Method for manufacturing organic processing fluid for patterning of chemical amplification type resist film, organic processing fluid for patterning of chemical amplification type resist film, pattern forming method, method for manufacturing electronic device, and electronic device
There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|T I −T o |) of a difference between a temperature (T I ) of the fluid in the fluid input portion and a temperature (T o ) of the fluid in the fluid output portion is 3° C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/m 2 or greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.
1. A method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, the method comprising:
a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a series of filtration filter films provided in a flow path that connects the fluid input portion and the fluid output portion with each other, the filtration filter films being mounted with a heat insulation equipment respectively,
wherein an absolute value (|T I −T o |) of a difference between a temperature (T I ) of the fluid in a fluid input portion of a first filtration filter film of the series of filtration filter films and a temperature (T o ) of the fluid in a fluid output portion of a last filtration filter film of the series of filtration filter films is 3° C. or lower,
a filtration speed of the fluid in the filtration device is 0.5 L/min/m 2 or greater, and
a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.
2. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the organic processing fluid is an organic developer.
3. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 2 ,
wherein the fluid containing the organic solvent is butyl acetate.
4. A pattern forming method, comprising:
(A) a step of forming a film with a chemical amplification type resist composition;
(B) a step of exposing the film; and
(C) a step of developing the exposed film by using an organic developer,
wherein the organic developer is an organic developer manufactured by the method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 2 .
5. The pattern forming method according to claim 4 , further comprising:
a step of washing the exposed film by using an organic rinse fluid after the step of developing the exposed film by using the organic developer,
wherein the organic rinse fluid is an organic rinse fluid manufactured by a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, the method comprising:
a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a series of filtration filter films provided in a flow path that connects the fluid input portion and the fluid output portion with each other, the filtration filter films being mounted with a heat insulation equipment respectively,
wherein an absolute value (|T I −T o |) of a difference between a temperature (T I ) of the fluid in a fluid input portion of a first filtration filter film of the series of filtration filter films and a temperature (T o ) of the fluid in a fluid output portion of a last filtration filter film of the series of filtration filter films is 3° C. or lower,
a filtration speed of the fluid in the filtration device is 0.5 L/min/m 2 or greater, and
a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower,
wherein the organic processing fluid is an organic rinse fluid.
6. The pattern forming method according to claim 5 ,
wherein the organic developer is an organic developer manufactured by a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, the method comprising:
a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a series of filtration filter films provided in a flow path that connects the fluid input portion and the fluid output portion with each other, the filtration filter films being mounted with a heat insulation equipment respectively,
wherein an absolute value (|T I −T o |) of a difference between a temperature (T I ) of the fluid in a fluid input portion of a first filtration filter film of the series of filtration filter films and a temperature (T o ) of the fluid in a fluid output portion of a last filtration filter film of the series of filtration filter films is 3° C. or lower,
a filtration speed of the fluid in the filtration device is 0.5 L/min/m 2 or greater, and
a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower,
wherein the organic processing fluid is an organic developer,
the fluid containing the organic solvent is butyl acetate,
wherein
the organic rinse fluid is an organic rinse fluid manufactured by a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, the method comprising:
a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a series of filtration filter films provided in a flow path that connects the fluid input portion and the fluid output portion with each other, the filtration filter films being mounted with a heat insulation equipment respectively,
wherein an absolute value (|T I −T o |) of a difference between a temperature (T I ) of the fluid in a fluid input portion of a first filtration filter film of the series of filtration filter films and a temperature (T o ) of the fluid in a fluid output portion of a last filtration filter film of the series of filtration filter films is 3° C. or lower,
a filtration speed of the fluid in the filtration device is 0.5 L/min/m 2 or greater, and
a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower,
wherein the organic processing fluid is an organic rinse fluid,
the fluid containing the organic solvent is 4-methyl-2-pentanol or butyl acetate.
7. The pattern forming method according to claim 4 ,
wherein the step of developing the film by using the organic developer is a step of developing a film by using a developing device with a filter for the processing fluid, and
the organic developer is used for development by being passed through the filter for the processing fluid.
8. A method for manufacturing an electronic device, comprising:
the pattern forming method according to claim 4 .
9. An electronic device manufactured by the method for manufacturing an electronic device according to claim 8 .
10. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the organic processing fluid is an organic rinse fluid.
11. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 10 ,
wherein the fluid containing the organic solvent is 4-methyl-2-pentanol or butyl acetate.
12. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the filtration filter films are polyethylene resin films, fluorine resin films, or polyimide resin films, of which a pore size is 50 nm or lower.
13. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the temperature (T I ) of the fluid in the fluid input portion is in a range of 20° C. to 30° C.
14. An organic processing fluid for patterning of a chemical amplification type resist film, which is manufactured by the method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 .
15. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the filtration filter films are made of fluorine resin.
16. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the organic solvent is selected from the group consisting of a ketone-based solvent, an ester-based solvent, and an alcohol-based solvent.
17. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the series of filtration filter films are two or three filtration filter films used in series.
18. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the heat insulation equipment is a heater or a water jacket.
19. The method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film according to claim 1 ,
wherein the filtration filter films are provided in filter housings respectively, and
the filter housings are set to the same temperature.