Semiconductor package including hybrid bonding structure and method for preparing the same

1. A semiconductor package structure comprising:

a first die having a first front side and a first back side opposite to the first front side, wherein the first die includes a first through-silicon via (TSV) structure exposed through the first back side, and the first TSV structure comprises a protrusion protruding from the first back side;

a second die having a second front side and a second back side opposite to the second front side, wherein the second die includes a bonding pad exposed through the second front side; and

a hybrid bonding structure disposed between the first back side of the first die and the second front side of the second die,

wherein the first die and the second die are bonded to each other by the hybrid bonding structure, and the hybrid bonding structure comprises an organic barrier layer and an inorganic barrier layer bonded to each other, wherein the organic barrier layer is disposed over the first back side of the first die and the protrusion of the first TSV structure extends into and is coupled with the organic barrier layer, wherein the inorganic barrier layer is disposed over the second front side of the second die;

wherein the protrusion of the first TSV structure of the first die is bonded to the bonding pad of the second die.

2. The semiconductor package structure of claim 1 , wherein the first die further comprises:

a first interconnect structure disposed over the first front side,

wherein the first TSV structure is electrically connected to the first interconnect structure.

3. The semiconductor package structure of claim 1 , wherein a height of the protrusion of the first TSV structure is between approximately 1 μm and approximately 5 μm.

4. The semiconductor package structure of claim 1 , wherein the second die further comprises:

a second TSV structure exposed through the second back side; and

a second interconnect structure disposed over the second front side;

wherein the second interconnect structure is electrically connected to the second TSV structure and the bonding pad.

5. The semiconductor package structure of claim 4 , further comprising a conductive member disposed over the second back side of the second die, wherein the conductive member is electrically connected to the second TSV structure.

6. The semiconductor package structure of claim 1 , wherein the organic barrier layer of the hybrid bonding structure comprises benzocyclobutene (BCB), polybenzoxazoles (PBO), or polyimide (PI).

7. The semiconductor package structure of claim 1 , wherein a thickness of the organic barrier layer is between approximately 1 μm and approximately 5 μm.

8. The semiconductor package structure of claim 1 , wherein the inorganic barrier layer of the hybrid bonding structure comprises silicon nitride (SiN), silicon oxynitride (SiON), or silicon carbon nitride (SiCN).

9. The semiconductor package structure of claim 1 , wherein a thickness of the inorganic barrier layer is between approximately 0.1 μm and approximately 2 μm.

10. A method for preparing a semiconductor package structure, comprising:

providing a first die having a first front side, a first back side opposite to the first front side, and a first TSV structure disposed in the first die, wherein the first TSV structure comprises a protrusion protruding from the first back side;

removing a portion of the first die at the first back side to expose the first TSV structure and to form a protrusion protruding from the first back side of the first die;

disposing an organic barrier layer over the first die at the first back side and coupled with the protrusion of the first TSV structure;

providing a second die having a second front side, a second back side opposite to the second front side, a bonding pad exposed through the second front side of the second die, and an inorganic barrier layer disposed over the second die at the second front side; and

bonding the organic barrier layer of the first die and the inorganic barrier layer of the second die and bonding the protrusion of the first TSV structure of the first die and the bonding pad of the second die.

11. The method of claim 10 , wherein a height of the protrusion of the first TSV structure is between approximately 1 μm and approximately 5 μm.

12. The method of claim 10 , wherein the disposing of the organic barrier layer further comprises:

disposing the organic barrier layer to envelop the protrusion of the first TSV structure; and

performing a planarization on the organic barrier layer to expose an end surface of the protrusion.

13. The method of claim 12 , wherein the end surface of the protrusion and a top surface of the organic barrier layer are coplanar after the planarization.

14. The method of claim 10 , wherein the organic barrier layer comprises BCB, POB or PI.

15. The method of claim 10 , wherein the inorganic barrier layer comprises SiN, SiON or SiCN.

16. The method of claim 10 , wherein the second die comprises a second TSV structure disposed therein.

17. The method of claim 16 , further comprising:

removing a portion of the second die at the second back side to expose the second TSV structure; and

disposing a conductive member over the second back side of the second die,

wherein the conductive member is electrically connected to the second TSV structure.