IP Library › Granted Patent US 10,600,785
Granted Patent B2
US 10,600,785 · App. 15/927,539 · Granted Mar 24, 2020

Layout construction for addressing electromigration

Inventors: Seid Hadi Rasouli (San Diego, CA); Michael Joseph Brunolli (Escondido, CA); Christine Sung-An Hau-Riege (Fremont, CA); Mickael Malabry (San Diego, CA); Sucheta Kumar Harish (San Diego, CA); Prathiba Balasubramanian (Chennai, IN); Kamesh Medisetti (Bangalore, IN); Nikolay Bomshtein (San Diego, CA); Animesh Datta (San Diego, CA); Ohsang Kwon (San Diego, CA)
Assignee: QUALCOMM Incorporated
H01L27/0921H01L21/823871H01L23/4824H01L23/528H01L27/0207H01L27/092H03K17/168H03K17/6872H01L23/522H01L2924/0002
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Quick Facts
Patent No.
US 10,600,785
App. No.
15/927,539
Granted
Mar 24, 2020
Kind
B2
Abstract

A CMOS device with a plurality of PMOS transistors and a plurality of NMOS transistors includes a first interconnect and a second interconnect on an interconnect level connecting a first subset and a second subset of PMOS drains together, respectively. The first and second subsets are different and the first and second interconnect are disconnected on the interconnect level. A third interconnect and a fourth interconnect on the interconnect level connect a first subset and a second subset of the NMOS drains together, respectively. The third interconnect and the fourth interconnect are disconnected on the interconnect level. The first, second, third, fourth interconnects are coupled together through at least one other interconnect level. Additional interconnects on the interconnect level connect the first and third interconnects together, and the second and fourth interconnects together, to provide parallel current paths with a current path through the at least one other interconnect level.

Claims (29)

1. A complementary metal oxide semiconductor (CMOS) device including a plurality of p-type metal oxide semiconductor (PMOS) transistors each having a PMOS drain and a plurality of n-type metal oxide semiconductor (NMOS) transistors each having an NMOS drain, comprising:

a first interconnect on an interconnect level connecting a first subset of the PMOS drains together;

a second interconnect on the interconnect level connecting a second subset of the PMOS drains together, the second subset of the PMOS drains being different than the first subset of the PMOS drains, the first interconnect and the second interconnect being disconnected on the interconnect level;

a third interconnect on the interconnect level connecting a first subset of the NMOS drains together;

a fourth interconnect on the interconnect level connecting a second subset of the NMOS drains together, the second subset of the NMOS drains being different than the first subset of the NMOS drains, the third interconnect and the fourth interconnect being disconnected on the interconnect level, wherein the first interconnect, the second interconnect, the third interconnect, and the fourth interconnect are coupled together through at least one other interconnect level; and

one or more additional interconnects on the interconnect level connecting at least the first interconnect to the third interconnect together, and the second interconnect to the fourth interconnect together, to provide one or more parallel current paths with a current path through the at least one other interconnect level.

2. The device of claim 1 , wherein the first interconnect, the second interconnect, the third interconnect, and the fourth interconnect are coupled together through a set of interconnects through the at least one other interconnect level.

3. The device of claim 2 , wherein the one or more additional interconnects comprise a fifth interconnect on the interconnect level offset from the set of interconnects to connect the first interconnect and the third interconnect together, and a sixth interconnect on the interconnect level offset from the set of interconnects to connect the second interconnect and the fourth interconnect together, wherein the fifth interconnect and the sixth interconnect being on opposite sides of the set of interconnects.

4. The device of claim 2 , wherein the at least one additional interconnect level comprises a second interconnect level and a third interconnect level, and the set of interconnects comprises:

a seventh interconnect on the second interconnect level, the seventh interconnect coupling the first interconnect and the second interconnect together;

an eighth interconnect on the second interconnect level, the eighth interconnect coupling the third interconnect and the fourth interconnect together; and

a ninth interconnect on the third interconnect level coupling the seventh interconnect and the eighth interconnect together.

5. The device of claim 1 , wherein the first interconnect, the second interconnect, the third interconnect, and the fourth interconnect are each less than 2 μm in length.

6. The device of claim 4 , wherein the seventh interconnect and the eighth interconnect are each less than 2 μm in length.

7. A complementary metal oxide semiconductor (CMOS) device including a plurality of p-type metal oxide semiconductor (PMOS) transistors each having a PMOS drain and a plurality of n-type metal oxide semiconductor (NMOS) transistors each having an NMOS drain, comprising:

means for connecting a first subset of the PMOS drains with a first interconnect on an interconnect level;

means for connecting a second subset of the PMOS drains with a second interconnect on the interconnect level, the second subset of the PMOS drains being disconnected from the first subset of the PMOS drains on the interconnect level;

means for connecting a first subset of the NMOS drains with a third interconnect on the interconnect level;

means for connecting a second subset of the NMOS drains with a fourth interconnect on the interconnect level, the second subset of the NMOS drains being disconnected from the first subset of the NMOS drains on the interconnect level;

means for coupling the first interconnect, the second interconnect, the third interconnect, and the fourth interconnect together through at least one other interconnect level; and

means for connecting at least the first interconnect to the third interconnect together, and the second interconnect to the fourth interconnect together, through one or more additional interconnects on the interconnect level to provide one or more parallel current paths with a current path through the at least one other interconnect level.

8. The device of claim 7 , wherein the means for coupling the first interconnect, the second interconnect, the third interconnect, and the fourth interconnect together through at least one other interconnect level comprises means for coupling the first interconnect, the second interconnect, the third interconnect, and the fourth interconnect through a set of interconnects through the at least one other interconnect level.

9. The device of claim 8 , wherein the means for connecting at least the first interconnect to the third interconnect together, and the second interconnect to the fourth interconnect together, through one or more additional interconnects on the interconnect level comprises means for connecting the first interconnect and the third interconnect together through a fifth interconnect on the interconnect level offset from the set of interconnects, and means for connecting the second interconnect and the fourth interconnect together through a sixth interconnect on the interconnect level offset from the set of interconnects, the fifth interconnect and the sixth interconnect being on opposite sides of the set of interconnects.

10. The device of claim 8 , wherein the at least one additional interconnect level comprises a second interconnect level and a third interconnect level, and the set of interconnects comprises:

means for coupling the first interconnect and the second interconnect together through a seventh interconnect on the second interconnect level;

means for coupling the third interconnect and the fourth interconnect together through an eighth interconnect on the second interconnect level; and

means for coupling the seventh interconnect and the eighth interconnect together through a ninth interconnect on the third interconnect level.

11. The device of claim 7 , wherein the first interconnect, the second interconnect, the third interconnect, and the fourth interconnect are each less than 2 μm in length.

12. The device of claim 10 , wherein the seventh interconnect and the eighth interconnect are each less than 2 μm in length.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 21, 2018
From: RASOULI, SEID HADI; BRUNOLLI, MICHAEL JOSEPH; HAU-RIEGE, CHRISTINE SUNG-AN; MALABRY, MICKAEL; HARISH, SUCHETA KUMAR; BALASUBRAMANIAN, PRATHIBA; MEDISETTI, KAMESH; BOMSHTEIN, NIKOLAY; DATTA, ANIMESH; KWON, OHSANG
To: QUALCOMM INCORPORATED
Reel/Frame 045304/0325 →
Continuity (2)
Continuation 13975185 · Aug 23, 2013
Related Publication 20180211957A1 · Jul 26, 2018
Cited By (1)
US 12,310,117