Simultaneous multi-elements analysis type X-ray fluorescence spectrometer, and simultaneous multi-elements X-ray fluorescence analyzing method
A simultaneous multi-elements analysis type X-ray fluorescence spectrometer according to the present invention includes: a sample table ( 2 ) on which a sample ( 1 ) is placed and a conveyance arm ( 22 ) for the sample ( 1 ). The sample table ( 2 ) has a cutout ( 2 e ) formed therein, through which the conveyance arm ( 22 ) is allowed to pass in a vertical direction. Regarding respective measurement points (Pn) on a blank wafer (1 b ), a background correction unit ( 21 ) previously stores, as background intensities at the measurement points (Pn), intensities obtained by subtracting a measured intensity at a reference measurement point (P 0 ) located above the cutout ( 2 e ) from each of measured intensities at the measurement points (Pn), and regarding respective measurement points (Pn) on an analytical sample (1 a ), the background correction unit ( 21 ) subtracts the background intensities at the measurement points (Pn) from measured intensities at the measurement points (Pn), thereby correcting background.
1. A simultaneous multi-elements analysis type X-ray fluorescence spectrometer comprising:
a sample table on which a sample that is a semiconductor wafer is placed;
a conveyance arm configured to place and remove the sample on and from the sample table;
a stage configured to cause the sample table to move;
an X-ray source configured to irradiate the sample with primary X-rays;
a fixed goniometer provided for each of wavelengths to be measured, the fixed goniometer having a spectroscopic device and a detector, and being configured to measure an intensity of fluorescent X-rays generated from the sample; and
a control unit configured to control the conveyance arm, the stage, the X-ray source, and the fixed goniometer, and to measure intensities, of the fluorescent X-rays, at a plurality of measurement points on a surface of the sample, thereby to obtain distribution of the measured intensities on the sample, wherein
the sample table has a cutout formed therein, through which the conveyance arm is allowed to pass in a vertical direction,
the control unit includes a background correction unit, and
the background correction unit is configured to
regarding respective measurement points on a blank wafer, previously store, as background intensities at the measurement points, intensities obtained by subtracting a measured intensity at a reference measurement point located above the cutout from each of measured intensities at the measurement points, and
regarding respective measurement points on an analytical sample, subtract the background intensities at the measurement points from measured intensities at the measurement points, thereby to correct background.
2. An X-ray fluorescence analyzing method using a simultaneous multi-elements analysis type X-ray fluorescence spectrometer including:
a sample table on which a sample that is a semiconductor wafer is placed;
a conveyance arm configured to place and remove the sample on and from the sample table;
a stage configured to cause the sample table to move;
an X-ray source configured to irradiate the sample with primary X-rays;
a fixed goniometer provided for each of wavelengths to be measured, the fixed goniometer having a spectroscopic device and a detector, and being configured to measure an intensity of fluorescent X-rays generated from the sample;
a control unit configured to control the conveyance arm, the stage, the X-ray source, and the fixed goniometer, and to measure intensities, of the fluorescent X-rays, at a plurality of measurement points on a surface of the sample, thereby to obtain distribution of the measured intensities on the sample; and
the sample table having a cutout formed therein, through which the conveyance arm is allowed to pass in a vertical direction,
the method comprising:
regarding respective measurement points on a blank wafer, obtaining, as background intensities at the measurement points, intensities obtained by subtracting a measured intensity at a reference measurement point located above the cutout from each of measured intensities at the measurement points; and
regarding respective measurement points on an analytical sample, subtracting the background intensities at the measurement points from measured intensities at the measurement points, thereby to correct background.