Semiconductor device, method of fabricating the same, and apparatus used in fabrication thereof

1. A semiconductor device comprising:

a substrate;

upper impurity regions in upper portions of the substrate;

metal electrodes electrically connected to the upper impurity regions;

metal silicide layers between the metal electrodes and the upper, impurity regions;

a lower impurity region in a lower portion of the substrate; and

global buried contacts (GBCs) respectively on the upper impurity regions,

wherein,

the semiconductor device includes a dynamic random access memory (DRAM) device, and

the metal silicide layers are between the GBCs and the metal electrodes, and

impurity ions are concentrated at an interface between the GBCs and the metal silicide layers.

2. The semiconductor device of claim 1 , wherein

the GBCs comprise polysilicon (Poly-Si), and

the metal silicide layers comprises cobalt silicide (CoSi 2 ).

3. The semiconductor device of claim 1 , wherein

the impurity ions are accumulated at the interface between the GBCs and the metal silicide layers.

4. A semiconductor device comprising:

a substrate in which a plurality of active regions are defined;

an upper impurity region in an upper portion of each of the plurality of active regions;

gate lines embedded in the substrate across the plurality of active regions;

a metal electrode electrically connected to the upper impurity region; and

a metal silicide layer between the upper impurity region and the metal electrode, wherein,

the semiconductor device includes a dynamic random access memory (DRAM) device,

a first contact electrically connected to a bit line and a second contact electrically connected to a capacitor are arranged on the upper impurity region,

the metal silicide layer is between the second contact and the metal electrode and

impurity ions are concentrated at an interface between the second contact and the metal silicide layer.

5. The semiconductor device of claim 4 , wherein

the second contact comprises impurity ions, and

the impurity ions are moved to be concentrated at an interface between the second contact and the metal silicide layer.

6. The semiconductor device of claim 4 , wherein

the second contact comprises polysilicon,

the metal silicide layer comprises cobalt silicide, and

the metal electrode is in contact with a lower electrode of the capacitor.

7. The semiconductor device of claim 4 , further comprising a lower impurity region in a lower portion of the substrate.

8. The semiconductor device of claim 4 , wherein

the impurity ions are accumulated at the interface between the second contact and the metal silicide layer.