Semiconductor device including insulating films with different thicknesses and method for manufacturing the semiconductor device
In a semiconductor device including an oxide semiconductor, the amount of oxygen vacancies is reduced. Moreover, electrical characteristics of a semiconductor device including an oxide semiconductor are improved. The semiconductor device includes a transistor including a gate electrode over a substrate, a gate insulating film covering the gate electrode, an oxide semiconductor film overlapping with the gate electrode with the gate insulating film provided therebetween, and a pair of electrodes in contact with the oxide semiconductor film; and over the transistor, a first insulating film covering the gate insulating film, the oxide semiconductor film, and the pair of electrodes; and a second insulating film covering the first insulating film. An etching rate of the first insulating film is lower than or equal to 10 nm/min and lower than an etching rate of the second insulating film when etching is performed at 25° C. with 0.5 weight % of hydrofluoric acid.
1. A method for manufacturing a semiconductor device, comprising:
forming an oxide semiconductor film over a substrate;
forming a first oxide insulating film over and in contact with the oxide semiconductor film, in an apparatus and by chemical vapor deposition in a first atmosphere, and with a first radio-frequency power supplied to an electrode of the apparatus; and
forming a second oxide insulating film over and in contact with the first oxide insulating film, in the apparatus and by chemical vapor deposition in a second atmosphere, and with a second radio-frequency power supplied to the electrode of the apparatus,
wherein the first radio-frequency power is lower than the second radio-frequency power,
wherein the first oxide insulating film is formed thinner than the second oxide insulating film, and a thickness of the first oxide insulating film is less than or equal to 50 nm, and
wherein spin densities of the first oxide insulating film measured by electron spin resonance are less than or equal to a lower limit of detection at a g-factor of 2.001.
2. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the first oxide insulating film is formed at a first temperature,
wherein the second oxide insulating film is formed in a second temperature, and
wherein the first temperature is higher than the second temperature.
3. The method for manufacturing a semiconductor device according to claim 1 ,
wherein an etching rate of the first oxide insulating film is lower than or equal to 10 nm/min and lower than an etching rate of the second oxide insulating film when etching is performed at 25° C. with a solution of 0.5 weight % of hydrofluoric acid.
4. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the second oxide insulating film is formed so as to contain oxygen at a higher proportion than a stoichiometric composition.
5. The method for manufacturing a semiconductor device according to claim 1 , further comprising stacking a silicon nitride film on the second oxide insulating film.
6. The method for manufacturing a semiconductor device according to claim 1 ,
wherein a threshold voltage of a transistor including the oxide semiconductor film changes in a positive direction by a bias-temperature stress test,
wherein an amount of change is less than or equal to 3.0V, and
wherein the bias-temperature stress test is performed when a temperature of the substrate is 80° C., an intensity of an electric field applied to a gate insulating film of the transistor is 1.28 MV/cm, and a performance time is 2000 seconds.
7. A method for manufacturing a semiconductor device, comprising:
forming an oxide semiconductor film over a substrate;
forming a first oxide insulating film over and in contact with the oxide semiconductor film, in an apparatus and by chemical vapor deposition in a first atmosphere, and with a first radio-frequency power supplied to an electrode of the apparatus; and
forming a second oxide insulating film over and in contact with the first oxide insulating film, in the apparatus and by chemical vapor deposition in a second atmosphere, and with a second radio-frequency power supplied to the electrode of the apparatus,
wherein the first radio-frequency power is lower than the second radio-frequency power,
wherein the first oxide insulating film is formed thinner than the second oxide insulating film, and a thickness of the first oxide insulating film is less than or equal to 50 nm,
wherein spin densities of the first oxide insulating film measured by electron spin resonance are less than or equal to a lower limit of detection at a q-factor of 2.001, and
wherein the first oxide insulating film and the second oxide insulating film are a first silicon oxynitride film and a second silicon oxynitride film, respectively.
8. The method for manufacturing a semiconductor device according to claim 7 ,
wherein the first oxide insulating film is formed at a first temperature,
wherein the second oxide insulating film is formed in a second temperature, and
wherein the first temperature is higher than the second temperature.
9. The method for manufacturing a semiconductor device according to claim 7 ,
wherein an etching rate of the first oxide insulating film is lower than or equal to 10 nm/min and lower than an etching rate of the second oxide insulating film when etching is performed at 25° C. with a solution of 0.5 weight % of hydrofluoric acid.
10. The method for manufacturing a semiconductor device according to claim 7 ,
wherein the second oxide insulating film is formed so as to contain oxygen at a higher proportion than a stoichiometric composition.
11. The method for manufacturing a semiconductor device according to claim 7 , further comprising stacking a silicon nitride film on the second oxide insulating film.
12. The method for manufacturing a semiconductor device according to claim 7 ,
wherein a threshold voltage of a transistor including the oxide semiconductor film changes in a positive direction by a bias-temperature stress test,
wherein an amount of change is less than or equal to 3.0V, and
wherein the bias-temperature stress test is performed when a temperature of the substrate is 80° C., an intensity of an electric field applied to a gate insulating film of the transistor is 1.28 MV/cm, and a performance time is 2000 seconds.
13. A method for manufacturing a semiconductor device, comprising:
forming an oxide semiconductor film over a substrate;
forming a first oxide insulating film over and in contact with the oxide semiconductor film, in an apparatus and by chemical vapor deposition in a first atmosphere, at a first temperature, and with a first radio-frequency power supplied to an electrode of the apparatus;
forming a second oxide insulating film over and in contact with the first oxide insulating film, in the apparatus and by chemical vapor deposition in a second atmosphere, at a second temperature, and with a second radio-frequency power supplied to the electrode of the apparatus; and
applying a heat treatment to the second oxide insulating film at a third temperature comprised between 250° C. and 450° C. in a nitrogen atmosphere, the third temperature being higher than the first temperature and the second temperature,
wherein the first radio-frequency power is lower than the second radio-frequency power,
wherein the first oxide insulating film is formed thinner than the second oxide insulating film, and a thickness of the first oxide insulating film is less than or equal to 50 nm,
wherein spin densities of the first oxide insulating film measured by electron spin resonance are less than or equal to a lower limit of detection at a g-factor of 2.001, and
wherein the first oxide insulating film and the second oxide insulating film are a first silicon oxynitride film and a second silicon oxynitride film, respectively.
14. The method for manufacturing a semiconductor device according to claim 13 ,
wherein the first temperature is higher than the second temperature.
15. The method for manufacturing a semiconductor device according to claim 13 ,
wherein an etching rate of the first oxide insulating film is lower than or equal to 10 nm/min and lower than an etching rate of the second oxide insulating film when etching is performed at 25° C. with a solution of 0.5 weight % of hydrofluoric acid.
16. The method for manufacturing a semiconductor device according to claim 13 ,
wherein the second oxide insulating film is formed so as to contain oxygen at a higher proportion than a stoichiometric composition.
17. The method for manufacturing a semiconductor device according to claim 13 , further comprising stacking a silicon nitride film on the second oxide insulating film.
18. The method for manufacturing a semiconductor device according to claim 13 ,
wherein a threshold voltage of a transistor including the oxide semiconductor film changes in a positive direction by a bias-temperature stress test,
wherein an amount of change is less than or equal to 3.0V, and
wherein the bias-temperature stress test is performed when a temperature of the substrate is 80° C., an intensity of an electric field applied to a gate insulating film of the transistor is 1.28 MV/cm, and a performance time is 2000 seconds.