Substrate processing apparatus and substrate alignment method using the same
A method includes performing a substrate processing process by carrying a substrate into a chamber, and disposing the substrate in a loading region of the chamber, capturing an image of a lower surface of the substrate to acquire a first image, identifying particle patterns formed on the lower surface of the substrate in the substrate processing process, and an edge of the substrate, from the first image, calculating a first alignment error value of a deviation between an approximate position value for the center of the loading region calculated from the particle patterns and an approximate position value for a center of the substrate calculated from the edge of the substrate, and determining a point in time for teaching a transfer robot that deposits the substrate into the chamber, based on the first alignment error value.
1 . A substrate processing apparatus comprising:
a chamber having an internal space in which a substrate processing process for processing a substrate is performed;
an electrostatic chuck that is disposed in the internal space and that has a loading region in which a lower surface of the substrate is seated and an instrument is disposed;
an image capturing device that acquires a first image by capturing an image of the lower surface of the substrate on which the substrate processing process is performed;
a sensor module that is carried into the internal space, is seated in the loading region, and acquires a second image by capturing an image of the loading region;
a transfer robot that carries the sensor module and the substrate into and out of the internal space; and
a controller that is configured to:
identify particle patterns formed on the lower surface of the substrate by the instrument during the substrate processing process and an edge of the substrate, from the first image,
calculate a first alignment error value of a deviation between an approximate position value for a center of the loading region from the particle patterns and calculate a center of the substrate from the edge of the substrate,
determine a point in time for carrying the sensor module into the internal space, based on the first alignment error value,
detect an edge of the loading region from the second image,
calculate a precise position value for the center of the loading region from the edge of the loading region,
calculate a second alignment error value by comparing the precise position value with a reference position value, and
correct the second alignment error value by teaching the transfer robot.
2 . The substrate processing apparatus of claim 1 , wherein the loading region is an upper surface of the electrostatic chuck disposed in the chamber.
3 . The substrate processing apparatus of claim 1 , wherein the particle patterns are formed at a position corresponding to a position in which the instrument is disposed.
4 . The substrate processing apparatus of claim 1 ,
the electrostatic chuck further comprises:
a first ring arranged on the outer side of the instrument on the electrostatic chuck; and
a second ring surrounding the first ring.
5 . The substrate processing apparatus of claim 1 , wherein the sensor module comprises a plurality of image scanning modules,
wherein the plurality of image scanning modules capture images of portions of the edge of the loading region, respectively.
6 . The substrate processing apparatus of claim 1 , wherein the sensor module has a shape that is substantially identical to a shape of the substrate.
7 . The substrate processing apparatus of claim 6 , wherein a thickness of the sensor module is about 5 mm or less.
8 . The substrate processing apparatus of claim 1 , wherein the sensor module captures an image of an upper surface of the electrostatic chuck.
9 . The substrate processing apparatus of claim 1 , further comprising an upper electrode disposed at an upper portion within the chamber, and
the electrostatic chuck comprises:
a base body functioning as a lower electrode; and
a plate on the base body, the plate comprises an electrode therein and provides the loading region.
10 . The substrate processing apparatus of claim 1 ,
the controller is configured to:
acquire a first reference image by capturing an image of the lower surface of the substrate, before the substrate processing process is performed.
11 . The substrate processing apparatus of claim 10 ,
the controller is configured as follows to calculate the approximate position value:
identify a common pattern that is commonly disposed in the first reference image and the first image, among the particle patterns;
remove the common pattern from the particle patterns; and
calculate the approximate position value for the center of the loading region based on the first reference image and the first image from which the common pattern is removed.
12 . The substrate processing apparatus of claim 1 ,
the controller is configured as follows to calculate the approximate position value:
calculate a trace that connects centers of the particle patterns; and
calculate a center of the trace as the approximate position value for the center of the loading region.
13 . The substrate processing apparatus of claim 1 ,
the controller is further configured to:
store the second alignment error value in a database after determining to teach the transfer robot.
14 . The substrate processing apparatus of claim 1 , wherein the chamber comprises a plurality of chambers, and
the controller is further configured to:
predict a chamber that requires teaching of the transfer robot, among the plurality of chambers, by applying machine learning to information stored in a database, before determining the point in time for carrying the sensor module into the internal space.
15 . A substrate processing apparatus comprising:
a chamber having an internal space in which a substrate processing process for processing a substrate is performed;
an electrostatic chuck that is disposed in the internal space and that has a loading region in which a lower surface of the substrate is seated and an instrument is disposed;
an image capturing device that acquires a first image by capturing an image of the lower surface of the substrate on which the substrate processing process is performed;
a transfer robot that carries the substrate into and out of the internal space; and
a controller that is configured to:
identify particle patterns formed on the lower surface of the substrate by the instrument during the substrate processing process and an edge of the substrate, from the first image,
calculate a first alignment error value of a deviation between a first approximate position value for a center of the loading region from the particle patterns and calculate a center of the substrate from the edge of the substrate, and
determine a point in time for teaching the transfer robot, based on the first alignment error value.
16 . The substrate processing apparatus of claim 15 , further comprising a sensor module that is carried into the internal space, is seated in the loading region, and
wherein the controller is further configured to, before the point in time for teaching the transfer robot:
capture an image of the loading region using the sensor module to acquire a second image;
extract an edge of the loading region from the second image,
calculate a precise position value for the center of the loading region from the edge of the loading region, and
calculate a second alignment error value of a deviation between the precise position value and a pre-stored reference position value; and
wherein the point in time for teaching the transfer robot is based on the second alignment error value.
17 . The substrate processing apparatus of claim 16 , wherein the substrate is a wafer, and
the sensor module has a shape that is substantially identical to a shape of the substrate.
18 . A substrate processing apparatus comprising:
a chamber having an internal space in which a substrate processing process for processing a substrate is performed;
an electrostatic chuck that is disposed in the internal space and that has a loading region in which a lower surface of the substrate is seated and an instrument is disposed;
an image capturing device that acquires a first image by capturing an image of the lower surface of the substrate on which the substrate processing process is performed;
a transfer robot that carries the substrate into and out of the internal space; and
a controller that is configured to:
identify particle patterns formed on the lower surface of the substrate by the instrument during the substrate processing process and an edge of the substrate, from the first image,
calculate an approximate position value for a center of the loading region from the particle patterns and calculate a center of the substrate from the edge of the substrate,
calculate a first alignment error value of a deviation between the approximate position value for the center of the loading region and the center of the substrate,
determine whether to carry a sensor module into the chamber, based on the first alignment error value,
when it is determined to carry the sensor module into the chamber, the sensor module is carried into the chamber, the sensor module is disposed in the loading region, and a second image of the loading region is captured by the sensor module,
extract an edge of the loading region from the second image,
calculate a precise position value for the center of the loading region from the edge of the loading region,
calculate a second alignment error value of a deviation between the precise position value and a pre-stored reference position value, and
determine a point in time for teaching the transfer robot based on the second alignment error value.
19 . The substrate processing apparatus of claim 18 , when the first alignment error value is within a pre-stored error range, it is determined to carry the sensor module.
20 . The substrate processing apparatus of claim 18 , when the first alignment error value is not within of a pre-stored error range, it is determined to hold carrying of the sensor module.