Lithographic apparatus and device manufacturing method involving a heater
A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
1. A substrate stage component for a lithographic apparatus configured to project radiation onto a radiation-sensitive substrate, the substrate stage component comprising:
a support body configured to support the substrate;
a fluid-carrying channel configured to flow a fluid through at least part of the support body to enable heat transfer between the fluid and the at least part of the support body and/or the substrate;
a first port configured to connect to piping to allow the fluid into the fluid-carrying channel;
a second port separate from the first port and configured to connect to piping to allow the fluid to flow out of the fluid-carrying channel; and
a heater configured to heat at least a portion of the substrate and/or substrate stage component, at least a portion of a heat emitting element of the heater located lower than a top of the fluid-carrying channel.
2. The stage component of claim 1 , wherein at least part of the channel forms an essentially circular channel portion along the peripheral edge of the support body.
3. The stage component of claim 1 , wherein the fluid-carrying channel is in close proximity to a side of the body arranged to contact the substrate.
4. The stage component of claim 1 , wherein the heater comprises a plurality of heat emitting elements, the heat emitting elements being individually controllable.
5. The stage component of claim 1 , further comprising an array of temperature sensors configured to measure a temperature of at least a portion of the substrate and/or substrate stage component.
6. The stage component of claim 1 , comprising a plurality of burls to support the substrate.
7. The stage component of claim 1 , further comprising a control program configured to control the heater based on a position of the support body, or a velocity of the support body, or an acceleration of the support body, or at least part of a predetermined path of the support body, or any combination thereof.
8. A lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam onto a substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid; and
the substrate stage component of claim 1 .
9. A substrate stage component for a lithographic apparatus configured to project radiation onto a radiation-sensitive substrate, the substrate stage component comprising:
a support body configured to support the substrate;
a heat transfer device essentially surrounding an interior portion of the support body and extending along the peripheral edge of the support body, the heat transfer device configured to transfer heat with at least a portion of the substrate and/or substrate stage component and the heat transfer device located at least partly in the support body and extending at least partly beneath the substrate when supported on the support body; and
a heater configured to heat at least a portion of the substrate and/or substrate stage component, at least a portion of a heat emitting element of the heater located lower than a top of the heat transfer device.
10. The stage component of claim 9 , wherein the heat transfer device comprises a fluid-carrying channel configured to flow a fluid through at least part of the substrate stage component to enable heat transfer between the fluid and the at least part of the substrate stage component.
11. The stage component of claim 10 , wherein the fluid-carrying channel is in close proximity to a side of the body arranged to contact the substrate.
12. The stage component of claim 9 , wherein the heater comprises a plurality of heat emitting elements, the heat emitting elements being individually controllable.
13. The stage component of claim 9 , further comprising an array of temperature sensors configured to measure a temperature of at least a portion of the substrate and/or substrate stage component.
14. The stage component of claim 9 , comprising a plurality of burls to support the substrate.
15. A lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam onto a substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid; and
the substrate stage component of claim 9 .
16. A substrate stage component for a lithographic apparatus configured to project radiation onto a radiation-sensitive substrate, the substrate stage component comprising:
a support body configured to support the substrate;
a fluid-carrying channel network configured to flow a fluid through at least part of the substrate stage component to enable heat transfer between the fluid and the at least part of the substrate stage component and/or the substrate, the fluid-carrying channel network comprising a plurality of channel portions spread across an interior portion of the support body and an essentially circular channel portion surrounding the interior portion and extending along the peripheral edge of the support body, the channel portions fluidly connected to the essentially circular channel portion and the entire essentially circular portion having an effectively fixed radius;
a first port configured to connect to piping to allow the fluid into the fluid-carrying channel network; and
a second port separate from the first port and configured to connect to piping to allow essentially all the fluid provided to the fluid-carrying channel network to flow out of the fluid-carrying channel network.
17. The stage component of claim 16 , further comprising a heater configured to heat at least a portion of the substrate and/or substrate stage component.
18. The stage component of claim 17 , wherein the heater comprises a plurality of heating elements, the heating elements being individually controllable.
19. The stage component of claim 16 , comprising a plurality of burls to support the substrate.
20. A lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam onto a substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid; and
the substrate stage component of claim 16 .