IP Library › Granted Patent US 10,903,057
Granted Patent B2
US 10,903,057 · App. 15/267,246 · Granted Jan 26, 2021

Temperature adjustment device and substrate processing apparatus

Inventor: Hideki Wakai (Miyagi, JP)
Assignee: Tokyo Electron Limited
H01J37/32724H01J37/3244H01J37/32082H01J37/32697H01L21/67109H01L21/67248H01J2237/334Y02P70/50
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Quick Facts
Patent No.
US 10,903,057
App. No.
15/267,246
Granted
Jan 26, 2021
Kind
B2
Abstract

A temperature adjustment device includes a pedestal to receive a substrate thereon, a first temperature control unit to set a first medium at a first temperature, and a second temperature control unit to set a second medium at a second temperature that is higher than the first temperature. A pedestal flow passage is provided inside the pedestal to allow the first medium and the second medium to flow therethrough by switching between the first medium and the second medium. A first flow passage through which the first medium flowing from the pedestal flow passage is allowed to flow is provided. A second flow passage through which the second medium flowing from the pedestal flow passage is allowed to flow is provided. A heat pump is connected to the first flow passage and the second flow passage to transfer heat between the first medium and the second medium.

Claims (39)

1. A temperature adjustment device comprising:

a pedestal to receive a substrate thereon for processing;

a first temperature control unit including a first heat exchanger and configured to control a temperature of a first temperature adjustment medium to a first temperature using the first heat exchanger;

a second temperature control unit including a second heat exchanger and configured to control a temperature of a second temperature adjustment medium to a second temperature that is higher than the first temperature using the second heat exchanger;

a pedestal flow passage, provided inside the pedestal, to allow the first temperature adjustment medium and the second temperature adjustment medium to flow therethrough by switching between the first temperature adjustment medium and the second temperature adjustment medium;

an outlet flow passage connected to an outlet of the pedestal flow passage to allow the first temperature adjustment medium and the second temperature adjustment medium flowing out of the pedestal flow passage to flow therethrough;

a three-way valve connected to a downstream end of the outlet flow passage;

a first flow passage connected to the three-way valve and through which the first temperature adjustment medium flowing out of the pedestal flow passage is allowed to flow;

a second flow passage connected to the three-way valve and through which the second temperature adjustment medium flowing out of the pedestal flow passage is allowed to flow;

a heat pump that is disposed downstream of the three-way valve in flow directions of the first temperature adjustment medium and the second temperature adjustment medium and has an evaporator directly connected to the first flow passage and a condenser directly connected to the second flow passage and is configured to transfer heat between the first temperature adjustment medium and the second temperature adjustment medium using a circular flow passage, the circular flow passage forming a closed loop directly connecting the evaporator and the condenser;

a third flow passage that connects the first temperature control unit to the pedestal flow passage and is provided separately from the heat pump; and

a fourth flow passage that connects the second temperature control unit to the pedestal flow passage and is provided separately from the heat pump.

2. The temperature adjustment device as claimed in claim 1 ,

wherein the first temperature control unit sets the first temperature at −30 degrees C. or higher, and

the second temperature control unit sets the second temperature at 70 degrees C. or lower.

3. The temperature adjustment device as claimed in claim 1 , wherein the heat pump includes a controller configured to control the temperature of the first temperature adjustment medium and the temperature of the second temperature adjustment medium based on a temperature obtained from a temperature sensor provided in each of the first flow passage and the second flow passage.

4. The temperature adjustment device as claimed in claim 1 , further comprising:

a second pedestal flow passage provided inside the pedestal separately from the pedestal flow passage to allow the first temperature adjustment medium and the second temperature adjustment medium to flow therethrough by switching between the first temperature adjustment medium and the second temperature adjustment medium;

a fifth flow passage through which the first temperature adjustment medium flowing out of the pedestal flow passage is allowed to flow;

a sixth flow passage through which the second temperature adjustment medium flowing out of the pedestal flow passage is allowed to flow; and

a second heat pump connected to the fifth flow passage and the sixth flow passage and configured to transfer heat between the first temperature adjustment medium and the second temperature adjustment medium,

wherein each of the second pedestal flow passage, the fifth flow passage, the sixth flow passage, and the second heat pump has the same number, and the same number of loop is independently formed by correspondingly connecting the same number of the second pedestal flow passage, the fifth flow passage, the sixth flow passage, and the second heat pump with each other.

5. The temperature adjustment device as claimed in claim 1 ,

wherein the heat pump uses the evaporator and the condenser in the circular passage to transfer heat between the first temperature adjustment medium and the second temperature adjustment medium.

6. A substrate processing apparatus comprising:

a process chamber to process a substrate therein;

a pedestal provided in the process chamber to receive the substrate thereon;

a first temperature control unit including a first heat exchanger and configured to control a temperature of a first temperature adjustment medium to a first temperature using the first heat exchanger;

a second temperature control unit including a second heat exchanger and configured to control a temperature of a second temperature adjustment medium to a second temperature that is higher than the first temperature using the second heat exchanger;

a pedestal flow passage provided, inside the pedestal, to allow the first temperature adjustment medium and the second temperature adjustment medium to flow therethrough by switching between the first temperature adjustment medium and the second temperature adjustment medium;

an outlet flow passage connected to an outlet of the pedestal flow passage to allow the first temperature adjustment medium and the second temperature adjustment medium flowing out of the pedestal flow passage to flow therethrough;

a three-way valve connected to a downstream end of the outlet flow passage;

a first flow passage connected to the three-way valve and through which the first temperature adjustment medium flowing out of the pedestal flow passage is allowed to flow;

a second flow passage connected to the three-way valve and through which the second temperature adjustment medium flowing out of the pedestal flow passage is allowed to flow;

a heat pump that is disposed downstream of the three-way valve in flow directions of the first temperature adjustment medium and the second temperature adjustment medium and has an evaporator directly connected to the first flow passage and a condenser directly connected to the second flow passage and configured to transfer heat between the first temperature adjustment medium and the second temperature adjustment medium using a circular flow passage, the circular flow passage forming a closed loop directly connecting the evaporator and the condenser;

a third flow passage that connects the first temperature control unit to the pedestal flow passage and is provided separately from the heat pump; and

a fourth flow passage that connects the second temperature control unit to the pedestal flow passage and is provided separately from the heat pump.

7. The substrate processing apparatus as claimed in claim 6 ,

wherein the heat pump uses the evaporator and the condenser in the circular passage to transfer heat between the first temperature adjustment medium and the second temperature adjustment medium.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 16, 2016
From: WAKAI, HIDEKI
To: TOKYO ELECTRON LIMITED
Reel/Frame 039763/0110 →
Priority Claims (1)
JP 2015-186728 · Sep 24, 2015 · national
Continuity (1)
Related Publication 20170092471A1 · Mar 30, 2017
Cited By (1)
US 12,648,393