconductor substrate with transistors thereon;
a memory level stacked above said semiconductor substrate, said memory level comprising at least a memory array and at least an above-substrate decoding stage thereof;
at least a contact via coupling said memory level with said semiconductor substrate;
wherein said memory array comprises:
an x-line extending from said memory array to said above-substrate decoding stage;
first and second y-lines intersecting said x-line;
a first memory device located at the intersection of said x-line and said first y-line, said first memory device comprising a first memory layer between said x-line and said first y-line;
a second memory device located at the intersection of said x-line and said second y-line, said second memory device comprising a second memory layer between said x-line and said second y-line;
wherein said first memory layer is thinner than said second memory layer;
said above-substrate decoding stage comprises:
a control line (c-line) intersecting said x-line, wherein said x-line is physically continuous in said above-substrate decoding stage;
a decoding device located at the intersection of said x-line and said c-line, said decoding device comprising a middle layer between said x-line and said c-line, wherein said decoding device has a conduction mode and a blocking mode;
wherein,
said x-line is a conductive line except for a semi-conductive portion intersecting said c-line; and
said middle layer in said decoding device has the same thickness as said first memory layer.
12. The memory according to claim 11 , wherein said memory device comprises a diode or a diode-like device.
13. The memory according to claim 11 , wherein said memory device is a two-terminal device.
14. The memory according to claim 11 , wherein said memory device is a mask-programmed read-only memory (mask-ROM) cell.
15. The memory according to claim 14 , wherein said mask-ROM cell stores more than one bit.
16. The memory according to claim 11 , wherein said decoding device comprises a transistor or a transistor-like device.
17. The memory according to claim 11 , wherein said decoding device is a three-terminal device.
18. The memory according to claim 11 , wherein said decoding device comprises a pass-transistor.
19. The memory according to claim 11 , wherein said decoding device comprises a MOSFET.
20. The memory according to claim 11 , wherein said decoding device is positioned between said memory device and said contact via.