High mobility field effect transistors with a retrograded semiconductor source/drain
Monolithic FETs including a channel region of a first semiconductor material disposed over a substrate. While a mask, such as a gate stack or sacrificial gate stack, is covering the channel region, an impurity-doped compositionally graded semiconductor is grown, for example on at least a drain end of the channel region to introduce a carrier-blocking conduction band offset and/or a wider band gap within the drain region of the transistor. In some embodiments, the compositional grade induces a carrier-blocking band offset of at least 0.25 eV. The wider band gap and/or band offset contributes to a reduced gate induced drain leakage (GIDL). The impurity-doped semiconductor may be compositionally graded back down from the retrograded composition to a suitably narrow band gap material providing good ohmic contact. In some embodiments, the impurity-doped compositionally graded semiconductor growth is integrated into a gate-last, source/drain regrowth finFET fabrication process.
1. A monolithic high mobility field effect transistor, comprising:
a gate electrode over a channel region comprising a first III-V semiconductor material of a first alloy composition; and
a pair of semiconductor source/drain regions impurity doped to a same conductivity type and interfacing the channel region, the source/drain regions comprising a compositionally graded III-V semiconductor alloy varying between:
the first alloy composition proximal to an interface of the channel region and a second alloy composition a first distance from the interface, wherein material with the second alloy composition has a charge carrier-blocking band offset from material with the first alloy composition; and
the second alloy composition and a third alloy composition at a second distance from the interface, material with the third alloy composition having a non-blocking band offset from material with the second alloy composition.
2. The transistor of claim 1 , wherein:
the second alloy composition has a band gap that is at least 0.25 eV larger than the band gap of the first alloy composition; and
the third alloy composition has a band gap that is at least 0.5 eV smaller than the wide band gap.
3. The transistor of claim 1 , wherein:
the impurity doping is n-type with an impurity dopant concentration of at least 10 16 cm −3 ;
the first alloy composition comprises an alloy of InGaAs or GaAsSb;
the first alloy composition has an In or Sb content that is at least twice that of the second alloy composition; and
the third alloy composition has an In or Sb content that is at least 1.5 times that of the first alloy composition.
4. The transistor of claim 1 , wherein:
the first alloy composition comprises In x Ga 1-x As, and x is at least 0.4;
the second alloy composition comprises In x Ga 1-x As, and x is no more than 0.15; and
the third alloy composition comprises In x Ga 1-x As, and x is at least 0.8.
5. The transistor of claim 4 , wherein:
the first alloy composition comprises In x Ga 1-x As, and x is approximately 0.53;
the second alloy composition comprises In x Ga 1-x As, and x is approximately 0.10; and
the third alloy composition comprises In x Ga 1-x As, and x is at least 0.9.
6. The transistor of claim 1 , wherein:
the first distance is less than 3 nm; and
the second distance is less than 10 nm.
7. The transistor of claim 1 , wherein:
the source and drain regions are laterally spaced apart from opposite sidewalls of the gate electrode by an intervening gate sidewall spacer; and
the first distance is below at least one of the gate electrode or the gate sidewall spacer.
8. The transistor of claim 3 , wherein:
the first III-V semiconductor material is over a sub-fin comprising a III-V compound semiconductor having a different composition than the first alloy composition; and
the source and drain regions are over the sub-fin, the compositionally graded alloy having the first III-V composition proximal to an interface with the sub-fin.
9. The transistor of claim 8 , wherein:
the graded alloy has the first alloy composition proximate to an interface with the channel region; and
the graded alloy has the first alloy composition at a heterojunction with the sub-fin.
10. The transistor of claim 1 , wherein:
the substrate is monocrystalline silicon;
the semiconductor channel region and source/drain regions are monocrystalline;
the gate sidewall spacer comprises a high-K gate insulator between the gate electrode and channel region; and
the gate electrode comprises a metal gate electrode.
11. A CMOS integrated circuit (IC), comprising:
a silicon substrate;
an n-type III-V-channeled fin field effect transistor (FET) over a first region of the substrate, the n-type III-V finFET further including:
a channel region comprising a fin of a ternary III-V semiconductor material having a first alloy composition;
a gate electrode disposed over the channel region; and
a pair of impurity doped n-type semiconductor source/drain regions interfacing opposite ends of the channel region, and comprising a graded alloy of the ternary III-V semiconductor material, wherein the graded alloy varies between:
the first alloy composition proximal to an interface of the channel region to a second alloy composition a first distance from the interface, the second alloy composition associated with a carrier-blocking conduction band offset; and
the second alloy composition proximal to the first distance to a third alloy composition at a second distance from the interface, the third alloy composition associated with a non-blocking conduction band offset; and
a p-type finFET disposed over a second region of the substrate.
12. The CMOS IC of claim 11 , wherein:
the second alloy composition has a band gap that is at least 0.25 eV larger than the band gap of the first alloy composition;
the third alloy composition has a band gap that is at least 0.5 eV smaller than the wide band gap;
the first distance is less than 3 nm;
the second distance is less than 10 nm and
the p-type finFET comprises a silicon fin.
13. The CMOS IC of claim 12 , wherein:
regions of the source and drain having the first alloy composition are below a gate sidewall spacer on opposite ends of the channel region.