Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
Systems and methods for controlling directionality of ion flux at an edge region within a plasma chamber are described. One of the systems includes a radio frequency (RF) generator that is configured to generate an RF signal, an impedance matching circuit coupled to the RF generator for receiving the RF signal to generate a modified RF signal, and a plasma chamber. The plasma chamber includes an edge ring and a coupling ring located below the edge ring and coupled to the first impedance matching circuit to receive the modified RF signal. The coupling ring includes an electrode that generates a capacitance between the electrode and the edge ring to control the directionality of the ion flux upon receiving the modified RF signal.
1. A power transfer system comprising:
a ring-shaped portion;
a plurality of arms coupled to the ring-shaped portion;
a plurality of pins, wherein each of the plurality of pins is coupled to a corresponding one of the plurality of arms; and
an electrode coupled to the plurality of pins at different locations,
wherein the electrode is configured to receive radio frequency (RF) power at the locations via the plurality of arms and the plurality of pins from the ring-shaped portion.
2. The power transfer system of claim 1 , wherein the ring-shaped portion is a circular portion of a feed ring.
3. The power transfer system of claim 1 , wherein each of the plurality of pins includes a coaxial cable and a sleeve, wherein the sleeve covers the coaxial cable and is fabricated from an insulator material, wherein each of the plurality of arms is coupled to a corresponding one of the coaxial cables.
4. The power transfer system of claim 1 , wherein the plurality of pins include a first pin and a second pin, wherein the plurality of arms include a first arm and a second arm, wherein the first arm is coupled to the first pin and the second arm is coupled to the second pin.
5. The power transfer system of claim 1 , wherein the electrode is configured to be embedded within a coupling ring.
6. The power transfer system of claim 1 , wherein the ring-shaped portion is configured to be coupled via an arm to an RF rod of an RF transmission line.
7. The power transfer system of claim 1 , wherein the ring-shaped portion is configured to be coupled via an arm and an RF filter to an RF rod of an RF transmission line.
8. The power transfer system of claim 1 , wherein the electrode is a mesh electrode or a ring electrode.
9. A power transfer system comprising:
an arm;
a ring-shaped portion coupled to the arm;
a plurality of pins electrically coupled to the ring-shaped portion;
an electrode coupled to the plurality of pins,
wherein the electrode is configured to receive radio frequency (RF) power via the ring-shaped portion and the plurality of pins from the arm.
10. The power transfer system of claim 9 , wherein the arm is configured to be coupled to an RF rod of an RF transmission line.
11. The power transfer system of claim 9 , wherein the arm is configured to be coupled via an RF filter to an RF rod of an RF transmission line.
12. The power transfer system of claim 9 , wherein the ring-shaped portion is a circular portion of a feed ring.
13. The power transfer system of claim 9 , wherein each of the plurality of pins includes a coaxial cable and a sleeve, wherein the sleeve covers the coaxial cable and is fabricated from an insulator material.
14. The power transfer system of claim 9 , wherein the plurality of pins are coupled to the electrode at different locations under the electrode.
15. The power transfer system of claim 9 , wherein the electrode is configured to be embedded within a coupling ring.
16. The power transfer system of claim 9 , wherein the electrode is a mesh electrode or a ring electrode.
17. A plasma electrode assembly comprising:
an edge ring; and
a coupling ring having an electrode, wherein the coupling ring is placed below the edge ring;
wherein the electrode is coupled to a plurality of pins,
wherein the plurality of pins are coupled to a plurality of arms,
wherein the plurality of arms are coupled to a ring-shaped portion,
wherein the electrode is configured to receive radio frequency (RF) power via the plurality of arms and the plurality of pins from the ring-shaped portion.
18. The plasma electrode assembly of claim 17 , wherein the electrode is configured to be capacitively coupled to the edge ring via the coupling ring.
19. The plasma electrode assembly of claim 17 , wherein the edge ring is configured to interface with a gap between the edge ring and an upper electrode of a plasma chamber.
20. The plasma electrode assembly of claim 17 , wherein the ring-shaped portion is a circular portion of a feed ring.