IP Library Granted Patent US 10,636,638
Granted Patent B2
US 10,636,638 · App. 16/041,679 · Granted Apr 28, 2020

Mass analysis apparatus and method

Inventors: Masahiro Sakuta (Tokyo, JP); Shin Okawa (Tokyo, JP); Yoshiki Matoba (Tokyo, JP)
Assignee: HITATCHI HIGH-TECH SCIENCE CORPORATION
H01J49/0036H01J49/10H01J49/4215
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Quick Facts
Patent No.
US 10,636,638
App. No.
16/041,679
Granted
Apr 28, 2020
Kind
B2
Abstract

Disclosed is a mass analysis apparatus and method, wherein the precision of detection of a first material including a second material is improved, without enlarging the apparatus, and the measurement time is reduced. The mass analysis apparatus for analyzing a sample containing a first material including an organic compound and at least one second material including an organic compound and having a mass spectrum peak overlapping that of the first material includes a peak correction unit, wherein, when an intensity ratio (peak B)/(peak A) of peak A, not overlapping that of the first material, and peak B, overlapping that of the first material, is a correction coefficient (W), an intensity of a net peak D of the mass spectrum of the first material is calculated by subtracting W×(intensity of peak A) from an intensity of a peak C of the mass spectrum of the first material in the sample.

Claims (4)

1. A mass analysis method for analyzing a sample containing a first material comprising an organic compound and at least one second material comprising an organic compound and having a mass spectrum peak overlapping a mass spectrum peak of the first material, the mass analysis method comprising:

ionizing, by an ion source, the first material and the second material,

detecting, by a detector, a mass spectrum peak of a gas component which is ionized in the ion source,

when an intensity ratio (peak B)/(peak A) of peak A, which does not overlap the mass spectrum peak of the first material, and peak B, which overlaps the mass spectrum peak of the first material, among mass spectrum peaks of standard materials for the at least one second material, is a correction coefficient (W), calculating, by a processor of a computer, an intensity of a net peak D of a mass spectrum of the first material by subtracting W×(intensity of peak A) from an intensity of a peak C of the mass spectrum of the first material in the sample.

Assignments (3)
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072905/0225 →
CHNAGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0725 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 25, 2018
From: SAKUTA, MASAHIRO; OKAWA, SHIN; MATOBA, YOSHIKI
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 046461/0943 →
Continuity (1)
Related Publication 20190027349A1 · Jan 24, 2019