Semiconductor device and method for manufacturing the same
It is an object to provide an oxide semiconductor which is suitable for use in a semiconductor device. Alternatively, it is another object to provide a semiconductor device using the oxide semiconductor. Provided is a semiconductor device including an In—Ga—Zn—O based oxide semiconductor layer in a channel formation region of a transistor. In the semiconductor device, the In—Ga—Zn—O based oxide semiconductor layer has a structure in which crystal grains represented by InGaO 3 (ZnO) m (m=1) are included in an amorphous structure represented by InGaO 3 (ZnO) m (m>0).
1. A semiconductor device comprising:
an oxide semiconductor layer comprising a channel formation region,
wherein the oxide semiconductor layer comprises crystals represented by InGaZnO 4 ,
wherein the oxide semiconductor layer comprises In, Ga, and Zn,
wherein a Zn content by atomic percent in the oxide semiconductor layer is less than an In content by atomic percent in the oxide semiconductor layer,
wherein the Zn content by atomic percent in the oxide semiconductor layer is less than a Ga content by atomic percent in the oxide semiconductor layer, and
wherein in the oxide semiconductor layer, a proportion of the crystals represented by InGaZnO 4 to a whole of crystals is 80 volume % or more.
2. The semiconductor device according to claim 1 , wherein the oxide semiconductor layer is formed over and in contact with an insulating layer.
3. The semiconductor device according to claim 2 , wherein the insulating layer comprises at least one film selected from a silicon oxide film, a silicon oxynitride film, a silicon nitride film, and a silicon nitride oxide film.
4. The semiconductor device according to claim 1 ,
wherein the oxide semiconductor layer is formed using a target of In:Ga:Zn=2:2:1 by sputtering method.
5. The semiconductor device according to claim 1 ,
wherein the semiconductor device is a transistor, and
wherein an on/off ratio of the transistor is 10 9 or higher and mobility of the semiconductor device is 10 cm 2 Ns or higher at a gate voltage of ±20 V.
6. A semiconductor device comprising:
a first oxide semiconductor layer comprising a channel formation region; and
a second oxide semiconductor layer over the first oxide semiconductor layer,
wherein the first oxide semiconductor layer comprises crystals represented by InGaZnO 4 ,
wherein the first oxide semiconductor layer comprises In, Ga, and Zn,
wherein a Zn content by atomic percent in the first oxide semiconductor layer is less than an In content by atomic percent in the first oxide semiconductor layer,
wherein the Zn content by atomic percent in the first oxide semiconductor layer is less than a Ga content by atomic percent in the first oxide semiconductor layer, and
wherein a proportion of the crystals represented by InGaZnO 4 to a whole of crystals is 80 volume % or more in the first oxide semiconductor layer.
7. The semiconductor device according to claim 6 , wherein a conductivity of the first oxide semiconductor layer is different from a conductivity of the second oxide semiconductor layer.
8. The semiconductor device according to claim 7 , wherein the first oxide semiconductor layer is formed over and in contact with an insulating layer.
9. The semiconductor device according to claim 8 , wherein the insulating layer comprises at least one film selected from a silicon oxide film, a silicon oxynitride film, a silicon nitride film, and a silicon nitride oxide film.
10. The semiconductor device according to claim 6 ,
wherein the first oxide semiconductor layer is formed using a target of In:Ga:Zn=2:2:1 by sputtering method.
11. The semiconductor device according to claim 6 ,
wherein the semiconductor device is a transistor, and
wherein an on/off ratio of the transistor is 10 9 or higher and mobility of the semiconductor device is 10 cm 2 /Vs or higher at a gate voltage of ±20 V.