Method for integrating at least one 3D interconnection for the manufacture of an integrated circuit

1. A method for integrating at least one interconnection for the manufacture of an integrated circuit comprising:

a step of depositing at least one insulating body onto a substrate comprising a horizontal surface, said insulating body comprising a first wall extending from the horizontal surface of the substrate to a high point of said insulating body;

wherein the insulating body comprises:

at least one of a conductor material, a semi-conductor material, a magnetic material, and a dielectric material,

at least one of a vertical wall covered with an insulating layer and an undercut covered with an insulating layer,

wherein the at least one of the vertical wall and the undercut enables inclination of the first wall of the insulating body,

wherein the insulating layer is photosensitive;

a step of making openings in the insulating layer;

a step of insulating the insulating layer using a mask to precisely control the inclination of the first wall of the insulating body; and

a step of depositing an electrical structure comprising an electrically conductive material on the horizontal surface of the substrate and the first wall of the insulating body to form an interconnection with the insulating body via the openings,

wherein the first wall is vertically angled and has a rising slope from the horizontal surface of the substrate to the high point of said insulating body,

wherein the first wall comprises a horizontal component and a vertical component greater than 10 μm, and

wherein the ratio of inclination of the horizontal component over the vertical component is between 0.001 and 1.35.

2. The method according to claim 1 , wherein the ratio of inclination of the horizontal component over the vertical component is between 0.01 and 1.

3. The method according to claim 1 , wherein the mask comprises a zone, configured to insulate the first wall from the insulating body, which comprises a plurality of patterns of variable lengths and widths in such a way as to control the inclination thereof.

4. The method according to claim 3 , wherein said zone comprises a plurality of patterns of which the width is decreasing along an axis directed from the top of the first wall of the insulating body downwards.

5. The method according to claim 3 , wherein the patterns are positioned parallel to the slope of the first wall of the insulating body in such a way as to create a determined insulation at a predetermined slope height.

6. The method according to claim 1 , wherein the mask comprises a plurality of different zones in such a way as to individually control the inclination of several first walls.

7. The method according to claim 1 , wherein the openings in the insulating layer are carried out during the step of insulating.

8. The method according to claim 1 , comprising a step of depositing a layer of resin-onto the insulating layer in such a way as to form a mould that limits the extension of the electrically conductive material during the step of depositing the electrical structure.

9. The method according to claim 8 , wherein said mould has a thickness between 10 and 150 μm and has a width/thickness resolution between 1 for 0.5 and 1 for 50, preferably, between 1 for 2 and 1 for 25.

10. The method according to claim 8 , wherein, the substrate comprising a cavity wherein is positioned the insulating body, said mould extends at least partially into said cavity adjacently to said insulating body.

11. The method according to claim 1 , wherein the horizontal component is between 0.1 and 150 μm, preferably, between 1 and 75 μm.

12. The method according to claim 1 , comprising a step of depositing a bond coat onto said substrate and said insulating body prior to the step of depositing the electrical structure.

13. An integrated circuit comprising a substrate comprising:

a substrate comprising a horizontal surface;

at least one insulating body located on said substrate comprising:

a first wall extending from the horizontal surface of the substrate to a high point of the insulating body, and

at least one of a vertical wall and an undercut,

wherein the at least one of the vertical wall and the undercut is covered with a photosensitive insulating layer through a mask to precisely control the inclination of the first wall of the insulating body; and

an electrical structure comprising an electrically conductive material on the horizontal surface of the substrate and the first wall of the insulating body,

wherein the first wall is vertically angled and has a rising slope from the horizontal surface of the substrate to the high point of said insulating body, with the first wall comprising a horizontal component and a vertical component greater than 10 μm, the ratio of inclination of the horizontal component over the vertical component is between 0.001 and 1.35.