Chelating base product for use in water-based system treatments
A base product fluid is produced by adding anhydrous liquid ammonia and a first portion of sulfuric acid to water in a process line to form a mixed fluid. The mixed fluid may be cooled and a second portion of sulfuric acid may be added to the mixed fluid to form the base product fluid. The base product fluid may include a molecular compound that is a chelating compound. The molecular compound may have the formula: ((NH 4 ) 2 SO 4 ) a .(H 2 SO 4 ) b .(H 2 O) c .(NH 4 HSO 4 ) x . In the formula, a may be between 1 and 5, b may be between 1 and 5, c may be between 0 and 5, and x may be between 1 and 20.
1. A chelating compound having the formula:
((NH 4 ) 2 SO 4 ) a .(H 2 SO 4 ) b .(H 2 O) c .(NH 4 HSO 4 ) x ;
wherein a is between 1 and 5, b is between 1 and 5, c is between 0 and 5, and x is between 1 and 20.
2. The chelating compound of claim 1 , wherein the chelating compound is crystalline.
3. The chelating compound of claim 1 , wherein the chelating compound is hydroscopic.
4. The chelating compound of claim 1 , wherein the chelating compound is capable of chelating a metal salt.
5. The chelating compound of claim 4 , wherein the metal salt comprises a salt of zinc, magnesium, manganese, selenium, molybdenum, iron, boron, cobalt, copper, bismuth, or combinations thereof.
6. The chelating compound of claim 1 , wherein the chelating compound has a pH below about 2 when mixed with water.
7. The chelating compound of claim 1 , wherein the nitrogen atoms in the chelating compound have an oxidation state of −3.
8. The chelating compound of claim 1 , wherein the sulfur atoms in the chelating compound have an oxidation state of +6.
9. A chelating compound having the formula:
((NH 4 ) 2 SO 4 ) a .(H 2 SO 4 ) b .(H 2 O) c .(NH 4 HSO 4 ) x ;
wherein a is at least 1, b is at least 1, c is at least 0, and x is between 1 and 20; and
wherein the chelating compound comprises an elemental composition of:
between about 3% and 6% hydrogen;
between about 10% and about 15% nitrogen;
between about 25% and about 30% sulfur; and
between about 52% and about 60% oxygen.
10. The chelating compound of claim 9 , wherein the chelating compound is crystalline.
11. The chelating compound of claim 9 , wherein a is between 1 and 5, b is between 1 and 5, c is between 0 and 5, and x is between 1 and 20.
12. The chelating compound of claim 9 , wherein the chelating compound is hydroscopic.
13. The chelating compound of claim 9 , wherein the chelating compound is capable of chelating a metal salt.
14. The chelating compound of claim 13 , wherein the metal salt comprises a salt of zinc, magnesium, manganese, selenium, molybdenum, iron, boron, cobalt, copper, bismuth, or combinations thereof.
15. The chelating compound of claim 9 , wherein the chelating compound has a pH below about 2 when mixed with water.
16. The chelating compound of claim 9 , wherein the nitrogen atoms in the chelating compound have an oxidation state of −3.
17. The chelating compound of claim 9 , wherein the sulfur atoms in the chelating compound have an oxidation state of +6.
18. A chelating compound having the formula:
((NH 4 ) 2 SO 4 ) a .(H 2 SO 4 ) b .(H 2 O) c .(NH 4 HSO 4 ) x ;
wherein a is at least 1, b is at least 1, c is at least 0, and x is between 1 and 20; and
wherein the chelating compound has a pH below about 2 when mixed with water.