Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof

1. A process of production of a nanopatterned and/or nanoprocessed substrate article by use of nanoimprint lithography processes comprising of the following steps:

a. providing a substrate suitable for nanoimprint lithography processes,

b. applying a suitable amount of a resist composition comprising a perfluoropolyether (PFPE)-based reactive copolymer, a suitable reactive diluent, and a suitable polymerization initiator on at least part of a surface of the substrate provided in step a) to form a layer having a thickness below 1 μm, wherein the weight ratio of the PFPE-based reactive copolymer in the resist composition is within 20 to 95 wt. %,

c. providing a stamp suitable for nanoimprint lithography processes and imprinting the resist composition applied to the substrate in step b) with the stamp to generate a negative copy of the stamp topography on the resist,

d. releasing the stamp to set free an imprinted resist article on the substrate and

e. subsequently using at least a part of the imprinted resist article as an etch mask to produce a nanopatterned substrate article comprising at least part of a positive copy of the topography of the imprinted resist article and/or

f. subsequently etching a part of the imprinted resist article and using the partly etched imprinted resist article as a deposition mask to deposit a further material to the substrate to produce a heterogeneous nanoprocessed substrate article.

2. The process according to claim 1 , wherein the weight ratio of the PFPE-based reactive copolymer is within 35 to 95 wt. %.

3. The process according to claim 1 , wherein the weight ratio of the PFPE-based reactive copolymer is within 35 to 50 wt. %.

4. A nanopatterned and/or nanoprocessed substrate article produced by a nanoimprint lithography process according to claim 1 .

5. A device comprising a nanopatterned and/or nanoprocessed substrate article according to claim 4 , wherein the device is selected from the group consisting of integrated circuits (IC), integrated optics, nanophotonic devices, photovoltaic devices, bit-patterned media, displays, diodes, (bio)sensors, and lab-on-chip devices.

6. The device according to claim 5 , wherein the photovoltaic device is a solar cell.

7. The device according to claim 5 , wherein the display is a TFT-display.

8. The device according to claim 5 , wherein the diode is a light emitting diode (LED) or organic light emitting diode (OLED).