IP Library › Granted Patent US 10,421,929
Granted Patent B2
US 10,421,929 · App. 15/923,441 · Granted Sep 24, 2019

Low-VOC cleaning substrates comprising a quat and ethoxylated/propdxylated fatty alcohol

Inventors: Sarah Coulter (Pleasanton, CA); Ashish Jha (Pleasanton, CA); Diana Mitchell (Pleasanton, CA); William Ouellette (Livermore, CA); Gregory vanBuskirk (Danville, CA)
Assignee: The Clorox Company
C11D3/48A01N33/12A47L13/17C11D1/66C11D1/835C11D3/43C11D1/008C11D1/62C11D1/72
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Quick Facts
Patent No.
US 10,421,929
App. No.
15/923,441
Granted
Sep 24, 2019
Kind
B2
Abstract

A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.

Claims (42)

1. A cleaning substrate comprising:

a) an absorbent substrate:

b) a cleaning composition, loaded onto said absorbent substrate, consisting of:

i. about 0.05-5% by weight of one or more cationic biocide,

ii. 0.01-5% by weight of one or more non-ionic surfactants containing at least one mixed ethylene oxide/propylene oxide adducts of long chain alcohols,

iii. about 0.05-5% by weight of a solvent comprising a glycol ether selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, ethylene glycol ethers, and any mixtures or combinations thereof,

iv. at least about 90% by weight of water; and

v. optionally, one or more adjuncts selected from the group consisting of: buffers, fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, dyes, colorants and preservatives.

2. The cleaning substrate as defined in claim 1 , wherein the composition further comprises a buffer.

3. The cleaning substrate as defined in claim 1 , wherein the composition further comprises a fragrance.

4. The cleaning substrate as defined in claim 1 , wherein the glycol ether is hexyl cellosolve.

5. The cleaning substrate as defined in claim 1 , wherein the composition further comprises a preservative.

6. The cleaning substrate as defined in claim 5 , wherein said cleaning composition contains about 0.05-2% by weight of said cationic biocide.

7. The cleaning substrate as defined in claim 1 , wherein said cationic biocide includes a quaternary ammonium compound.

8. The cleaning substrate as defined in claim 5 , wherein said cleaning composition contains about 0.01-2% by weight of said non-ionic surfactant.

9. A cleaning substrate comprising:

a) an absorbent substrate:

b) a cleaning composition, loaded onto said absorbent substrate, consisting of:

i. about 0.05-5% by weight of one or more quaternary ammonium compound,

ii. about 0.01-5% by weight of one or more non-ionic surfactants containing at least one mixed ethylene oxide/propylene oxide adducts of long chain alcohols,

iii. about 0.05-5% by weight of a solvent comprising hexyl cellosolve;

iv. at least about 90% by weight of water, and

v. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, buffers, defoamers, hydrotropes, biocide release agents, enzymes, bleaching agents, and preservatives.

10. The cleaning substrate as defined in claim 9 , wherein the composition further comprises a buffer.

11. The cleaning substrate as defined in claim 9 , wherein the composition further comprises a fragrance.

12. The cleaning substrate as defined in claim 9 , wherein the cleaning composition contains about 0.05-3% by weight of hexyl cellosolve.

13. The cleaning substrate as defined in claim 9 , wherein said cleaning composition contains about 0.05-2% by weight of said one or more quaternary ammonium compound.

14. The cleaning substrate as defined in claim 9 , wherein the composition further comprises a preservative.

15. A cleaning substrate comprising:

a) an absorbent substrate:

b) a cleaning composition, loaded onto said absorbent substrate, consisting of:

i. about 0.05-2% by weight of one or more quaternary ammonium compounds;

ii. about 0.01-2% by weight of one or more non-ionic surfactants containing at least one mixed ethylene oxide/propylene oxide adduct of long chain alcohol;

iii. about 0.05-5% by weight of a solvent comprising a glycol ether selected from the group consisting of C1-10 alkyl ethers of alkylene glycols, ethylene glycol ethers, and any mixtures or combinations thereof,

iv. one or more fragrances;

v. at least 90% by weight of water; and

vi. optionally, one or more adjuncts selected from the group consisting of hydrotropes, buffers, defoamers, enzymes, bleaching agents, dyes, colorants and preservatives.

16. The cleaning composition as defined in claim 15 , wherein said solvent is selected from the group substrate of: C1-10 alkyl ethers of alkylene glycols.

17. The cleaning substrate as defined in claim 15 , wherein said solvent is selected from the group consisting of: ethylene glycol ethers.

18. The cleaning substrate as defined in claim 15 , wherein said cleaning composition further comprises a buffer.

19. The cleaning substrate as defined in claim 15 , wherein said solvent is hexyl cellosolve.

20. The cleaning substrate as defined in claim 15 , wherein said cleaning composition further comprises a preservative.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 16, 2018
From: OJHA, SATYAJEET; FALK, NANCY A.; HEYMANN, JARED; ANANTH, VIDYA; COULTER, SARAH; JHA, ASHISH; ZHANG, WENYU
To: THE CLOROX COMPANY
Reel/Frame 045255/0423 →
Continuity (5)
Continuation 14954663 · Nov 30, 2015
Continuation 14317835 · Jun 27, 2014
Continuation 14174698 · Feb 6, 2014
Continuation 13543232 · Jul 6, 2012
Related Publication 20180216044A1 · Aug 2, 2018
Cited By (2)
US 12,312,565 US 12,576,176