IP Library › Granted Patent US 10,168,842
Granted Patent B2
US 10,168,842 · App. 15/114,591 · Granted Jan 1, 2019

Conductive substrate, conductive substrate laminate, method for producing conductive substrate, and method for producing conductive substrate laminate

Inventors: Hiroki Hata (Niihama, JP); Daiki Shiga (Niihama, JP); Takahiro Suda (Niihama, JP); Yoshihide Nishiyama (Niihama, JP)
Assignee: SUMITOMO METAL MINING CO., LTD.
G06F3/044C22C19/03C22C19/05C22C19/058C23C18/54C23C22/68C23C28/32C23C28/345C23C28/40H05K1/0274H05K1/144H05K3/06H05K3/4611C25D3/38C25D5/48G06F2203/04103G06F2203/04112
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Quick Facts
Patent No.
US 10,168,842
App. No.
15/114,591
Granted
Jan 1, 2019
Kind
B2
Abstract

A conductive substrate includes a transparent base material; a metal layer formed on at least one of surfaces of the transparent base material; and a blackened layer formed on the metal layer by a wet method.

Claims (20)

1. A conductive substrate, comprising:

a transparent base material;

an adhesion layer; wherein the adhesive layer comprises an Ni—Cu alloy and oxygen, and a first surface of the adhesion layer formed on at least one of surfaces of the transparent base material;

a metal layer; wherein a first surface of the metal layer formed on a second surface of the adhesion layer;

a blackened layer formed on a second surface of the metal layer by a wet method.

2. The conductive substrate as claimed in claim 1 , wherein the metal layer and the blackened layer have patterns formed.

3. A conductive substrate laminate, comprising:

a plurality of the conductive substrates as claimed in claim 1 that are stacked.

4. A method for producing a conductive substrate, the method comprising:

a metal layer forming process for forming a metal layer on at least one of surfaces of a transparent base material;

a blackened layer forming process for forming a blackened layer on the metal layer by a wet method; and

an adhesion layer forming process for forming an adhesion layer on at least one of the surfaces of the transparent base material, by dry plating, and formed between the transparent base material and the metal layer, wherein the adhesive layer comprises an Ni—Cu alloy and oxygen.

5. The method for producing the conductive substrate as claimed in claim 4 , the method further comprising:

a patterning process for forming patterns on the metal layer and the blackened layer.

6. A method for producing a conductive substrate laminate, the method comprising:

a stacking process for stacking a plurality of the conductive substrates that have been obtained by the method for producing the conductive substrate as claimed in claim 4 .

7. A conductive substrate laminate, comprising:

a plurality of the conductive substrates as claimed in claim 2 that are stacked.

8. A method for producing a conductive substrate laminate, the method comprising:

a stacking process for stacking a plurality of the conductive substrates that have been obtained by the method for producing the conductive substrate as claimed in claim 5 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2016
From: HATA, HIROKI; SHIGA, DAIKI; SUDA, TAKAHIRO; NISHIYAMA, YOSHIHIDE
To: SUMITOMO METAL MINING CO., LTD.
Reel/Frame 039271/0486 →
Priority Claims (2)
JP 2014-017974 · Jan 31, 2014 · national
JP 2014-176208 · Aug 29, 2014 · national
Continuity (1)
Related Publication 20160342242A1 · Nov 24, 2016