Semiconductor image sensor
A BSI image sensor includes a substrate including a front side and a back side opposite to the front side, a pixel sensor disposed in the substrate, and a color filter disposed over the pixel sensor. The pixel sensor includes a plurality of first micro structures disposed over the back side of the substrate. The color filter includes a plurality of second micro structures disposed over the back side of the substrate. Each of the first micro structures has a first height, and each of the second micro structures has a second height. The second height is less than the first height.
1. A back side illumination (BSI) image sensor comprising:
a substrate comprising a front side and a back side opposite to the front side;
a pixel sensor disposed in the substrate, and the pixel sensor comprising a plurality of first micro structures disposed over the back side of the substrate; and
a color filter disposed over the pixel sensor, and the color filter comprising a plurality of second micro structures disposed over the back side of the substrate,
wherein each of the first micro structures has a first height, each of the second micro structures has a second height, and the second height is less than the first height.
2. The BSI image sensor of claim 1 , wherein a sidewall of the first micro structure and a substrate-horizontal direction comprise at least a first included angle, and a sidewall of the second micro structure and the substrate-horizontal direction comprise at least a second included angle.
3. The BSI image sensor of claim 2 , wherein the first included angle and the second included angle are different from each other.
4. The BSI image sensor of claim 2 , wherein the first included angle and the second included angle are the same.
5. The BSI image sensor of claim 1 , wherein each of the first micro structure has a first width, each of the second micro structure has a second width, and the first width and the second width are similar.
6. The BSI image sensor of claim 1 , wherein a bottom surface of the second micro structure is between a top surface of the color filter and a bottom surface of the color filter.
7. The BSI image sensor of claim 1 , further comprises a second coating extends an entire surface of the front side of the substrate.
8. A back side illumination (BSI) image sensor comprising:
a substrate comprising a front side and a back side opposite to the front side;
a photodiode comprising a first surface facing the back side of the substrate and a second surface opposite to the first surface;
a plurality of first micro structures disposed on the first surface of the photodiode;
a plurality of second micro structures disposed on the second surface of the photodiode; and
a color filter disposed over the photodiode.
9. The BSI image sensor of claim 8 , a sidewall of the first micro structure and a substrate-horizontal direction comprise at least a first included angle, and the first included angle is between about 48° and about 58°.
10. The BSI image sensor of claim 8 , wherein a sidewall of the second micro structure and a substrate-horizontal direction comprise at least a second included angle, and the second included angle is between about 48° and about 58°.
11. The BSI image sensor of claim 8 , wherein a height of the first micro structures is greater than a height of the second micro structures.
12. The BSI image sensor of claim 8 , wherein the first micro structures are spaced apart from each other, and the second micro structures are spaced apart from each other.
13. The BSI image sensor of claim 8 , wherein a bottom surface of the second micro structures are in a level between the first surface and the second surface of the photodiode.
14. The BSI image sensor of claim 13 , further comprising a dielectric layer disposed over the front side of the substrate, wherein the second micro structures are spaced apart from each other by the dielectric layer.
15. The BSI image sensor of claim 14 , further comprises a coating disposed over the front side of the substrate, wherein the coating is in contact with the dielectric layer, the second micro structures and a portion of a surface of the substrate on the front side.
16. A back side illumination (BSI) image sensor comprising:
a substrate comprising a front side and a back side opposite to the front side;
a photodiode disposed in the substrate;
a color filter disposed over the back side of the substrate;
a plurality of first micro structures disposed between the photodiode and the color filter; and
a plurality of second micro structures disposed over the front side of the substrate, wherein bottom surfaces of the second micro structures are in contact with a surface of the substrate on the back side of the substrate.
17. The BSI image sensor of claim 16 , a sidewall of the first micro structure and a substrate-horizontal direction comprise at least a first included angle, and the first included angle is between about 48° and about 58°, and a sidewall of the second micro structure and the substrate-horizontal direction comprise at least a second included angle, and the second included angle is between about 48° and about 58°.
18. The BSI image sensor of claim 16 , wherein a height of the first micro structures is greater than a height of the second micro structures.
19. The BSI image sensor of claim 16 , wherein the first micro structures are spaced apart from each other, and the second micro structures are spaced apart from each other.
20. The BSI image sensor of claim 16 , further comprises a dielectric layer disposed over the front side of the substrate, wherein the second micro structures are spaced apart from each other by the dielectric layer.