Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
A showerhead for a substrate processing system includes a lower surface, a plasma-facing upper surface, a gas plenum defined between the lower surface and the upper surface, and a plurality of injectors distributed on the lower surface, wherein the plurality of injectors are in fluid communication with the gas plenum. A plurality of through holes extends from the upper surface to the lower surface. Selected ones of the plurality of through holes have a diameter that is different from a diameter of remaining ones of the plurality of through holes. The diameter of the selected ones of the plurality of through holes is predetermined in accordance with a desired ratio of respective gases provided via the selected ones of the plurality of through holes and the remaining ones of the plurality of through holes.
1. A showerhead for a substrate processing system, the showerhead comprising:
a lower surface;
a plasma-facing upper surface;
a gas plenum defined inside the showerhead between the lower surface and the upper surface;
a plurality of injectors distributed on the lower surface and a plurality of gas injector nozzles extending downward from respective ones of the injectors on the lower surface, wherein the plurality of injectors is in fluid communication with the gas plenum such that gas exits from the gas plenum inside the showerhead through the plurality of injectors and the plurality of gas nozzles to a volume below the showerhead; and
a plurality of through holes extending from the plasma-facing upper surface to the lower surface, wherein the plurality of through holes is in fluid communication with a volume above the plasma-facing upper surface and the volume below the showerhead, wherein selected ones of the plurality of through holes have a diameter that is different from a diameter of remaining ones of the plurality of through holes, and wherein the diameter of the selected ones of the plurality of through holes is predetermined in accordance with a desired ratio of respective gases provided via the selected ones of the plurality of through holes and the remaining ones of the plurality of through holes,
wherein, on the lowersurface of the showerhead, the through holes are arranged in a plurality of separate groups each including two or more of the through holes distributed around a respective one of the plurality of injectors.
2. The showerhead of claim, wherein the selected ones of the plurality of through holes include a first type of through hole having an average diameter satisfying a predetermined ratio relationship with an average diameter of the remaining ones of the plurality of through holes.
3. The showerhead of claim 1 , wherein the selected ones of the plurality of through holes includes at least a first type of through hole satisfying a first predetermined ratio relationship with an average diameter of the remaining ones of the plurality of through holes and a second type of through hole satisfying a second predetermined ratio relationship with an average diameter of the remaining ones of the plurality of through holes.
4. The showerhead of claim 1 , wherein the diameter of the selected ones of the plurality of through holes is predetermined in accordance with deposition non-uniformities associated with showerhead.
5. The showerhead of claim 1 wherein, on the lower surface of the showerhead, the through holes are arranged in a plurality of groups each including three of the through holes distributed around a respective one of the plurality of injectors.
6. The showerhead of claim 5 , wherein the three of the through holes in each of the plurality of groups are distributed in a triangle configuration around the respective one of the plurality of injectors.
7. The showerhead of claim 5 , wherein the three of the through holes in each of the plurality of groups are radially distributed around the respective one of the plurality of injectors.
8. The showerhead of claim 1 , wherein the plurality of through holes includes at least one central group of through holes and a first plurality of groups of the through holes arranged in a first hexagonal pattern around the at least one central group.
9. The showerhead of claim 8 , further comprising a second plurality of groups of the through holes arranged in a second hexagonal pattern around the first plurality of groups.
10. The showerhead of claim 1 , wherein the plurality of through holes includes at least one central group and a first plurality of groups of the through holes arranged in a first circular pattern around the at least one central group.
11. The showerhead of claim 10 , further comprising at least one second plurality of groups of the through holes arranged in a second circular pattern around the first plurality of groups.
12. The showerhead of claim 1 , wherein the plurality of through holes includes a plurality of groups of the through holes, wherein the plurality of groups of through holes includes at least one central group, wherein remaining groups of the plurality of groups are arranged in an increasing 6 pattern around the at least one central group, and wherein the increasing 6 pattern corresponds to an increase of 6 groups in each successive surrounding region of the at least one central group.
13. The showerhead of claim 1 , wherein the plurality of through holes includes a plurality of groups of the through holes, wherein the plurality of groups of through holes includes at least one central group, wherein remaining groups of the plurality of groups are arranged in an increasing 8 pattern around the at least one central group, and wherein the increasing 8 pattern corresponds to an increase of 8 groups in each successive surrounding region of the at least one central group.
14. The showerhead of claim wherein the plurality of through holes includes 85 groups of the through holes.