Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective
View Patent ↗An optical correction arrangement includes a first and a second correction component arranged in succession along an optical axis. The first and the second correction components are provided with aspherical surface contours which at least approximately add up to zero overall in a zero position of the optical correction arrangement. The optical correction arrangement also includes a manipulator for displacing the first correction component in a first direction at a first speed and for displacing the second correction component in a second direction at a second speed. The first speed is greater than the second speed.
1. An arrangement, comprising:
first and second correction components arranged in succession along an optical axis; and
a manipulator configured to displace the first correction component in a first direction at a first speed and to displace the second correction component in a second direction at a second speed
wherein:
the first and the second correction components comprise aspherical surface contours that at least approximately add up to zero overall in a zero position of the arrangement;
the first speed is at least an order of magnitude greater than the second speed; and
the manipulator is configured to displace the first correction component according to an oscillation movement along the first direction.
2. The arrangement of claim 1 , wherein the oscillation movement is a periodic oscillation movement having a period matched to an exposure duration for a semiconductor chip.
3. The arrangement of claim 2 , wherein the period is less than 100 ms.
4. The arrangement of claim 3 , wherein the first speed is variable within the period of the oscillation movement.
5. The arrangement of claim 2 , wherein the first speed is variable within the period of the oscillation movement.
6. The arrangement of claim 1 , wherein the first direction is parallel to the optical axis.
7. The arrangement of claim 6 , wherein the second direction is perpendicular to the optical axis.
8. The arrangement of claim 1 , wherein the second direction is perpendicular to the optical axis.
9. The arrangement of claim 1 , wherein the manipulator is configured to displace the first and second correction components at the same time.
10. The arrangement of claim 1 , wherein the manipulator is at least partly arranged in an edge region of the first and/or the second correction component, and the edge region is outside of the aspherical surface contours.
11. The arrangement of claim 1 , wherein the manipulator comprises a magnetic arrangement.
12. The arrangement of claim 11 , wherein the magnetic arrangement comprises a first magnet at the first correction component and a second magnet at the second correction component.
13. The arrangement of claim 12 , wherein the first magnet comprises a permanent magnet, and/or the second magnet comprises an electromagnet.
14. The arrangement of claim 1 , wherein the manipulator is configured to interact with a guide mechanism to guide the first correction component and/or the second correction component parallel and/or perpendicular to the optical axis.
15. The arrangement of claim 1 , further comprising a third correction component.
16. The arrangement of claim 15 , wherein a central correction component of the arrangement in the direction of the optical axis is configured to be stationary relative to the optical axis.
17. The arrangement of claim 1 , further comprising a spring device holding the first and/or second correction component.
18. The arrangement of claim 1 , wherein the manipulator comprises an actuator.
19. An objective, comprising:
an arrangement according to claim 1 ,
wherein the objective is a microlithographic projection objective.
20. An apparatus, comprising:
an objective comprising an arrangement according to claim 1 ,
wherein the apparatus is a projection exposure apparatus.