Semiconductor memory device and method of manufacturing the same
A semiconductor memory device according to embodiments described herein, includes a first stacked body, a second stacked body, a first memory hole, a second memory hole, and a joint. In the first stacked body, a plurality of first conductive layers and a plurality of first insulating layers are alternately stacked. The second stacked body is disposed above the first stacked body, and a plurality of second conductive layers and a plurality of second insulating layers are alternately stacked therein. The first memory hole extends in the first stacked body in a first direction that is a stacking direction of the first stacked body. The second memory hole extends in the second stacked body in the first direction. The joint communicates the first memory hole and the second memory hole. The joint includes an inner wall surface and a sidewall insulating layer. The inner wall surface has a plane continuous with the inner wall of the first memory hole. The sidewall insulating layer is disposed on the inner wall surface of the joint.
1. A semiconductor memory device, comprising:
a first stacked body including a plurality of first conductive layers and a plurality of first insulating layers alternately stacked;
a second stacked body disposed above the first stacked body and including a plurality of second conductive layers and a plurality of second insulating layers alternately stacked;
a first memory hole extending in the first stacked body in a first direction that is a stacking direction of the first stacked body;
a second memory hole extending in the second stacked body in the first direction; and
a joint that communicates the first memory hole and the second memory hole,
wherein the joint comprises:
an inner wall surface having a plane continuous with an inner wall surface of the first memory hole,
a sidewall insulating layer disposed on the inner wall surface of the joint,
a first joint in which the sidewall insulating layer is disposed, the first joint having a diameter smaller than a diameter of an upper end of the first memory hole, and
a second joint disposed on the first joint and having a diameter larger than a diameter of a lower end of the second memory hole,
wherein the sidewall insulating layer is also disposed in the second joint;
an inner wall surface of the sidewall insulating layer disposed in the second joint has a diameter larger than the diameter of the lower end of the second memory hole.
2. A method of manufacturing a semiconductor memory device, comprising:
forming a first stacked body including a plurality of first insulating layers and a plurality of second insulating layers alternately stacked;
forming a joint layer on the first stacked body;
forming a joint hole that penetrates the joint laver, and a first memory hole that communicates with the joint hole by penetrating the first stacked body continuously from the joint hole;
forming a sidewall insulating layer on at least a part of an inner wall of the joint hole;
forming a second stacked body in which a plurality of third insulating layers which are a same type as the first insulating layer and a plurality of fourth insulating layers that are a same type as the second insulating layer are alternately stacked on the joint layer; and forming a second memory hole penetrating the second stacked body and communicating with the joint hole of the joint layer, wherein:
when the sidewall insulating layer is formed,
enlarging a diameter of an upper part of the joint hole;
forming the sidewall insulating layer on an inner wall surface of a lower part and the enlarged upper part of the joint hole; and
forming the joint hole having the sidewall insulating layer in the upper part and the lower part.
3. The method of manufacturing a semiconductor memory device according to claim 2 , wherein,
when the second memory hole is formed,
forming the second memory hole such that a lower end of the second memory hole is located in an area partitioned by the enlarged joint hole.