Semiconductor device and method of manufacturing the same
A semiconductor device includes a first stacked structure having first conductive layers and first insulating layers formed alternately with each other, first semiconductor patterns passing through the first stacked structure, a coupling pattern coupled to the first semiconductor patterns, and a slit passing through the first stacked structure and the coupling pattern.
1. A semiconductor device, comprising:
a first stacked structure including first conductive layers and first insulating layers formed alternately with each other;
a second stacked structure located under the first stacked structure and including second conductive layers and second insulating layers formed alternately with each other;
first semiconductor patterns passing through the first stacked structure;
coupling patterns coupled to the first semiconductor patterns, respectively;
second semiconductor patterns passing through the second stacked structure and coupled to the first semiconductor patterns through the coupling patterns; and
a slit located between neighboring first semiconductor patterns, wherein the slit passes through the first stacked structure and the coupling patterns so that sidewalls of the coupling patterns are defined by the slit.
2. The semiconductor device of claim 1 , wherein each of the coupling patterns comprises:
a horizontal portion coupled to lower portions of the first semiconductor patterns; and
vertical portions protruding from the horizontal portion and surrounding sidewalls of the first semiconductor patterns.
3. The semiconductor device of claim 2 , wherein each of the vertical portions surrounds each of the first semiconductor patterns at a uniform height.
4. The semiconductor device of claim 2 , further comprising multilayer dielectric layers surrounding the sidewalls of the first semiconductor patterns and having substantially the same thickness as the vertical portions.
5. The semiconductor device of claim 1 , wherein the coupling patterns are substantially conductive.
6. The semiconductor device of claim 1 , further comprising a protective layer contacting a top surface of each of the coupling patterns and including a different material from the coupling pattern.
7. The semiconductor device of claim 1 , further comprising multilayer dielectric layers surrounding sidewalls of the first semiconductor patterns.
8. The semiconductor device of claim 7 , wherein a thickness of each of the coupling patterns is less than twice the thickness of the multilayer dielectric layer.
9. The semiconductor device of claim 7 , wherein each of the multilayer dielectric layers includes a tunnel insulating layer, a data storage layer and a charge blocking layer.
10. The semiconductor device of claim 9 , wherein a thickness of each of the coupling patterns is more than twice as much as a sum of thicknesses of the charge blocking layer and the data storage layer, and less than twice as much as a sum of thicknesses of the charge blocking layer, the data storage layer and the tunnel insulating layer.
11. The semiconductor device of claim 9 , wherein a thickness of each of the coupling patterns is more than twice as much as a thickness of the charge blocking layer and less than twice as much as a sum of thicknesses of the charge blocking layer and the data storage layer.
12. The semiconductor device of claim 9 , wherein top surfaces of the tunnel insulating layer, the data storage layer and the charge blocking layer have different heights, and
wherein each of the first semiconductor patterns includes:
an insulating layer passing through the first stacked structure;
a semiconductor plug formed on the insulating layer; and
a semiconductor layer surrounding a sidewall of the insulating layer and passing through the semiconductor plug.
13. The semiconductor device of claim 1 , further comprising a peripheral circuit located under the first stacked structure.
14. The semiconductor device of claim 1 , wherein the first semiconductor patterns, the coupling patterns and the second semiconductor patterns are channel layers.
15. The semiconductor device of claim 1 , further comprising:
a third semiconductor pattern coupling at least two of the second semiconductor patterns; and
a third conductive layer surrounding the third semiconductor pattern.
16. The semiconductor device of claim 1 , wherein each of the second semiconductor patterns includes a groove formed in a top surface thereof, and
wherein the groove is filled with the coupling pattern.
17. The semiconductor device of claim 1 ,
wherein each of the coupling patterns is a first source layer.
18. The semiconductor device of claim 17 , further comprising:
a third insulating layer surrounding the coupling pattern; and
a substrate located under the third insulating layer and contacting a bottom surface of the coupling pattern.
19. The semiconductor device of claim 18 , wherein the substrate includes a groove formed in a top surface thereof, and
wherein the groove is filled with the coupling pattern.
20. The semiconductor device of claim 17 , further comprising:
a second source layer surrounding the first source layer and including polysilicon;
a third insulating layer located under the second source layer; and
a substrate located under the third insulating layer.
21. The semiconductor device of claim 20 , further comprising a third source layer interposed between the second source layer and the third insulating layer, and including a metal layer.
22. The semiconductor device of claim 21 , further comprising a fourth source layer interposed between the third source layer and the third insulating layer, and including polysilicon.
23. The semiconductor device of claim 17 , further comprising:
a peripheral circuit located under the first stacked structure;
a first contact plug coupling the peripheral circuit and the first semiconductor patterns to each other; and
a second contact plug coupling the peripheral circuit and the first source layer to each other.
24. A semiconductor device, comprising:
a first stacked structure including first conductive layers and first insulating layers formed alternately with each other;
first semiconductor patterns passing through the first stacked structure;
coupling patterns including horizontal portions coupled to lower portions of the first semiconductor patterns and vertical portions protruding from the horizontal portions and surrounding sidewalls of the first semiconductor patterns; and
a slit passing through the first stacked structure and the coupling patterns,
wherein each of the vertical portions surrounds each of the first semiconductor patterns at a non-uniform height.
25. A semiconductor device, comprising:
a first stacked structure including first gate electrodes and first insulating layers formed alternately with each other;
a second stacked structure located under the first stacked structure, and including second gate electrodes and second insulating layers formed alternately with each other;
first channel layers passing through the first stacked structure;
multilayer dielectric layers surrounding sidewalls of the first channel layers, respectively;
second channel layers passing through the second stacked structure;
coupling patterns, each coupling pattern including a horizontal portion coupled to a lower portion of each of the first channel layers and an upper portion of each of the second channel layers and a vertical portion protruding from the horizontal portion and surrounding a sidewall of each of the first channel layers, wherein the vertical portion has substantially the same thickness as each of the multilayer dielectric layers; and
a slit located between neighboring first semiconductor patterns and between neighboring second semiconductor patterns, and passing through the first stacked structure, the second stacked structure and the horizontal portion of the coupling pattern.
26. The semiconductor device of claim 25 , further comprising a tunnel insulating layer, a data storage layer and a charge blocking layer surrounding each of the second channel layers, wherein heights of top surfaces of the tunnel insulating layer, the data storage layer and the charge blocking layer are different,
wherein each of the second channel layers includes:
an insulating layer passing through the second stacked structure;
a semiconductor plug formed on the insulating layer; and
a semiconductor layer surrounding a sidewall of the insulating layer and passing through the semiconductor plug.
27. A semiconductor device, comprising:
a first stacked structure including first conductive layers and first insulating layers formed alternately with each other;
a second stacked structure located under the first stacked structure, and including second conductive layers and second insulating layers formed alternately with each other;
first channel layers passing through the first stacked structure;
second channel layers passing through the second stacked structure;
third insulating layer interposed between the first stacked structure and the second stacked structure, wherein a lower surface of the third insulating layer contacts an uppermost second insulating layer and an upper surface of the third insulating layer contacts a lowermost first insulating layer; and
coupling patterns located in the third insulating layer, each of the coupling patterns including a horizontal portion coupling each of the first channel layers to each of the second channel layers and a vertical portion protruding from the horizontal portion and surrounding a sidewall of each of the first channel layers.
28. The semiconductor device of claim 27 , wherein the third insulating layer is located at substantially the same level as the coupling pattern.
29. The semiconductor device of claim 27 , wherein the third insulating layer has substantially the same thickness as the coupling pattern.
30. The semiconductor device of claim 27 , wherein the third insulating layer surrounds sidewalls of the coupling patterns.
31. The semiconductor device of claim 27 , wherein a first interface exists between the lower surface of the third insulating layer and an upper surface of the uppermost second insulating layer and a second interface exists between an upper surface of the third insulating layer and a lower surface of the lowermost first insulating layer.
32. The semiconductor device of claim 27 , wherein the first conductive layers include polysilicon and the second conductive layers includes polysilicon.
33. The semiconductor device of claim 27 , further comprising:
first data storage layers interposed between the first channel layers and the first conductive layers, wherein each of the first data storage layers is a polysilicon layer; and
second data storage layers interposed between the second channel layers and the second conductive layers, wherein each of the second data storage layers is a polysilicon layer.
34. The semiconductor device of claim 27 , wherein each of the coupling patterns includes polysilicon or a silicide material.
35. A semiconductor device, comprising:
a first stacked structure including first polysilicon layers and first insulating layers formed alternately with each other;
a second stacked structure located under the first stacked structure, and including second polysilicon layers and second insulating layers formed alternately with each other;
first channel layers passing through the first stacked structure;
first data storage layers interposed between the first channel layers and the first polysilicon layers and including polysilicon layers;
second channel layers passing through the second stacked structure;
second data storage layers interposed between the second channel layers and the second polysilicon layers and including polysilicon layers;
third insulating layer interposed between the first stacked structure and the second stacked structure, wherein a lower surface of the third insulating layer contacts an uppermost second insulating layer and an upper surface of the third insulating layer contacts a lowermost first insulating layer;
coupling patterns located in the third insulating layer, each of the coupling patterns including a horizontal portion coupling each of the first channel layers to each of the second channel layers and a vertical portion protruding from the horizontal portion and surrounding a sidewall of each of the first channel layers.