Semiconductor device having a through silicon via and methods of manufacturing the same

1. A semiconductor device, comprising:

a first insulating interlayer disposed on a first surface of a substrate;

a pad pattern disposed on a lower surface of the first insulating interlayer, the pad pattern comprising a first copper pattern;

a through silicon via passing through the substrate and the first insulating interlayer, and contacting the first copper pattern of the pad pattern; and

an insulation liner disposed on a sidewall of the through silicon via,

wherein a bottom surface of the insulation liner is interposed between an upper surface of the first insulating interlayer and an upper surface of the pad pattern,

wherein the first insulating interlayer is interposed between the bottom surface of the insulation liner and the upper surface of the pad pattern,

wherein the through silicon via comprises a first portion passing through the substrate and the first insulating interlayer, and a second portion under the first portion and extending to a portion of the first copper pattern in the pad pattern,

wherein an entire sidewall and a bottom of the second portion directly contact an upper portion of the pad pattern, and

wherein a boundary of the through silicon via has a bent portion between the first portion and the second portion.

2. The semiconductor device of claim 1 , wherein a width of the first portion at a boundary between the substrate and the first insulating interlayer is greater than a width of the second portion at the upper surface of the pad pattern.

3. The semiconductor device of claim 1 , wherein the through silicon via is formed in a via hole, and the via hole is through the substrate and the first insulating interlayer and extends to the upper portion of the pad pattern to expose a surface of the first copper pattern.

4. The semiconductor device of claim 3 , wherein the through silicon via comprises a second barrier pattern, a second seed copper pattern, and a second copper pattern, and

wherein a stacked structure of the second barrier pattern and the second seed copper pattern is conformally formed on a surface of the via hole, and the second copper pattern is formed on the second seed copper pattern to fill the via hole.

5. The semiconductor device of claim 1 , wherein the pad pattern comprises the first copper pattern, a first seed copper pattern and a first barrier pattern, and

wherein a stacked structure of the first seed copper pattern and the first barrier pattern is conformally formed on an upper surface and a sidewall of the first copper pattern.

6. The semiconductor device of claim 5 , wherein the first barrier pattern in the pad pattern is in contact with the lower surface of the first insulating interlayer, and

wherein a bottom of the first portion of the through silicon via contacts an upper surface of the first barrier pattern.

7. The semiconductor device of claim 1 , wherein circuit elements are formed on the first surface of the substrate, and

wherein the first insulating interlayer covers the circuit elements.

8. A method of manufacturing a semiconductor device, the method comprising:

forming a first insulating interlayer on a first surface of a substrate;

forming a pad pattern comprising a first copper pattern on a lower surface of the first insulating interlayer;

forming a via hole passing through the substrate and the first insulating interlayer to expose a portion of a surface of the first copper pattern in the pad pattern; and

forming an insulation liner and a through silicon via in the via hole, the through silicon via contacting the first copper pattern of the pad pattern,

wherein a bottom surface of the insulation liner is interposed between an upper surface of the first insulating interlayer and an upper surface of the pad pattern,

wherein the first insulating interlayer is interposed between the bottom surface of the insulation liner being and the upper surface of the pad pattern,

wherein the through silicon via includes a first portion passing through the substrate and the first insulating interlayer, and a second portion under the first portion and extending to the first copper pattern of the pad pattern,

wherein an entire sidewall and a bottom of the second portion directly contact an upper portion of the pad pattern, and

wherein a boundary of the through silicon via has a bent portion between the first portion and the second portion.

9. The method of claim 8 , further comprising forming a second insulating interlayer on the lower surface of the first insulating interlayer,

wherein the pad pattern is formed in the second insulating interlayer.

10. The method of claim 9 , wherein the forming the pad pattern comprises:

forming an opening in the second insulating interlayer to expose the lower surface of the first insulating interlayer;

forming a first barrier pattern and a first seed copper pattern on a sidewall and a bottom of the opening; and

forming the first copper pattern on the first barrier pattern and the first seed copper pattern to fill the opening,

wherein a sidewall and an upper surface of the first copper pattern are in contact with a stacked structure that comprises the first seed copper pattern and the first barrier pattern.

11. The method of claim 8 , wherein the forming the via hole comprises:

forming a first via hole passing through the substrate and the first insulating interlayer to expose an upper surface of a first barrier pattern of the pad pattern, wherein the first barrier pattern is interposed between the first via hole and the first copper pattern;

forming a sacrificial layer on a sidewall and a bottom of the first via hole;

etching the sacrificial layer formed on a bottom of the first via hole and the surface of the first copper pattern of the pad pattern thereunder to form a second via hole, wherein the second via hole has a width that is less than a width of the first via hole; and

removing the sacrificial layer and copper contaminations on the sacrificial layer.

12. The method of claim 11 , further comprising, before the forming the first via hole:

etching the substrate and the first insulating interlayer to form a preliminary via hole that is spaced apart from the upper surface of the pad pattern; and

forming the insulation liner on a sidewall of the preliminary via hole.

13. The method of claim 11 , wherein removing the sacrificial layer is an isotropic etching process.

14. The method of claim 11 , wherein the sacrificial layer is formed by a sputtering process, and

wherein the sacrificial layer comprises titanium or titanium nitride.

15. A method of manufacturing a semiconductor device, the method comprising:

forming a first insulating interlayer on a first surface of a substrate;

forming a pad pattern on a lower surface of the first insulating interlayer, the pad pattern comprising a first copper pattern and a first barrier pattern on an upper surface and a sidewall of the first copper pattern;

forming a first via hole passing through the substrate and the first insulating interlayer to expose a portion of a surface of the first barrier pattern in the pad pattern;

forming an insulation liner on a surface of the first via hole;

forming a sacrificial layer on the surface of the first via hole and the insulation liner;

etching the sacrificial layer formed on a bottom of the first via hole and a surface of the first copper pattern thereunder to form a second via hole, wherein the second via hole has a width that is less than a width of the first via hole;

removing the sacrificial layer and copper contaminations on the sacrificial layer to form a via hole; and

forming a through silicon via in the via hole, the through silicon via contacting the first copper pattern of the pad pattern,

wherein the through silicon via comprises a first portion passing through the substrate and the first insulating interlayer, and a second portion under the first portion and extending to a portion of the first copper pattern in the pad pattern,

wherein an entire sidewall and a bottom of the second portion directly contact an upper portion of the pad pattern, and wherein a boundary of the through silicon via has a bent portion between the first portion and the second portion,

wherein a bottom surface of the insulation liner is interposed between an upper surface of the first insulating interlayer and an upper surface of the pad pattern, and

wherein the first insulating interlayer is interposed between the bottom surface of the insulation liner being and the upper surface of the pad pattern.

16. The method of claim 15 , wherein the removing the sacrificial layer is an isotropic etching process.

17. The method of claim 15 , wherein the forming the sacrificial layer is a sputtering process, and

wherein the sacrificial layer includes titanium or titanium nitride.