Substrate processing apparatus, transfer method, and susceptor

1. A substrate processing apparatus comprising:

a processing chamber;

a susceptor capable of supporting a substrate in the processing chamber, the susceptor including a first member having an opening in a central portion, and a second member covering the opening;

a support configured to support and rotate the susceptor in the processing chamber; and

a lift disposed in the support, and capable of moving up and down at least one of the first member and the second member, wherein the support is capable of rotating the susceptor to have predefined phases with respect to the lift,

when the lift moves up, the lift is brought into contact with the first member if the susceptor is in a first phase, and the lift is brought into contact with the second member if the susceptor is in a second phase that is different from the first phase,

the lift includes protrusions that are brought into contact with the first member or the second member when the lift moves up,

a circle passing through points in each of the protrusions includes first arcs overlapping the first member and second arcs overlapping the second member,

when the susceptor rotates relative to the lift, the protrusions alternately pass through portions below the first arcs and portions below the second arcs,

a shape formed by connecting apexes of the protrusions is substantially similar to a shape of the opening, and smaller than the opening,

the number of protrusions is three, and

the opening has a substantially triangular shape.

2. The apparatus according to claim 1 , wherein when the susceptor is in the first phase, the lift moves up or down the first member, or the first member together with the second member, and

when the susceptor is in the second phase, the lift moves up or down the second member.

3. The apparatus according to claim 1 , wherein:

the protrusions extend in a first direction substantially perpendicular to a substrate mounting surface of the susceptor and are disposed to be rotationally symmetric around a rotational center of the susceptor; and

the lift moves up at least one of the first member and the second member by the protrusions parts by moving the protrusions in the first direction.

4. The apparatus according to claim 1 , wherein:

when the protrusions are below the first arcs, the protrusions are brought into contact with the first member without being in contact with the second member; and

when the protrusions are below the second arcs, the protrusions are brought into contact with the second member without being in contact with the first member.

5. A susceptor capable of supporting a substrate in a processing chamber of a substrate processing apparatus, the susceptor comprising:

a first member having an opening in a central portion; and

a second member covering the opening,

wherein a circle having a predefined diameter, a center of which is a rotational center of the susceptor, overlaps the first member in a first phase, and the second member in a second phase that is different from the first phase,

the substrate processing apparatus comprises:

the processing chamber;

a support configured to support and rotate the susceptor in the processing chamber; and

a lift disposed in the support, and capable of moving up and down at least one of the first member and the second member,

the support is capable of rotating the susceptor to have predefined phases with respect to the lift,

when the lift moves up, the lift is brought into contact with the first member if the susceptor is in a first phase, and the lift is brought into contact with the second member if the susceptor is in a second phase that is different from the first phase,

the lift includes protrusions that are brought into contact with the first member or the second member when the lift moves up,

the circle passing through points in each of the protrusions includes first arcs overlapping the first member and second arcs overlapping the second member,

when the susceptor rotates relative to the lift, the protrusions alternately pass through portions below the first arcs and portions below the second arcs,

a shape formed by connecting apexes of the protrusions is substantially similar to a shape of the opening, and smaller than the opening,

the number of protrusions is three, and

the opening has a substantially triangular shape.

6. The susceptor according to claim 5 , wherein when a lift moves up the susceptor from below first arcs of the circle overlapping the first member, both the first member and the second member are moved up, and

when the lift moves up the susceptor from below second arcs of the circle overlapping the first member, the second member is lifted from the first member.

7. The susceptor according to claim 5 , wherein the second member has a shape substantially similar to a shape of the opening.

8. The susceptor according to claim 7 , wherein shapes of the second member and the opening are substantially triangular.

9. A transfer method for transferring a substrate to be placed and processed on a susceptor in a processing chamber of a substrate processing apparatus, the susceptor including a first member having an opening in a central portion and a second member covering the opening, and being supported by a support, the transfer method comprising:

transferring the susceptor into the processing chamber to have a first phase with respect to a lift disposed in the support, moving up the lift to place the susceptor on the lift, and lowering the lift to place the susceptor on the support;

rotating the susceptor to have a second phase relative to the lift, the second phase being different from the first phase; and

after transferring the substrate into the processing chamber, moving up the second member together with the lift to place the substrate on the second member, and lowering the lift to place the substrate and the second member on the first member,

wherein the substrate processing apparatus comprises:

the processing chamber;

the susceptor capable of supporting the substrate in the processing chamber;

the support configured to support and rotate the susceptor in the processing chamber; and

the lift disposed in the support, and capable of moving up and down at least one of the first member and the second member,

the support is capable of rotating the susceptor to have predefined phases with respect to the lift,

when the lift moves up, the lift is brought into contact with the first member if the susceptor is in a first phase, and the lift is brought into contact with the second member if the susceptor is in a second phase that is different from the first phase,

the lift includes protrusions that are brought into contact with the first member or the second member when the lift moves up,

a circle passing through points in each of the protrusions includes first arcs overlapping the first member and second arcs overlapping the second member,

when the susceptor rotates relative to the lift, the protrusions alternately pass through portions below the first arcs and portions below the second arcs,

a shape formed by connecting apexes of the protrusions is substantially similar to a shape of the opening, and smaller than the opening,

the number of protrusions is three, and

the opening has a substantially triangular shape.

10. The method according to claim 9 , wherein:

when the susceptor is transferred, the lift moves up both the first member and the second member from the support; and

when the substrate is transferred, the lift moves up the second member together with the substrate from the first member and the support.