Semiconductor device and method of manufacturing the same
In one embodiment, a method of manufacturing a semiconductor device includes alternately forming a plurality of first films and a plurality of second films on a substrate, and forming an opening in the first and second films. The method further includes sequentially forming a first insulator, a charge storage layer, a second insulator and a semiconductor layer on surfaces of the first and second films in the opening. The second insulator includes a silicon oxynitride film, and the silicon oxynitride film is formed using a first gas that includes silicon and a first element, a second gas that includes oxygen and nitrogen, and a third gas that includes a second element that reacts with the first element.
1. A method of manufacturing a semiconductor device, comprising:
alternately forming a plurality of first films and a plurality of second films on a substrate;
forming an opening in the first and second films; and
sequentially forming a first insulator, a charge storage layer, a second insulator and a semiconductor layer on surfaces of the first and second films in the opening, wherein
the second insulator includes a silicon oxynitride film, and
the silicon oxynitride film is formed using a first gas that includes silicon and a first element, a second gas that includes oxygen and nitrogen, and a third gas that includes a second element that reacts with the first element.
2. The method of claim 1 , wherein concentration of nitrogen with respect to silicon, oxygen and nitrogen in the silicon oxynitride film is equal to or higher than 15 at % and equal to or lower than 30 at %.
3. The method of claim 1 , wherein the silicon oxynitride film contains hydrogen, and concentration of hydrogen in the silicon oxynitride film is equal to or lower than 2×10 21 [atoms/cm 3 ].
4. The method of claim 1 , wherein the number of N—H bonds in the silicon oxynitride film is equal to or less than 2×10 21 [bonds/cm 3 ], and the number of Si—H bonds in the silicon oxynitride film is equal to or less than 5×10 20 [bonds/cm 3 ], where N, H and Si respectively indicate nitrogen, hydrogen and silicon.
5. The method of claim 1 , wherein the first element is chlorine, and the second element is hydrogen.
6. The method of claim 5 , wherein the second element is hydrogen that corresponds to light hydrogen or deuterium.
7. The method of claim 1 , wherein the second insulator is formed by processing of supplying the first gas, the second gas and the third gas being repeated for a plurality of cycles.
8. The method of claim 1 , wherein the second insulator is formed by further using a fourth gas that includes oxygen and nitrogen.
9. The method of claim 8 , wherein the second insulator is formed by processing of supplying the first gas, the second gas, the third gas and the fourth gas being repeated for a plurality of cycles.
10. The method of claim 9 , wherein, in each cycle, one of the second gas and the fourth gas is supplied before the third gas is supplied, and the other of the second gas and the fourth gas is supplied after the third gas is supplied.
11. The method of claim 10 , wherein, in each cycle, one of the second gas and the fourth gas is supplied at a first flow rate before the third gas is supplied, and the other of the second gas and the fourth gas is supplied at a second flow rate which is lower than the first flow rate after the third gas is supplied.
12. The method of claim 1 , wherein the second insulator is formed by further using a fifth gas that includes oxygen.
13. The method of claim 12 , wherein the second insulator is formed by processing of supplying the first gas, the second gas, the third gas and the fifth gas being repeated for a plurality of cycles.
14. A method of manufacturing a semiconductor device, comprising:
forming a first insulator;
forming a charge storage layer on a surface of the first insulator; and
forming a second insulator on a surface of the charge storage layer, wherein
the first or the second insulator includes a silicon oxynitride film, and
the silicon oxynitride film is formed using a first gas that includes silicon and a first element, a second gas that includes oxygen and nitrogen, and a third gas that includes a second element which reacts with the first element.
15. The method of claim 14 , wherein concentration of nitrogen with respect to silicon, oxygen and nitrogen in the silicon oxynitride film is equal to or higher than 15 at % and equal to or lower than 30 at %.
16. The method of claim 14 , wherein the silicon oxynitride film contains hydrogen, and concentration of hydrogen in the silicon oxynitride film is equal to or lower than 2×10 21 [atoms/cm 3 ].
17. The method of claim 14 , wherein the first element is chlorine, and the second element is hydrogen.