High-voltage transistor having shielding gate
A semiconductor device includes a plurality of high-voltage insulated-gate field-effect transistors arranged in a matrix form on the main surface of a semiconductor substrate and each having a gate electrode, a gate electrode contact formed on the gate electrode, and a wiring layer which is formed on the gate electrode contacts adjacent in a gate-width direction to electrically connect the gate electrodes arranged in the gate-width direction. And the device includes shielding gates provided on portions of an element isolation region which lie between the transistors adjacent in the gate-width direction and gate-length direction and used to apply reference potential or potential of a polarity different from that of potential applied to the gate of the transistor to turn on the current path of the transistor to the element isolation region.
1. A semiconductor device comprising:
first, second, third, and fourth high-voltage transistors arranged on a main surface of a semiconductor substrate, the first and second high-voltage transistors being adjacent each other in a gate-width direction, the third and fourth high-voltage transistors being adjacent each other in the gate-width direction, the first and third high-voltage transistors being adjacent each other in a gate-length direction, the second and fourth high-voltage transistors being adjacent each other in the gate-length direction, and each of the transistors having a gate electrode, and a gate electrode contact formed on the gate electrode; and
a conductive line provided on a portion of an element isolation region, the conductive line positioned between the first and third transistors and between the second and fourth transistors,
wherein the gate electrode contact is formed on a fringe portion formed by extending an end portion of the gate electrode onto the element isolation region in the gate-width direction.
2. The semiconductor device according to claim 1 , wherein the conductive line is positioned only between the first and third transistors and between the second and fourth transistors.
3. The semiconductor device according to claim 1 , wherein the first, second, third, and fourth high-voltage transistors are provided in a core portion of a row decoder formed near a memory cell array.
4. The semiconductor device according to claim 3 , wherein the memory cell array includes first, second, third, and fourth memory cell transistors, each of the memory cell transistors has a laminated structure including a floating electrode, a gate-gate insulating film formed on the floating electrode, and a control electrode formed on the gate-gate insulating film, and the first, second, third, and fourth high-voltage transistors are configured to supply program voltages to the control electrodes of the first, second, third, and fourth memory cell transistors, respectively.
5. The semiconductor device according to claim 1 , wherein a length of the gate electrode in the gate-length direction is longer than a length of the conductive line in the gate-length direction.
6. A semiconductor device comprising:
first, second, third, and fourth high-voltage transistors arranged on a main surface of a semiconductor substrate, the first and second high-voltage transistors being adjacent each other in a gate-width direction, the third and fourth high-voltage transistors being adjacent each other in the gate-width direction, the first and third high-voltage transistors being adjacent each other in a gate-length direction, the second and fourth high-voltage transistors being adjacent each other in the gate-length direction, and each of the transistors having a first gate electrode, a second gate electrode formed on the first gate electrode and extending onto an element isolation region, and a gate electrode contact formed on the second gate electrode; and
a conductive line provided on a portion of the element isolation region, the conductive line positioned between the first and third transistors and between the second and fourth transistors, the second gate electrode on the element isolation region and the conductive line substantially being provided at the same height.
7. The semiconductor device according to claim 6 , wherein the conductive line is positioned only between the first and third transistors and between the second and fourth transistors.
8. The semiconductor device according to claim 6 , wherein the second gate electrode contact is formed on a fringe portion formed by extending an end portion of the second gate electrode onto the element isolation region in the gate-width direction.
9. The semiconductor device according to claim 6 , wherein plural of the gate electrode contacts are formed on each gate electrode.
10. The semiconductor device according to claim 6 , wherein the first, second, third, and fourth high-voltage transistors are provided in a core portion of a row decoder formed near a memory cell array.
11. The semiconductor device according to claim 10 , wherein the memory cell array includes first, second, third, and fourth memory cell transistors, each of the memory cell transistors has a laminated structure including a floating electrode, a gate-gate insulating film formed on the floating electrode, and a control electrode formed on the gate-gate insulating film, and the first, second, third, and fourth high-voltage transistors are configured to supply program voltages to the control electrodes of the first, second, third, and fourth memory cell transistors, respectively.
12. The semiconductor device according to claim 6 , wherein a length of the second gate electrode in the gate-length direction is longer than a length of the conductive line in the gate-length direction.
13. The semiconductor device according to claim 6 , wherein the gate electrode contact is positioned above an active area surrounded by the element isolation region.
14. A semiconductor device comprising:
first, second, third, and fourth high-voltage transistors arranged on a main surface of a semiconductor substrate, the first and second high-voltage transistors being adjacent each other in a gate-width direction, the third and fourth high-voltage transistors being adjacent each other in the gate-width direction, the first and third high-voltage transistors being adjacent each other in a gate-length direction, the second and fourth high-voltage transistors being adjacent each other in the gate-length direction, and each of the transistors having a first gate electrode, a second gate electrode formed on the first gate electrode and extending onto an element isolation region, and a gate electrode contact formed on the second gate electrode; and
a conductive line provided on a portion of the element isolation region, the conductive line positioned between the first and third transistors and between the second and fourth transistors, the second gate electrode on the element isolation region and the conductive line substantially being made of the same material.
15. The semiconductor device according to claim 14 , wherein the conductive line is positioned only between the first and third transistors and between the second and fourth transistors.
16. The semiconductor device according to claim 14 , wherein the gate electrode contact is formed on a fringe portion formed by extending an end portion of the second gate electrode onto the element isolation region in the gate-width direction.
17. The semiconductor device according to claim 14 , wherein plural of the gate electrode contacts are formed on each gate electrode.