Fin field-effect transistor (FinFET) and method of production thereof
Methods of forming a CT pillar with reduced width and increased distance from neighboring fins and the resulting devices are provided. Embodiments include providing a first pair of fins and a second pair of fins in an oxide layer, wherein the first and second pair of fins include Si; and forming a CT pillar including SiN between the first and second pair of fins and over a portion of the oxide layer, wherein width of the CT pillar and distance between the CT pillar and the first and second pair of fins are inversely proportional.
1. A device comprising:
a first pair of fins and a second pair of fins in an oxide layer, wherein the first and second pair of fins comprises silicon (Si); and
a gate cut (CT) pillar comprising silicon nitride (SiN) between the first and second pair of fins and over a portion of the oxide layer, wherein width of the CT pillar and distance between the CT pillar and the first and second pair of fins are inversely proportional,
wherein a bottom portion of the CT pillar has a width thinner than a width of an upper portion of the CT pillar, and
wherein the bottom portion of the CT pillar includes sidewall spacers and the upper portion of the CT pillar does not include the sidewall spacers.
2. The device according to claim 1 , wherein the CT pillar has a width of 12 nanometer (nm) to 40 nm.
3. The device according to claim 1 , wherein the bottom portion of the CT pillar has a width of 8 nm to 30 nm.
4. The device according to claim 1 , wherein a distance between the CT pillar and the first and second pairs of fins is 10 nm to 35 nm.
5. The device according to claim 1 , wherein the sidewall spacers have a width of 2 nm to 6 nm.
6. A method comprising:
providing a first pair of fins and a second pair of fins in an oxide layer, wherein the first and second pair of fins comprises silicon (Si); and
forming a gate cut (CT) pillar comprising silicon nitride (SiN) between the first and second pair of fins and over a portion of the oxide layer, wherein the CT pillar is formed by:
providing a polysilicon (Poly-Si) gate over the first and second pair of fins and the oxide layer;
providing a hardmask over the Poly-Si gate;
removing a first portion of the Poly-Si gate through the hardmask, forming a cavity;
forming a spacer over the Poly-Si gate and along sidewalls of the cavity;
removing a portion of the spacer and the Poly-Si gate down to the oxide layer, forming a trench;
forming a silicon nitride (SiN) layer in the trench and the cavity, upper surface of the SiN layer substantially coplanar to upper surface of the hardmask;
planarizing the SiN layer and the hardmask down to the Poly-Si gate;
removing a second portion of the Poly-Si gate, exposing the spacer;
removing the spacer; and
removing a third portion of the Poly-Si gate, thereby forming the CT pillar,
wherein width of the CT pillar and distance between the CT pillar and the first and second pair of fins are inversely proportional.
7. The method according to claim 6 , further comprising:
forming a second spacer along sidewalls of a lower portion of the trench, the second spacer reducing width of the lower portion of the trench.
8. The method according to claim 6 , wherein removing the second portion of the Poly-Si gate further comprising:
exposing a portion of the second spacer; and
removing the exposed portion of the second spacer.
9. The method according to claim 6 , wherein removing the third portion of the Poly-Si gate further comprising:
exposing remaining portion of the second spacer; and
removing a portion of the remaining second spacer.
10. The method according to claim 6 , comprising forming the CT pillar to a width of 12 nanometer (nm) to 40 nm.
11. The method according to claim 7 , wherein bottom portion of the CT pillar has a thinner width than upper portion.
12. The method according to claim 11 , comprising forming the bottom portion of the CT pillar to a width of 8 nm to 30 nm.
13. The method according to claim 10 , wherein distance between the CT pillar and the first and second pair of fins is 10 nm to 35 nm.
14. The method according to claim 7 , comprising forming the spacer and the second spacer by oxidation to a thickness that is proportional to the width of the SiN layer.
15. A device comprising:
a first pair of fins and a second pair of fins having a thickness of 5 nanometer (nm) to 22 nm in an oxide layer, wherein the first and second pair of fins comprises silicon (Si); and
a gate cut (CT) pillar comprising silicon nitride (SiN) between the first and second pair of fins and over a portion of the oxide layer, wherein width of the CT pillar is 12 nm to 40 nm and distance between the CT pillar and the first and second pair of fins is 10 nm to 35 nm,
wherein a bottom portion of the CT pillar has a width thinner than a width of an upper portion of the CT pillar, and
wherein the bottom portion of the CT pillar includes sidewall spacers and the upper portion of the CT pillar does not include the sidewall spacers.
16. The device according to claim 15 , wherein the bottom portion of the CT pillar has a width of 8 nm to 30 nm.