IP Library Granted Patent US 10,697,767
Granted Patent B2
US 10,697,767 · App. 16/325,590 · Granted Jun 30, 2020

Sample for measuring particles, method for measuring particles and apparatus for measuring particles

Inventors: Tomihiro Hashizume (Tokyo, JP); Masatoshi Yasutake (Tokyo, JP); Sanato Nagata (Tokyo, JP)
Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
G01B15/08G01B15/00G01N15/02G01N15/06G01N23/225G01Q30/06
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Quick Facts
Patent No.
US 10,697,767
App. No.
16/325,590
Granted
Jun 30, 2020
Kind
B2
Abstract

To provide a sample for measuring particles enabling the three-dimensional particulate shape to be measured and the particulate species to be evaluated, the sample for measuring particles includes a substrate; isolated nanoparticles to be measured which are disposed on the substrate; and isolated standard nanoparticles which are disposed on the substrate in the vicinity of the isolated nanoparticles to be measured.

Claims (17)

1. An apparatus for measuring particles comprising:

a scanning probe or a charged particle beam probe; and

a substrate on which isolated nanoparticles to be measured are disposed and isolated standard nanoparticles are disposed in a vicinity of the isolated nanoparticles to be measured,

wherein three-dimensional shapes of the isolated nanoparticles to be measured are rectified with measuring results of the isolated standard nanoparticles disposed in the vicinity of the isolated nanoparticles to be measured in use.

2. A method for measuring particles comprising:

a first step of preparing a substrate on which isolated nanoparticles to be measured are disposed and isolated standard nanoparticles are disposed in a vicinity of the isolated nanoparticles to be measured;

a second step of measuring the isolated nanoparticles to be measured and the isolated standard nanoparticles which are disposed on the substrate employing a scanning probe or a charged particle beam probe;

a third step of deriving a shape of the scanning probe or a beam profile of the charged particle beam probe from results of the isolated standard nanop articles measured at the second step; and

a fourth step of rectifying three-dimensional shapes of the isolated nanoparticles to be measured employing the shape of the scanning probe or the beam profile of the charged particle beam probe.

3. The method for measuring particles according to claim 2 , wherein the substrate is a surface decorated substrate in which the surface is decorated with a functional group having chemical or physical interaction with the surface.

4. The method for measuring particles according to claim 2 ,

wherein the second step further includes a step of simultaneously measuring information on particulate shapes and information on physical properties.

5. The method for measuring particles according to claim 4 ,

wherein the information on particulate shapes include height, aspect ratio, circularity, asperity or phase roughness while the information on physical properties includes viscosity, friction force, electric current or magnetic force.

6. The method for measuring particles according to claim 5 ,

wherein a discrimination step of discriminating the isolated standard nanoparticles from the isolated nanoparticles to be measured further intervenes between the second and third steps; and

the discrimination step includes a step of discriminating the isolated standard nanoparticles from the isolated nanoparticles to be measured employing the information on particulate shapes or the information on physical properties.

Assignments (2)
CHANGE OF NAME Recorded May 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052662/0726 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 13, 2019
From: HASHIZUME, TOMIHIRO; YASUTAKE, MASATOSHI; NAGATA, SANATO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 048580/0423 →
Continuity (1)
Related Publication 20190178640A1 · Jun 13, 2019