Charged particle beam device, interchangeable multi-aperture arrangement for a charged particle beam device, and method for operating a charged particle beam device

1. A charged particle beam device, comprising:

a charged particle source configured to emit a charged particle beam;

a movable stage comprising an assembly of aperture arrays having at least a first aperture array and a second aperture array,

the movable stage is configured to align a selected one of either the first aperture array or the second aperture array with the charged particle beam;

the first aperture array comprises a first shielding tube coupled to the movable stage; and

the second aperture array comprises a second shielding tube coupled to the movable stage;

wherein the charged particle beam device is an electron microscope,

wherein the first aperture array has at least two apertures for a first operation mode of the electron microscope and the second aperture array has at least one aperture for a second operation mode of the electron microscope, and

wherein the first aperture array comprises at least two deflectors aligned to each of the at least two apertures of the first aperture array, and the second aperture array comprises at least one deflector aligned to the at least one second aperture of the second aperture array.

2. The charged particle beam device of claim 1 , wherein the movable stage comprises an actuator assembly configured to translate the aperture array.

3. The charged particle beam device of claim 1 , wherein the movable stage is a Piezo stage.

4. The charged particle beam device of claim 1 , wherein the movable stage is mounted on a support.

5. The charged particle beam device of claim 1 , wherein the movable stage aligns either the at least two apertures of the first aperture array or the at least one aperture of the second aperture array with the particle beam through at least one of a translation and a rotation of the aperture array.

6. The charged particle beam device of claim 1 , wherein at least one of the first shielding tube or the second shielding tube is made of mu-metal or a non magnetic material.

7. The charged particle beam device of claim 1 , wherein the assembly of aperture arrays is provided in a part of the movable stage that is movable in an x-direction and having a first number of shieldings and wherein a part of the movable stage that is movable in a y-direction comprises a second number of shieldings smaller than the first number of shieldings.

8. The charged particle beam device of claim 1 , wherein the assembly of aperture arrays comprises three layers that contain shielding tubes for shielding.

9. The charged particle beam device of claim 1 , wherein the charged particle beam device comprises three layers comprising shielding tubes for shielding, wherein the number of shielding tubes differs between the layers.

10. The charged particle beam device of claim 1 , wherein the movable stage comprises electrical circuits connected to the first aperture array and the second aperture array.

11. A method for operating a charged particle beam device, comprising:

operating a movable stage to change a first aperture array aligned with a charged particle beam, the first aperture array having a first shielding tube coupled to the movable stage, by moving the first aperture array out of the charged particle beam and aligning a second aperture array with the charged particle beam, the second aperture array having a second shielding tube coupled to the movable stage, thereby changing an operation mode of the charged particle beam device;

wherein the charged particle beam device is operated as an electron microscope,

wherein the first aperture array has at least two apertures for a first operation mode of the electron microscope and the second aperture array has at least one aperture for a second operation mode of the electron microscope, and

wherein the first aperture array comprises at least two deflectors aligned to each of the at least two apertures of the first aperture array, and the second aperture array comprises at least one deflector aligned to the at least one second aperture of the second aperture array.

12. The method of claim 11 , wherein the first aperture array and the second aperture array is configured to be electrically controllable.

13. The charged particle beam device of claim 1 , wherein a size of the first aperture is different from a size of the second aperture.

14. The charged particle beam device of claim 1 , wherein the movable stage comprises an actuator assembly configured to rotate the aperture array.

15. The charged particle beam device of claim 1 , wherein the movable stage is mounted on an anti-vibration support.

16. The charged particle beam device of claim 1 , wherein the first shielding tube and/or the second shielding tube has the form of a liner tube.