Packaging structure and fabrication method thereof
A packaging structure and a method for fabricating the packaging structure are provided. The method includes providing a wafer. The wafer has a first surface and a second surface opposing to the first surface, and the wafer includes a plurality of first chip regions and a spacing region between adjacent first chip regions. The method also includes forming a first adhesive layer adhered to the second surface of the wafer, and forming an opening penetrating through the spacing region of the wafer and a plurality of first chips in the first chip regions on sides of the opening. Further, the method includes forming a molding layer in the opening. The molding layer covers a sidewall of the first chip and exposes a top surface of the first chip.
1. A method for fabricating a packaging structure, comprising:
providing a wafer, wherein the wafer has a first surface and a second surface opposing to the first surface, and the wafer includes a plurality of first chip regions and a spacing region between adjacent first chip regions;
forming a first adhesive layer, adhered to the second surface of the wafer;
forming an opening penetrating through the spacing region of the wafer and a plurality of first chips in the first chip regions on sides of the opening;
forming a molding layer in the opening, wherein the molding layer covers sidewalls of each of the plurality of the first chips and exposes a top surface of each of the plurality of the first chips; and
after forming the molding layer, forming a metal interconnection structure on the molding layer and on the plurality of the first chips, wherein the metal interconnection structure includes a metal wiring layer on the molding layer and on the plurality of the first chips, a protection layer on the metal wiring layer, an under ball metal structure on the protection layer, and a metal solder ball on the under ball metal structure.
2. The method according to claim 1 , wherein forming the opening and the plurality of first chip includes:
forming a first initial opening to expose the first adhesive layer by performing a contactless half-cutting process on the spacing region of the wafer, wherein the first initial opening has a first predetermined depth smaller than a thickness of the wafer;
after forming the first initial opening, performing a polishing process on the first surface of the wafer until the first initial opening is exposed to provide the first chips; and
after forming the first chips, forming the opening by performing a film expansion process on the first initial opening.
3. The method according to claim 2 , wherein the film expansion process includes:
providing a film expansion apparatus having a carrier stage;
placing the wafer on the carrier stage with the first surface of the wafer facing upward; and
performing the film expansion process on the first initial opening.
4. The method according to claim 3 , wherein:
the film expansion process is performed at a temperature in a range of approximately 45° C.-55° C.
5. The method according to claim 3 , before placing the wafer on the carrier stage, further including:
preheating the carrier stage to a temperature in a range of approximately 45° C.-55° C. for a preheating time in a range of approximately 5 minutes-10 minutes.
6. A method for fabricating a packaging structure, comprising:
providing a wafer, wherein the wafer has a first surface and a second surface opposing to the first surface, and the wafer includes a plurality of first chip regions and a spacing region between adjacent first chip regions;
forming a first adhesive layer, adhered to the second surface of the wafer;
forming an opening penetrating through the spacing region of the wafer and a plurality of first chips in the first chip regions on sides of the opening; and
forming a molding layer in the opening, wherein the molding layer covers sidewalls of each of the plurality of the first chips and exposes a top surface of each of the plurality of the first chips, wherein:
the spacing region includes a plurality of second chip regions, and
a plurality of second chips are formed in the second chip regions.
7. The method according to claim 6 , wherein forming the plurality of second chips, the plurality of first chips, and the opening includes:
forming a second initial opening to expose the first adhesive layer by performing a contactless, half-cutting process on the spacing region between each of the plurality of the first chip regions and an adjacent second chip region, wherein the second initial opening has a second predetermined depth smaller than a thickness of the wafer;
after forming the second initial opening, performing a polishing process on the first surface of the wafer until the second initial opening is exposed to provide the plurality of first chips in the first chip regions, and to provide the plurality of second chips in the second chip regions; and
after forming the plurality of first chips and the plurality of second chips, forming the opening between adjacent first chips by taking out the second chips.
8. The method according to claim 7 , wherein a tool for taking out the second chip includes:
a needle, including one of a pin and a needle tube.
9. The method according to claim 2 , wherein the contactless, half-cutting process includes:
an infrared stealth dicing process.
10. The method according to claim 1 , wherein:
a coefficient of thermal expansion of the molding layer is greater than a coefficient of thermal expansion of the plurality of the first chips.
11. The method according to claim 10 , wherein:
the molding layer is made of one of epoxy resin, imide resin, benzocyclobutene resin, polybenzoxazole resin, polybutylene terephthalate, polycarbonate, polyethylene terephthalate, polyethylene, polypropylene, polyolefin, polyurethane, polyolefin, polyethersulfone, polyamide, polyurethane, ethylene-vinyl acetate copolymer, and polyvinyl alcohol; and
the plurality of the first chips are made of silicon.
12. The method according to claim 6 , wherein forming the opening and the plurality of first chip includes:
forming a first initial opening to expose the first adhesive layer by performing a contactless half-cutting process on the spacing region of the wafer, wherein the first initial opening has a first predetermined depth smaller than a thickness of the wafer;
after forming the first initial opening, performing a polishing process on the first surface of the wafer until the first initial opening is exposed to provide the first chips; and
after forming the first chips, forming the opening by performing a film expansion process on the first initial opening.
13. The method according to claim 12 , wherein the film expansion process includes:
providing a film expansion apparatus having a carrier stage;
placing the wafer on the carrier stage with the first surface of the wafer facing upward; and
performing the film expansion process on the first initial opening.
14. The method according to claim 13 , wherein:
the film expansion process is performed at a temperature in a range of approximately 45° C.-55° C.
15. The method according to claim 13 , before placing the wafer on the carrier stage, further including:
preheating the carrier stage to a temperature in a range of approximately 45° C.-55° C. for a preheating time in a range of approximately 5 minutes-10 minutes.