Cleaning apparatus and substrate processing apparatus
A cleaning apparatus includes a plurality of processing units including a cleaning unit which cleans a processing object, a transport chamber provided between the plurality of processing units, a transport robot provided inside the transport chamber so as to be movable vertically, an exhaust port portion which discharges gas compressed, when the transport robot descends, from a lower portion of the transport chamber, and a liquid remaining unit which causes liquid transported to the compressed gas to remain in the lower portion of the transport chamber.
1. A cleaning apparatus, comprising:
a plurality of processing units comprising a cleaning unit which cleans a processing object;
a transport chamber provided between the plurality of processing units;
a transport robot provided inside the transport chamber so as to be movable vertically;
an exhaust port portion which discharges gas compressed, when the transport robot descends, from a lower portion of the transport chamber; and
a liquid remaining unit which causes liquid transported to the compressed gas to remain in the lower portion of the transport chamber,
wherein the exhaust port portion opens on a bottom surface of the transport chamber,
wherein the liquid remaining unit comprises a jetty of a projecting shape provided upright between the bottom surface of the transport chamber and the exhaust port portion and a roof of a recessed shape facing the jetty with a gap therebetween, and
wherein the roof is inclined downward from the exhaust port portion toward the bottom surface of the transport chamber.
2. The cleaning apparatus according to claim 1 , wherein the roof has a gap adjuster which adjusts a size of the gap from the jetty.
3. The cleaning apparatus according to claim 1 , further comprising a gas supplier which supplies gas from an upper portion to the lower portion of the transport chamber.
4. The cleaning apparatus according to claim 3 ,
wherein the plurality of processing units comprises:
a first processing unit communicating with the transport chamber via a first communicating hole; and
a second processing unit communicating with the transport chamber via a second communicating hole below the first processing unit, and
the exhaust port has a size that substantially equalizes a flow rate of the gas, supplied from the gas supplier, exhausted from the first communicating hole and a flow rate of the gas exhausted from the second communicating hole.
5. The cleaning apparatus according to claim 1 , further comprising a transport chamber interior cleaner which cleans an inside of the transport chamber.
6. The cleaning apparatus according to claim 5 , wherein the transport chamber interior cleaner has a nozzle capable of jetting out liquid toward a side wall surface of the transport chamber.
7. The cleaning apparatus according to claim 5 , wherein the transport chamber interior cleaner further comprises a nozzle-moving device which moves the nozzle between a transport chamber interior cleaning position where the nozzle is directed toward a side wall surface of the transport chamber and a transport robot cleaning position where the nozzle is directed toward the transport robot.
8. A substrate processing apparatus, comprising:
a polisher which polishes a substrate; and
a cleaner which cleans the substrate,
wherein the substrate processing apparatus comprises the cleaning apparatus according to claim 1 as the cleaner.
9. A cleaning apparatus, comprising:
a plurality of processing units comprising a cleaning unit which cleans a processing object;
a transport chamber provided between the plurality of processing units;
a transport robot provided inside the transport chamber so as to be movable vertically;
an exhaust port portion which discharges gas compressed, when the transport robot descends, from a lower portion of the transport chamber; and
a liquid remaining unit which causes liquid transported to the compressed gas to remain in the lower portion of the transport chamber,
wherein the exhaust port portion opens on a bottom surface of the transport chamber,
wherein the liquid remaining unit comprises a jetty of a projecting shape provided upright between the bottom surface of the transport chamber and the exhaust port portion and a roof of a recessed shape facing the jetty with a gap therebetween, and
wherein the roof has a gap adjuster which adjusts a size of the gap from the jetty.
10. A cleaning apparatus, comprising:
a plurality of processing units comprising a cleaning unit which cleans a processing object;
a transport chamber provided between the plurality of processing units;
a transport robot provided inside the transport chamber so as to be movable vertically;
an exhaust port portion which discharges gas compressed, when the transport robot descends, from a lower portion of the transport chamber;
a liquid remaining unit which causes liquid transported to the compressed gas to remain in the lower portion of the transport chamber; and
a transport chamber interior cleaner which cleans an inside of the transport chamber,
wherein the transport chamber interior cleaner has a nozzle comprising a jetting-out port portion which opens toward a side wall surface of the transport chamber and which is capable of jetting out liquid toward the side wall surface of the transport chamber.
11. The cleaning apparatus according to claim 10 , wherein the transport chamber interior cleaner further comprises a nozzle-moving device which moves the nozzle between a transport chamber interior cleaning position where the nozzle is directed toward a side wall surface of the transport chamber and a transport robot cleaning position where the nozzle is directed toward the transport robot.
12. The cleaning apparatus according to claim 11 , wherein the nozzle-moving device rotates around an axis of the nozzle to move the nozzle between the transport chamber interior cleaning position and a transport robot cleaning position.