IP Library Granted Patent US 10,516,010
Granted Patent B2
US 10,516,010 · App. 14/333,078 · Granted Dec 24, 2019

Light emitting apparatus and method for manufacturing the same

Inventors: Shunpei Yamazaki (Tokyo, JP); Satoshi Murakami (Kanagawa, JP); Masayuki Sakakura (Kanagawa, JP); Toru Takayama (Kanagawa, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
H01L27/3244H01L29/16H01L29/66757H01L29/78621H01L29/78645H01L29/78675H01L29/78696H01L27/12H01L27/1248H01L27/3246H01L27/3258H01L51/5008H01L51/524H01L51/5253H01L51/56H01L2227/323H01L2251/566
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,516,010
App. No.
14/333,078
Granted
Dec 24, 2019
Kind
B2
Abstract

The light-emitting apparatus comprising thin film transistors and light emitting elements, comprises; a second inorganic insulation layer on a gate electrode, a first organic insulation layer on the second inorganic insulation layer, a third inorganic insulation layer on the first organic insulation layer, an anode on the third inorganic insulation layer, a second organic insulation layer overlapping with the end of the anode and having an inclination angle of 35 to 45 degrees, a fourth inorganic insulation layer on the upper and side surfaces of the second organic insulation layer and having an opening over the anode, an organic compound layer in contact with the anode and the fourth inorganic insulation layer and containing light-emitting material, and a cathode in contact with the organic compound layer, wherein the third and the fourth inorganic insulation layers comprise silicon nitride or aluminum nitride.

Claims (30)

1. A light emitting device comprising:

a pixel, the pixel comprising:

a semiconductor layer, wherein the semiconductor layer is a single layer comprising a first region, a second region, and a region having a meandering shape in a top view between the first region and the second region, wherein the region having the meandering shape comprises a first channel forming region, a second channel forming region, a third channel forming region, a fourth channel forming region, a fifth channel forming region, a sixth channel forming region, and a seventh channel forming region;

a light emitting element electrically connected to the first region; and

a wiring electrically connected to the second region.

2. A light emitting device comprising:

a pixel, the pixel comprising:

a semiconductor layer, wherein the semiconductor layer is a single layer comprising a first region, a second region, and a region having a meandering shape in a top view between the first region and the second region, wherein the region having the meandering shape comprises a first channel forming region, a second channel forming region, a third channel forming region, a fourth channel forming region, a fifth channel forming region, a sixth channel forming region, and a seventh channel forming region;

a gate electrode layer over the semiconductor layer;

a light emitting element comprising a first electrode, an EL layer, and a second electrode, the first electrode being electrically connected to the first region;

an organic insulation layer over an end of the first electrode; and

a wiring electrically connected to the second region.

3. The light emitting device according to claim 1 , wherein the first region and the second region do not overlap with each other.

4. The light emitting device according to claim 1 , wherein the semiconductor layer comprises polycrystalline silicon.

5. The light emitting device according to claim 1 , wherein the second region includes an end of the semiconductor layer.

6. The light emitting device according to claim 2 , wherein the first region and the second region do not overlap with each other.

7. The light emitting device according to claim 2 , wherein the semiconductor layer comprises polycrystalline silicon.

8. The light emitting device according to claim 2 , wherein the second region includes an end of the semiconductor layer.

9. The light emitting device according to claim 2 , wherein the gate electrode layer overlaps at least one of the first channel forming region, the second channel forming region, the third channel forming region, the fourth channel forming region, the fifth channel forming region, the sixth channel forming region, or the seventh channel forming region.

10. A light emitting device comprising:

a pixel, the pixel comprising:

a semiconductor layer, wherein the semiconductor layer is a single layer comprising a first region, a second region, and a region having a meandering shape in a top view between the first region and the second region, wherein the region having the meandering shape comprises a first channel forming region, a second channel forming region, a third channel forming region, a fourth channel forming region, a fifth channel forming region, a sixth channel forming region, and a seventh channel forming region;

a light emitting element electrically connected to the first region through a first contact hole; and

a wiring electrically connected to the second region through a second contact hole.

11. A light emitting device comprising:

a pixel, the pixel comprising:

a semiconductor layer, wherein the semiconductor layer is a single layer comprising a first region, a second region, a third region, and a region having a meandering shape in a top view between the first region and the second region, wherein the region having the meandering shape comprises a first channel forming region, a second channel forming region, a third channel forming region, a fourth channel forming region, a fifth channel forming region, a sixth channel forming region, and a seventh channel forming region;

a light emitting element electrically connected to the first region through a first contact hole;

a first wiring electrically connected to the second region through a second contact hole; and

a second wiring electrically connected to the third region through a third contact hole.

Priority Claims (2)
JP 2001-345430 · Nov 9, 2001 · national
JP 2002-143802 · May 17, 2002 · national
Continuity (7)
Continuation 13417362 · Mar 12, 2012
Continuation 13082104 · Apr 7, 2011
Continuation 12762469 · Apr 19, 2010
Continuation 12244984 · Oct 3, 2008
Continuation 11224100 · Sep 13, 2005
Division 10289261 · Nov 7, 2002
Related Publication 20150008439A1 · Jan 8, 2015
Cited By (1)
US 12,471,370