Semiconductor devices including two-dimensional materials and methods of manufacturing the semiconductor devices
Semiconductor devices including two-dimensional (2D) materials and methods of manufacturing the semiconductor devices are provided. A semiconductor device may include a semiconductor layer including layers of a 2D material, and an intercalation material between the layers of the 2D material. The semiconductor device may further include a first conductive layer on a first surface of the semiconductor layer and a second conductive layer on a second surface of the semiconductor layer that is opposite the first surface. A portion of the 2D material may have a first crystalline structure, and another portion of the 2D material may have a second crystalline structure that is different from the first crystalline structure. The 2D material may include a metal chalcogenide-based material.
1. A semiconductor device comprising:
a semiconductor layer including a stack of a plurality of lavers of a two-dimensional (2D) material, and an intercalation material between the plurality of layers of the 2D material;
a first conductive layer on a first surface of the semiconductor layer; and
a second conductive layer on a second surface of the semiconductor layer, the second surface being opposite the first surface.
2. The semiconductor device of claim 1 , wherein the 2D material includes a metal chalcogenide-based material.
3. The semiconductor device of claim 2 , wherein the 2D material includes a transition metal dichalcogenide (TMD) material.
4. The semiconductor device of claim 1 , wherein
a first portion of the 2D material has a first crystalline structure, and
a second portion of the 2D material has a second crystalline structure that is different from the first crystalline structure.
5. The semiconductor device of claim 4 , wherein
the first crystalline structure includes a 2H phase, and
the second crystalline structure includes at least one of a 1T phase and a 1T′ phase.
6. The semiconductor device of claim 4 , wherein a region having the second crystalline structure within the 2D material has a higher electric conductivity than a region having the first crystalline structure within the 2D material.
7. The semiconductor device of claim 1 , wherein the intercalation material includes at least one of lithium (Li) and potassium (K).
8. The semiconductor device of claim 1 , wherein at least one of the first and second conductive layers includes one of metal, metal compound, and graphene.
9. The semiconductor device of claim 1 , wherein
the first and second conductive layers include metal or metal compound, or
the first and second conductive layers include graphene, or
one of the first and second conductive layers includes metal or metal compound and an other of the first and second conductive layers includes graphene.
10. The semiconductor device of claim 1 , wherein the semiconductor layer has a thickness of 1 nm to several hundreds of μm.
11. The semiconductor device of claim 1 , wherein a width of the semiconductor layer is, in a range of several um to several hundreds of μm.
12. The semiconductor device of claim 1 , wherein
the semiconductor layer is an undoped layer, or
the semiconductor layer includes one of a p-type dopant and an n-type dopant.
13. The semiconductor device of claim 1 , further comprising:
a gate electrode apart from the semiconductor layer; and
a gate insulation layer between the semiconductor layer and the gate electrode, wherein the gate insulation layer is connected to the gate electrode and the semiconductor layer.
14. The semiconductor device of claim 13 , wherein
the gate insulation layer is on a surface of the gate electrode, and
the first conductive layer, the semiconductor layer, and the second conductive layer are sequentially stacked on a surface of the gate insulation layer.
15. The semiconductor device of claim 1 , wherein the semiconductor device is a transistor.
16. The semiconductor device of claim 1 , wherein the semiconductor device is an optoelectronic device.
17. A method of manufacturing a semiconductor device including first and second conductive layers respectively connected to opposite surfaces of a semiconductor layer, the method comprising:
providing a device unit including the semiconductor layer, the semiconductor layer including a stack of a plurality of layers of a 2D material; and
processing the device unit with a solution including an intercalation material, the processing the device unit including inserting the intercalation material between the plurality of layers of the 2D material.
18. The method of claim 17 , wherein the providing the device unit includes:
forming the first conductive layer;
forming the semiconductor layer on the first conductive layer; and
forming the second conductive layer on the semiconductor layer.
19. The method of claim 17 , wherein the solution includes at least one of n-butyllithium, Cert-butyllithium, methyllithium, and a potassium hexalluorophosphate solution.
20. The method of claim 17 , wherein
the 2D material has a first crystalline structure before the intercalation material is inserted between the plurality of layers of the 2D material, and
the inserting the intercalation material between the plurality of lavers of the 2D material includes changing a crystalline structure of a portion of the 2D) material to a second crystalline structure.
21. The method of claim 20 , wherein
the first crystalline structure includes a 2H phase, and
the second crystalline structure includes at least one of a 1T phase and a 1T′ phase.
22. The method of claim 17 , wherein the 2D material includes a transition metal dichalcogenide (TMD) material.
23. The method of claim 17 , wherein at least one of the first and second conductive layers includes one of metal, metal compound, and graphene.
24. The method of claim 17 , further comprising:
forming a gate electrode spaced apart from the semiconductor layer.