IP Library Granted Patent US 10,446,365
Granted Patent B2
US 10,446,365 · App. 16/021,017 · Granted Oct 15, 2019

Method of verifying operation parameter of scanning electron microscope

Inventor: Koji Kaneko (Yokohama, JP)
Assignee: NGR INC.
H01J37/222G06T7/13G06T7/60H01J37/21H01J37/265H01J37/28G06T2207/10061G06T2207/30168H01J37/20H01J2237/1501H01J2237/1532H01J2237/216H01J2237/221
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,446,365
App. No.
16/021,017
Granted
Oct 15, 2019
Kind
B2
Abstract

A method capable of verifying whether operation parameters, such as a focus parameter and an astigmatism correction parameter, of a scanning electron microscope are correctly adjusted. This method includes: determining a ratio of a length of an edge in a first direction to a length of the edge in a second direction perpendicular to the first direction, the edge being an edge of a pattern selected from design data; generating images of the pattern while changing an operation parameter of a scanning electron microscope; calculating an edge sharpness in the first direction of each of the images and calculating an edge sharpness in the second direction of each of the images; determining a ratio of a peak value of the edge sharpness in the first direction to a peak value of the edge sharpness in the second direction; and emitting an alarm if the ratio of the peak values does not coincide with the ratio of the lengths of the edge.

Claims (10)

1. A method of verifying an operation parameter of a scanning electron microscope, comprising:

calculating a first length of an edge in a first direction and a second length of the edge in a second direction from dimensions of a pattern selected from design data for a wafer the dimensions being contained in the design data, the second direction being perpendicular to the first direction;

determining a ratio of the first length to the second length;

generating images of a shape on the wafer corresponding to the pattern while changing the operation parameter of the scanning electron microscope;

calculating an edge sharpness in the first direction of each of the images and calculating an edge sharpness in the second direction of the shape in each of the images;

determining a ratio of a peak value of the edge sharpness in the first direction to a peak value of the edge sharpness in the second direction; and

emitting an alarm from a computer if the ratio of the peak values does not coincide with the ratio of the first length to the second length.

2. The method according to claim 1 , further comprising:

applying corner-rounding process to the pattern.

3. The method according to claim 1 , wherein the operation parameter is one of a focus parameter, an astigmatism correction parameter, and a lens alignment correction parameter.

Assignments (2)
CHANGE OF NAME Recorded Jan 14, 2020
From: NGR INC.
To: TASMIT, INC.
Reel/Frame 051590/0962 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 28, 2018
From: KANEKO, KOJI
To: NGR INC.
Reel/Frame 046228/0241 →
Priority Claims (1)
JP 2017-127406 · Jun 29, 2017 · national
Continuity (1)
Related Publication 20190006145A1 · Jan 3, 2019
Cited By (2)
US 12,347,642 US 12,614,693