IP Library › Granted Patent US 10,435,807
Granted Patent B2
US 10,435,807 · App. 14/957,156 · Granted Oct 8, 2019

Lipseals and contact elements for semiconductor electroplating apparatuses

Inventors: Jingbin Feng (Lake Oswego, OR); Robert M. Stowell (Wilsonville, OR); Frederick D. Wilmot (Gladstone, OR)
Assignee: Novellus Systems, Inc.
C25D17/005C25D7/123C25D17/001C25D17/004C25D17/007C25D17/06C25D17/08Y10T29/49778
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,435,807
App. No.
14/957,156
Granted
Oct 8, 2019
Kind
B2
Abstract

Disclosed herein are lipseal assemblies for use in electroplating clamshells which may include an elastomeric lipseal for excluding plating solution from a peripheral region of a semiconductor substrate and one or more electrical contact elements. The contact elements may be structurally integrated with the elastomeric lipseal. The lipseal assemblies may include one or more flexible contact elements at least a portion of which may be conformally positioned on an upper surface of the elastomeric lipseal, and may be configured to flex and form a conformal contact surface that interfaces with the substrate. Some elastomeric lipseals disclosed herein may support, align, and seal a substrate in a clamshell, and may include a flexible elastomeric upper portion located above a flexible elastomeric support edge, the upper portion having a top surface and an inner side surface, the later configured to move inward and align the substrate upon compression of the top surface.

Claims (11)

1. A lipseal assembly for use in an electroplating clamshell for engaging and supplying electrical current to a semiconductor substrate during electroplating, the lipseal assembly comprising:

an elastomeric lipseal for engaging the semiconductor substrate during electroplating, wherein upon engagement the elastomeric lipseal substantially excludes plating solution from a peripheral region of the semiconductor substrate; and

one or more contact elements for supplying electrical current to the semiconductor substrate during electroplating, the one or more contact elements conformally positioned on an upper surface of the elastomeric lipseal and comprising a first exposed portion which contacts the peripheral region of the substrate upon engagement of the lipseal with the substrate;

wherein an engaging portion of the elastomeric lipseal which engages the substrate during electroplating is positioned relative to the first exposed portion of the electrical contact element such that during engagement said engaging portion of the lipseal compresses against the substrate prior to the first exposed portion of the electrical contact element making electrical contact with the substrate, wherein the one or more contact elements further comprise a second exposed portion for making an electrical connection with an electrical current source and a third exposed portion connecting the first and second exposed portions, the third exposed portion conformally positioned on the upper surface of the elastomeric lipseal; and

wherein the third exposed portion is pressed, glued, molded, or otherwise attached directly to a surface of the elastomeric lipseal.

2. The lipseal assembly of claim 1 , wherein the current source is a bus bar of the electroplating clamshell.

3. The lipseal assembly of claim 1 , wherein the engaging portion of the elastomeric lipseal includes a protrusion extending upwards and configured to be compressed by the semiconductor substrate and form a seal to substantially exclude the plating solution.

4. The lipseal assembly of claim 3 , wherein the first exposed portion of the electrical contact element is aligned with the protrusion of the elastomeric lipseal.

5. The lipseal assembly of claim 1 , wherein the elastomeric lipseal comprises a first inner diameter defining a substantially circular perimeter for excluding the plating solution from the peripheral region, and wherein the first exposed portion of the one or more contact elements defines a second inner diameter that is larger than the first inner diameter.

6. The lipseal assembly of claim 5 , wherein the magnitude of the difference between the first inner diameter and the second inner diameter is about or less than 0.5 mm.

7. The lipseal assembly of claim 6 , wherein the magnitude of the difference between the first inner diameter and the second inner diameter is about or less than 0.3 mm.

Continuity (3)
Division 13584343 · Aug 13, 2012
Provisional Application 61523800 · Aug 15, 2011
Related Publication 20160186355A1 · Jun 30, 2016
Cited By (1)
US 12,654,315