IP Library › Granted Patent US 10,473,525
Granted Patent B2
US 10,473,525 · App. 15/648,035 · Granted Nov 12, 2019

Spatially resolved optical emission spectroscopy (OES) in plasma processing

Inventors: Ching-Ling Meng (Sunnyvale, CA); Holger Tuitje (Fremont, CA); Yan Chen (Santa Clara, CA); Mihail Mihaylov (San Jose, CA)
Assignee: TOKYO ELECTRON LIMITED
G01J3/443G01N21/31G01N21/68G01N2201/10
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Quick Facts
Patent No.
US 10,473,525
App. No.
15/648,035
Granted
Nov 12, 2019
Kind
B2
Abstract

Disclosed is a method, system, and apparatus for optical emission measurement. The apparatus includes a collection system for collecting a plasma optical emission spectra through an optical window disposed at a wall of a plasma processing chamber. The optical system includes a mirror configured to scan a plurality of non-coincident rays across the plasma processing chamber; and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra.

Claims (48)

1. An apparatus for optical emission measurement, the apparatus comprising:

a plasma processing chamber;

an optical window disposed on a wall of the plasma processing chamber; and

a collection system for collecting a plasma optical emission spectra through the optical window, the collection system including:

a mirror system configured to scan a plurality of non-coincident rays across the plasma processing chamber; and

a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra, wherein a center of rotation of the plurality of non-coincident rays is substantially at the optical window.

2. The apparatus of claim 1 , wherein the telecentric coupler includes:

at least one collection lens; and

at least one coupling lens.

3. The apparatus of claim 2 , wherein the at least one collection lens or the at least one coupling lens are achromatic lenses.

4. The apparatus of claim 2 , wherein the telecentric coupler further includes:

an aperture disposed between the at least one collection lens and the at least coupling lens for defining a diameter of the plurality of non-coincident rays.

5. The apparatus of claim 1 , wherein the mirror system includes a scanning mirror.

6. The apparatus of claim 5 , wherein the scanning mirror is mounted on and scanned by a galvanometer scanning stage.

7. The apparatus of claim 5 , wherein the scanning mirror is mounted on and scanned by a stepper motor.

8. The apparatus of claim 5 , wherein the mirror system includes:

a transfer mirror;

a fold mirror; and

wherein the transfer mirror is configured to transfer the collected signal to the fold mirror and the fold mirror is configured to transfer the collected signal to a scanning mirror.

9. The apparatus of claim 1 , wherein the telecentric coupler includes:

a collection triplet lens configured to collect the optical signal from the mirror system; and

two coupling triplet lenses configured to focus the collected signal into an end of an optical fiber coupled to the spectrometer.

10. The apparatus of claim 1 , further comprising:

a second optical window; and

a second collection system for collecting the plasma optical emission spectra through the second optical window disposed at the wall of the plasma processing chamber, the second optical window having a center axis perpendicular to the center axis of the optical window.

11. The apparatus of claim 1 , wherein the collection system further includes:

a linear arc stage holding the mirror system, and the telecentric coupler, the linear arc stage being configured to move radially with respect to a center axis of the optical window causing the plurality of non-coincident rays to scan across the plasma processing chamber.

12. The apparatus of claim 11 , wherein the mirror system includes a fold mirror.

13. The apparatus of claim 1 , wherein the plurality of non-coincident rays are scanned 25° of a center axis of the optical window across the plasma processing chamber.

14. The apparatus of claim 1 , wherein the collection system has a low numerical aperture.

15. The apparatus of claim 1 , wherein the optical signal is collected from 21 non-coincident rays.

16. A system for plasma processing, comprising:

a plasma processing chamber;

an optical window disposed on a wall of the plasma processing chamber;

a collection system for collecting plasma optical emission spectra through the optical window;

a spectrometer coupled to the collection system for measuring the plasma optical emission spectra; and

wherein the collection system includes

a mirror system configured to scan a plurality of non-coincident rays across the plasma processing chamber, and

a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to the spectrometer, wherein a center of rotation of the plurality of non-coincident rays is substantially at the optical window.

17. A method for optical emission measurement, comprising:

depositing an optical window at a wall of a plasma processing chamber;

providing a collection system for collecting plasma optical emission spectra through the optical window, the collection system including a mirror system and a telecentric coupler;

scanning a plurality of non-coincident rays across the plasma processing chamber using the mirror system;

collecting an optical signal from a plasma via the telecentric coupler; and

directing the optical signal to a spectrometer for measuring the plasma optical emission spectra, wherein a center of rotation of the plurality of non-coincident rays is substantially at the optical window.

18. The method of claim 17 , wherein the mirror system includes at least a transfer mirror and a fold mirror.

19. The system of claim 16 , wherein the spectrometer is an ultra broadband high resolution spectrometer.

20. The system of claim 16 , wherein the plurality of non-coincident rays are scanned 30° of a center axis of the optical window across the plasma processing chamber.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 9, 2018
From: MENG, CHING-LING; TUITJE, HOLGER; CHEN, YAN; MIHAYLOV, MIHAIL
To: TOKYO ELECTRON LIMITED
Reel/Frame 047464/0202 →
Continuity (3)
Continuation In Part 14530164 · Oct 31, 2014
Provisional Application 61898975 · Nov 1, 2013
Related Publication 20170314991A1 · Nov 2, 2017
Cited By (4)
US 12,265,057 US 12,474,209 US 12,487,182 US 12,614,705