Fabrication process and structure of fine pitch traces for a solid state diffusion bond on flip chip interconnect

1. A semiconductor package comprising:

a flexible substrate;

a plurality of traces formed on said flexible substrate, each respective trace comprising at least five different conductive materials having different melting points and plastic deformation properties, which are optimized for both diffusion bonding and soldering of passive components wherein a topmost layer of each said trace comprises gold; and

at least one die mounted on said substrate wherein there is a diffusion bond between at least one of said plurality of traces and said at least one die.

2. The semiconductor package according to claim 1 , wherein said diffusion bond is via a gold plated bump or a gold stud bump on said die.

3. The package according to claim 1 , wherein said topmost layer of each said trace comprises gold having a purity of about 99.9%, a hardness of about 100 HV, and a thickness of between about 0.03 μm and 0.1 μm.

4. The semiconductor package according to claim 3 , wherein a second layer of each of said traces next closest to said diffusion bond comprises palladium, having a purity of more than 98% with 1-2% phosphorus added, a hardness of between about 400 and 450 HV, and a thickness of between about 0.05 μm and 0.4 μm.

5. The semiconductor package according to claim 4 , wherein a third layer of each of said traces comprises nickel having a purity of more than about 90% with 8-10% phosphorus, a hardness of about 500 HV, and a thickness of between about 0.5 μm and 5 μm.

6. The semiconductor package according to claim 5 , wherein a fourth layer of each of said traces comprises copper having a purity of more than 99.9%, a hardness of about 100 HV, and a thickness of between about 2 μm and 12 μm.

7. The semiconductor package according to claim 6 , wherein an underlying layer of each of said traces on said substrate comprises nickel-phosphorus having a thickness of between about 0.09 μm and 0.11 μm.

8. The semiconductor package according to claim 1 wherein said flexible substrate comprises at least one metal layer and a dielectric material comprising polyimide (PI), liquid crystal polymer (LCP), Polyester (PET), polyethylene-naphthalate (PEN), poly tetra fluoro ethylene, or a laminate substrate comprising epoxies and BT, or Teflon or modified Teflon.

9. The semiconductor package according to claim 1 wherein said semiconductor package is incorporated into at least one of: a smart phone device, a tablet, a laptop, UHD TV, s desktop computer, a game system, an electronic setup box, a server, a motor vehicle, an ultrasonic handler, a medical device, a CT scanner, a communications device, a fixed location data unit, a wearable electronic device, a display driver, a CMOS image sensor, a baseband processor, a power management unit, a memory, a CPU, a GPU, an ASIC, a LED, and a RF device.

10. A semiconductor package comprising:

a flexible substrate;

a plurality of traces formed on said flexible substrate, each trace comprising:

a first nickel-phosphorus layer on said flexible substrate;

a copper layer on said first nickel-phosphorus layer;

a second nickel-phosphorus layer on top and side surfaces of said copper layer;

a palladium layer on said second nickel-phosphorus layer; and

a gold layer on said palladium layer; and

at least one die mounted on said substrate wherein there is a diffusion bond between said gold layer of said at least one of said plurality of traces and said at least one die.

11. The semiconductor package according to claim 10 , wherein said diffusion bond is via a gold plated bump or a gold stud bump on said die.