IP Library Granted Patent US 10,451,559
Granted Patent B2
US 10,451,559 · App. 16/102,178 · Granted Oct 22, 2019

Illumination source for an inspection apparatus, inspection apparatus and inspection method

Inventors: Peter Danny Van Voorst (Nijmegen, NL); Nan Lin (Eindhoven, NL); Sander Bas Roobol (Veldhoven, NL); Simon Gijsbert Josephus Mathijssen (Rosmalen, NL); Sietse Thijmen Van Der Post (Utrecht, NL)
Assignee: ASML Netherlands B.V.
G01N21/8806G01N21/9501G03F7/7065G03F7/70616H05G2/00G01N2021/95676H05G2/008
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Quick Facts
Patent No.
US 10,451,559
App. No.
16/102,178
Granted
Oct 22, 2019
Kind
B2
Abstract

Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

Claims (24)

1. An illumination source for generating high harmonic radiation, comprising:

a high harmonic generation medium;

a single pump radiation source configured to emit a single beam of pump radiation to excite the high harmonic generation medium to generate high harmonic radiation; and

a compensatory optical device configured to spatially modulate a wavefront of the beam of pump radiation prior to it exciting the high harmonic generation medium,

wherein the entire beam of pump radiation is spatially modulated by the compensatory optical device, such that the spatial modulation of the wavefront of the beam of pump radiation causes the spatial modulation of a wavefront of the high harmonic radiation.

2. The illumination source of claim 1 , wherein the compensatory optical device is configured to spatially modulate the wavefront of the beam of pump radiation to correct a position error of a beam of the high harmonic radiation.

3. The illumination source of claim 2 , wherein the compensatory optical device is configured to:

receive a position signal describing the position of a focused point of a beam wherein the beam is the beam of pump radiation or the beam of the high harmonic radiation;

determine a correction for the position of the focused point of the beam relative to a desired position in terms of a wavefront modulation of the beam of pump radiation based on the position signal; and

implement the correction.

4. The illumination source of claim 3 , further comprising a position detector configured to measure the focused point of the beam to generate the position signal.

5. The illumination source of claim 4 , wherein the position detector is configured to measure the position of the focused point of the beam of pump radiation.

6. The illumination source of claim 4 , wherein the position detector is configured to measure the position of the focused point of the beam of high harmonic radiation.

7. The illumination source of claim 6 , wherein the position detector is further configured to measure a spot size of the focused point of the beam of high harmonic radiation and the compensatory optical device is further configured to determine the correction to additionally minimize the spot size.

8. The illumination source of claim 1 , wherein the compensatory optical device is configured to spatially modulate the wavefront of the beam of pump radiation to impart a desired profile on the beam of pump radiation, thereby imparting a corresponding profile on a beam of the high harmonic radiation.

9. The illumination source of claim 1 , wherein the compensatory optical device is transmissive.

10. The illumination source of claim 1 , wherein the compensatory optical device is configured to co-optimize both a spot size of the high harmonic radiation and a beam position of the high harmonic radiation based on feedback information from one or more position detectors.

11. An illumination source for generating high harmonic radiation, comprising:

a high harmonic generation medium;

a single pump radiation source configured to emit a single beam of pump radiation to excite the high harmonic generation medium to generate high harmonic radiation; and

a compensatory optical device configured to spatially modulate a wavefront of the beam of pump radiation prior to it exciting the high harmonic generation medium to compensate for a slope error due to manufacturing imperfections in one or more optical elements,

wherein the compensatory optical device is configured to decrease the slope error and minimize a spot size of the high harmonic radiation.

12. The illumination source of claim 11 , wherein the compensatory optical device is tuned in a calibration step and configured to optimize a wavefront correction to the slope error.

13. The illumination source of claim 11 , wherein the slope error is measured and used to determine an initial configuration of the compensatory optical device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 19, 2019
From: VAN VOORST, PETER DANNY; LIN, NAN; ROOBOL, SANDER BAS; MATHIJSSEN, SIMON GIJSBERT JOSEPHUS; VAN DER POST, SIETSE THIJMEN
To: ASML NETHERLANDS B.V.
Reel/Frame 049510/0559 →
Priority Claims (1)
EP 16188816 · Sep 14, 2016 · regional
Continuity (2)
Division 15683216 · Aug 22, 2017
Related Publication 20190003981A1 · Jan 3, 2019
Cited By (2)
US 12,585,197 US 12,650,378