Method for producing bonded SOI wafer
A method for producing a bonded SOI wafer by bonding a bond wafer and a base wafer, each being formed of a silicon single crystal, together with a silicon oxide film placed therebetween, the method including: preparing, as the base wafer, a silicon single crystal wafer whose resistivity is 100 Ω·cm or more and initial interstitial oxygen concentration is 10 ppma or less; forming, on the front surface of the base wafer, a silicon oxide film by performing, on the base wafer, heat treatment in an oxidizing atmosphere at a temperature of 700° C. or higher and 1000° C. or lower for 5 hours or more; bonding the base wafer and the bond wafer together with the silicon oxide film placed therebetween; and thinning the bonded bond wafer to form an SOI layer.
1. A method for producing a bonded SOI wafer by bonding a bond wafer and a base wafer, each being formed of a silicon single crystal, together with a silicon oxide film placed therebetween, comprising:
preparing, as the base wafer, a silicon single crystal wafer whose resistivity is 100 Ω·cm or more, initial interstitial oxygen concentration is 10 ppma or less, and nitrogen concentration is 1×10 13 to 1×10 15 atoms/cm 3 ;
forming, on a front surface of the base wafer, a silicon oxide film for a BOX film whose thickness is 1 μm or more by performing, on the base wafer, heat treatment in an oxidizing atmosphere at a temperature of 700° C. or higher and 1000° C. or lower for 5 hours or more, the heat treatment doubling as annihilation of NO donors associated with nitrogen doping;
bonding the base wafer and the bond wafer together with the silicon oxide film placed therebetween; and
thinning the bonded bond wafer to form an SOI layer.
2. The method according to claim 1 , wherein the resistivity is 1000 Ω·cm or more.
3. The method according to claim 1 , wherein the resistivity is 3000 Ω·cm or more.
4. The method according to claim 1 , wherein the resistivity is 7500 Ω·cm or more.
5. The method according to claim 1 , wherein the nitrogen concentration is 8×10 13 to 1×10 15 atoms/cm 3 .
6. The method according to claim 1 , wherein the method does not include an additional separate heat treatment step for annihilating the NO donors associated with the nitrogen doping.