Power semiconductor device with dV/dt controllability and low gate charge
A power semiconductor device having a barrier region is provided. A power unit cell of the power semiconductor device has at least two trenches that may both extend into the barrier region. The at least two trenches may both have a respective trench electrode coupled to a control terminal of the power semiconductor device. For example, the trench electrodes are structured to reduce the total gate charge of the power semiconductor device. The barrier region may be p-doped and vertically confined, i.e., in and against the extension direction, by the drift region. The barrier region can be electrically floating.
1. A power semiconductor transistor, comprising:
a semiconductor body coupled to a first load terminal and a second load terminal of the power semiconductor transistor and comprising a drift region of a first conductivity type configured to conduct a load current between the first and the second load terminals; and
a power unit cell comprising:
a control trench having a control trench electrode and a dummy trench having a dummy trench electrode coupled to the control trench electrode;
an active mesa comprising a source region of the first conductivity type and electrically connected to the first load terminal and a channel region of a second conductivity type and separating the source region and the drift region, wherein, in the active mesa, at least a respective section of each of the source region, the channel region and the drift region are arranged adjacent to a sidewall of the control trench, and wherein the control trench electrode is configured to receive a control signal from a control terminal of the power semiconductor transistor and to control the load current in the active mesa;
a barrier region of the second conductivity type formed in the semiconductor body and laterally overlapping with the active mesa and a bottom of the dummy trench,
wherein the control trench has a total control trench volume and a volume of the control trench electrode is less than 80% of the total control trench volume, and/or the dummy trench has a total dummy trench volume and a volume of the dummy trench electrode is less than 80% of the total dummy trench volume,
wherein the barrier region is electrically floating.
2. The power semiconductor transistor of claim 1 , wherein the power unit cell further comprises an inactive mesa arranged adjacent to the dummy trench, and wherein a transition between the first load terminal and the inactive mesa provides an electrical insulation at least for charge carriers of the first conductivity type.
3. The power semiconductor transistor of claim 2 , wherein the inactive mesa comprises, in an upper portion, an oxidized region vertically overlapping with the channel region.
4. The power semiconductor transistor of claim 1 , wherein the bottom of the dummy trench and a bottom of the control trench extend into the barrier region.
5. The power semiconductor transistor of claim 1 , wherein the barrier region laterally overlaps with the active mesa for at least 50% of a width of the active mesa.
6. The power semiconductor transistor of claim 1 , wherein a remaining share of the total control trench volume and/or a remaining share of the total dummy trench volume is filled by an insulating material and/or an electrode material separated from the respective trench electrode.
7. The power semiconductor transistor of claim 1 , wherein the dummy trench electrode is arranged in a lower portion of the dummy trench, the lower portion vertically overlapping with the barrier region.
8. The power semiconductor transistor of claim 1 , wherein the dummy trench electrode does not vertically overlap with the channel region.
9. The power semiconductor transistor of claim 1 , wherein the control trench electrode is arranged in an upper portion of the control trench, the upper portion vertically overlapping with the channel region.
10. The power semiconductor transistor of claim 1 , wherein the dummy trench includes a second trench electrode.
11. The power semiconductor transistor of claim 10 , wherein the second trench electrode of the dummy trench has a different electrical potential than the dummy trench electrode.
12. The power semiconductor transistor of claim 11 , wherein the second trench electrode is arranged above the dummy trench electrode.
13. The power semiconductor transistor of claim 10 , wherein the second trench electrode is arranged laterally adjacent to the dummy trench electrode.
14. The power semiconductor transistor of claim 1 , wherein the power semiconductor transistor comprises a plurality of power unit cells, and wherein the barrier region connects:
inactive mesas included in the plurality of power unit cells with each other; and/or
two or more dummy trench bottoms with each other.
15. The power semiconductor transistor of claim 1 , wherein:
both the control trench electrode and the dummy trench electrode are electrically coupled to the control terminal; and/or
the barrier region is configured to provide for an electrically conductive path between a section of the active mesa and the bottom of the dummy trench; and/or
the barrier region is a contiguous barrier layer within an active region of the power semiconductor transistor.
16. A power semiconductor transistor, comprising:
a semiconductor body coupled to a first load terminal and a second load terminal of the power semiconductor transistor and comprising a drift region of a first conductivity type configured to conduct a load current between the first and the second load terminals; and
a power unit cell comprising:
a control trench having a control trench electrode and a dummy trench having a dummy trench electrode coupled to the control trench electrode; and
an active mesa comprising a source region of the first conductivity type and electrically connected to the first load terminal and a channel region of a second conductivity type and separating the source region and the drift region, wherein, in the active mesa, at least a respective section of each of the source region, the channel region and the drift region are arranged adjacent to a sidewall of the control trench, and wherein the control trench electrode is configured to receive a control signal from a control terminal of the power semiconductor transistor and to control the load current in the active mesa; and
an inactive mesa arranged adjacent to the dummy trench, and wherein a transition between the first load terminal and the inactive mesa provides an electrical insulation at least for charge carriers of the first conductivity type,
wherein the dummy trench has a total dummy trench volume and a volume of the dummy trench electrode is less than 80% of the total dummy trench volume, and
wherein the inactive mesa comprises, in an upper portion, an oxidized region vertically overlapping with the channel region.
17. A power semiconductor transistor, comprising:
a semiconductor body coupled to a first load terminal and a second load terminal of the power semiconductor transistor and comprising a drift region of a first conductivity type configured to conduct a load current between the first and the second load terminals; and
a power unit cell comprising:
a control trench having a control trench electrode and a dummy trench having a dummy trench electrode coupled to the control trench electrode;
an active mesa comprising a source region of the first conductivity type and electrically connected to the first load terminal and a channel region of a second conductivity type and separating the source region and the drift region, wherein, in the active mesa, at least a respective section of each of the source region, the channel region and the drift region are arranged adjacent to a sidewall of the control trench, and wherein the control trench electrode is configured to receive a control signal from a control terminal of the power semiconductor transistor and to control the load current in the active mesa;
a barrier region of the second conductivity type formed in the semiconductor body and laterally overlapping with the active mesa and a bottom of the dummy trench,
wherein the source region is laterally structured along a second lateral direction with intermission regions separating adjacent source subregions, and wherein the control trench electrode is laterally structured along the second lateral direction according to a lateral structure of the source region to laterally overlap with the source subregions.