Inspection apparatus of EUV mask and its focus adjustment method
An inspection apparatus according to an aspect of the present invention includes an EUV light source 11 , an illumination optical system 10 provided to apply the EUV light to an EUV mask 60 , a concave mirror and a convex mirror 22 configured to reflect the EUV light reflected on the EUV mask 60 , a camera 32 configured to detect EUV light reflected on the convex mirror 22 and thereby take an image of the EUV mask 60 , an AF light source 16 configured to generate AF light having a wavelength of 450 nm to 650 nm, first and second detectors 27 and 30 configured to detect the AF light reflected on the EUV mask 60 through the concave mirror with the hole 21 and the convex mirror 22 , and an processing device 31 configured to adjust a focus point of the EUV light on the EUV mask 60.
1. An inspection apparatus comprising:
an EUV (Extremely Ultraviolet) light source configured to generate EUV light;
an illumination optical system provided to apply the EUV light to an EUV mask comprising a multilayer reflection film and an absorption film;
a concave mirror with a hole formed therein, the concave mirror with the hole being configured to reflect the EUV light reflected on the EUV mask;
a convex mirror configured to reflect the EUV light reflected on the concave mirror with the hole toward the hole of the concave mirror with the hole;
an image pickup device configured to detect the EUV light reflected on the convex mirror and thereby take an image of the EUV mask;
an Auto Focus light source configured to generate Auto Focus light having a wavelength of 450 nm to 650 nm;
an Auto Focus photodetector configured to detect the Auto Focus light reflected on the EUV mask through the concave mirror with the hole and the convex mirror; and
an adjustment unit configured to adjust a focus point of the EUV light on the EUV mask based on a detection result of the Auto Focus photodetector,
wherein the Auto Focus light is incident on an outer side of an incident place on which the EUV light is incident on a reflection surface of the concave mirror with the hole.
2. The inspection apparatus according to claim 1 , wherein
the illumination optical system comprises a dropping mirror disposed directly above the EUV mask, the dropping mirror being configured to reflect the EUV light emitted from the EUV light source toward the EUV mask, and
the Auto Focus light is reflected on the dropping mirror and then incident on the EUV mask.
3. The inspection apparatus according to claim 2 , wherein
a stop is disposed in a place conjugate with the EUV mask in the illumination optical system, and
the Auto Focus light source is disposed on a rear side of the stop.
4. The inspection apparatus according to claim 1 , wherein
the illumination optical system comprises a dropping mirror disposed directly above the EUV mask, the dropping mirror being configured to reflect the EUV light emitted from the EUV light source toward the EUV mask, and
the Auto Focus light is incident on the EUV mask from outside of the dropping mirror.
5. The inspection apparatus according to claim 4 , wherein an incident place on which the Auto Focus light is incident coincides with the incident place on which the EUV light is incident on the EUV mask.
6. The inspection apparatus according to claim 1 , wherein an incident place on which the Auto Focus light is incident is deviated from the incident place on which the EUV light is incident on the EUV mask.
7. The inspection apparatus according to claim 1 , wherein a pellicle formed of a material containing silicon is provided on the EUV mask.
8. A focus adjustment method for an inspection apparatus,
the inspection apparatus comprising:
an EUV light source configured to generate EUV light;
an illumination optical system provided to apply the EUV light to an EUV mask comprising a multilayer reflection film and an absorption film;
a concave mirror with a hole formed therein, the concave mirror with the hole being configured to reflect the EUV light reflected on the EUV mask;
a convex mirror configured to reflect the EUV light reflected on the concave mirror with the hole toward the hole of the concave mirror with the hole;
an image pickup device configured to detect the EUV light reflected on the convex mirror and thereby take an image of the EUV mask; and
an Auto Focus light source configured to generate Auto Focus light having a wavelength of 450 nm to 650 nm,
the focus adjustment method comprising:
a step of detecting the Auto Focus light reflected on the EUV mask through the concave mirror with the hole and the convex mirror; and
a step of adjusting a focus point of the EUV light on the EUV mask based on a detection result of the Auto Focus photodetector,
wherein the Auto Focus light is incident on an outer side of an incident place on which the EUV light is incident on a reflection surface of the concave mirror with the hole.
9. The focus adjustment method according to claim 8 , wherein
the illumination optical system comprises a dropping mirror disposed directly above the EUV mask, the dropping mirror being configured to reflect the EUV light emitted from the EUV light source toward the EUV mask, and
the Auto Focus light is reflected on the dropping mirror and then incident on the EUV mask.
10. The focus adjustment method according to claim 9 , wherein
a stop is disposed in a place conjugate with the EUV mask in the illumination optical system, and
the Auto Focus light source is disposed on a rear side of the stop.
11. The focus adjustment method according to claim 8 , wherein
the illumination optical system comprises a dropping mirror disposed directly above the EUV mask, the dropping mirror being configured to reflect the EUV light emitted from the EUV light source toward the EUV mask, and
the Auto Focus light is incident on the EUV mask from outside of the dropping mirror.
12. The focus adjustment method according to claim 11 , wherein the incident place on which the Auto Focus light is incident coincides with the incident place on which the EUV light is incident on the EUV mask.
13. The focus adjustment method according to claim 8 , wherein the incident place on which the Auto Focus light is incident is deviated from the incident place on which the EUV light is incident on the EUV mask.
14. The focus adjustment method according to claim 8 , wherein a pellicle formed of a material containing silicon is provided on the EUV mask.