Substrate coating apparatus for floating substrate and method
Provided is a coating apparatus including: a stage unit which floats the substrate to a predetermined height by using wind pressure of gas; a droplet discharge unit which drops the droplet of the functional liquid on the substrate floated to the predetermined height from the stage unit; a main scanning direction moving unit which moves the substrate, which is floated to the predetermined height from the stage unit, in the main scanning direction while holding the substrate; and a sub-scanning direction moving unit which moves the droplet discharge unit in the sub-scanning direction with respect to the substrate floated to the predetermined height from the stage unit. The sub-scanning direction moving unit moves the droplet discharge unit in the sub-scanning direction while the main scanning direction moving unit repeatedly moves the substrate in the main scanning direction and the droplet discharge unit repeatedly drops the droplet.
1. A coating apparatus comprising:
a stationary stage which extends along a main scanning direction and has an upper surface covered by a plurality of gas supply ports which lifts a substrate to float at a predetermined height by using a pressurized gas;
a droplet discharger which includes a plurality of discharge heads and drops a droplet of a functional liquid on the substrate lifted to the predetermined height from the stationary stage;
a main scanning direction mover including a main scanning direction guide which extends in the main scanning direction, multiple main scanning direction sliders which are directly attached to and moved along the main scanning direction guide, and a substrate holder mounted on each of the multiple main scanning direction sliders and configured to hold the substrate; and
a sub-scanning direction mover which moves the droplet discharger in a sub-scanning direction with respect to the substrate lifted to the predetermined height from the stationary stage,
wherein the sub-scanning direction mover moves the droplet discharger in the sub-scanning direction while the main scanning direction mover continues to move the substrate in the main scanning direction and the droplet discharger continues to drop the droplet such that a drawing pattern of the functional liquid is formed on the substrate by moving a landing position of the droplet of the functional liquid on the substrate in the main scanning direction and the sub-scanning direction, and
wherein each substrate holder mounted on each of the multiple scanning direction sliders includes a rotation supporter having an x-axis position correction slider configured to move along an x-axis position correction guide and a y-axis position correction slider configured to move along a y-axis position correction guide, the rotation supporter configured to rotate the substrate held by each substrate holder when viewed from above.
2. The coating apparatus of claim 1 , wherein the main scanning direction mover further has a lifter which corrects horizontality of the substrate held by each substrate holder.
3. The coating apparatus of claim 1 , further comprising:
a vibration absorber which is mounted on the droplet discharger and absorbs vibration of the droplet discharger.
4. The coating apparatus of claim 1 , wherein the stationary stage further includes a plurality of suction ports formed on the upper surface of the stationary stage.
5. The coating apparatus of claim 1 , wherein the main scanning direction mover has a lifter configured to independently move each substrate holder upward and downward.
6. The coating apparatus of claim 1 , wherein the main scanning direction guide extends along the stationary stage and is positioned along a side of the stationary stage in the main scanning direction when viewed from above.
7. The coating apparatus of claim 1 , wherein the main scanning direction guide is a first main scanning direction guide and a second main scanning direction guide which extend along the stationary stage and are positioned on either side of the stationary stage in the main scanning direction when viewed from above.
8. The coating apparatus of claim 1 , wherein the x-axis position correction slider and the y-axis position correction slider are both configured to move independently of the main scanning direction sliders.