IP Library › Granted Patent US 11,071,873
Granted Patent B2
US 11,071,873 · App. 16/439,083 · Granted Jul 27, 2021

Treatment apparatus using high frequency waves and method for controlling same

Inventor: Kwang Chon Ko (Gyeonggi-do, KR)
Assignee: Lutronic Corporation
A61N1/40A61B5/0531A61B5/6848A61B18/1477A61H39/002A61H99/00A61N1/06A61N1/328A61B2018/0047A61B2018/00875A61B2018/143A61B2562/046A61H2039/005A61H2201/0157A61H2230/655
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Quick Facts
Patent No.
US 11,071,873
App. No.
16/439,083
Granted
Jul 27, 2021
Kind
B2
Abstract

The present invention relates to a treatment apparatus using high frequency waves, and to a method for controlling same. The treatment apparatus using high frequency waves comprises: a high frequency wave generating unit; a plurality of needles for providing, into the skin of a user, high frequency energy transferred from the high frequency wave generating unit; and a driving unit for inserting the plurality of needles into the skin of the user, wherein the apparatus further comprises a control unit for controlling the driving unit such that the plurality of needles are inserted into a first target point within the skin and then move to a second target point.

Claims (30)

1. A treatment method using a RF treatment apparatus, the treatment method comprising:

inserting a plurality of needles to a first depth in a subcutaneous area;

providing RF energy to the first depth of the subcutaneous area through ends of the plurality of needles based on a measured impedance of the first depth;

locating the plurality of needles to a second depth in the subcutaneous area; and

providing RF energy to the second depth of the subcutaneous area through ends of the plurality of needles based on a measured impedance of the second depth.

2. The treatment method of claim 1 , wherein an output of RF energy provided to the first depth is different from an output of RF energy provided to the second depth.

3. The treatment method of claim 1 , wherein the measured impedance of the first depth is different from the measured impedance of the second depth.

4. The treatment method of claim 1 , wherein the step for providing RF energy to the first depth of the subcutaneous area further comprises:

measuring the impedance of the first depth in the subcutaneous area; and

selecting RF energy for providing into the first depth corresponding to the measured impedance of the first depth.

5. The treatment method of claim 1 , wherein the step for providing RF energy to the second depth of the subcutaneous area further comprises:

measuring the impedance of the second depth in the subcutaneous area; and

selecting RF energy for providing into the second depth corresponding to the measured impedance of the second depth.

6. The treatment method of claim 1 , further comprising a step for terminating RF energy delivery to the first depth before locating the end of the plurality of needles to the second depth.

7. The treatment method of claim 1 , wherein the impedance of the first depth or the impedance of the second depth is measured by using a current flow through the plurality of needles.

8. A treatment method comprising inserting a plurality of needles into a subcutaneous area and providing RF energy through the pulrality of needles, the treatment method further comprising:

providing RF energy at a first depth of the subcutaneous area based on an impedance of the first depth; and

providing RF energy at a second depth of the subcutaneous area based on an impedance of the second depth.

9. The treatment method of claim 8 , wherein a parameter of RF energy provided to the first depth is different from a parameter of RF energy provided to the second depth.

10. The treatment method of claim 8 , wherein the impedance of the first depth is different from the impedance of the second depth.

11. The treatment method of claim 8 , wherein the step for providing RF energy at the first depth comprises:

inserting the plurality of needles into the first depth;

measuring the impedance of the first depth in the subcutaneous area;

selecting a parameter of RF energy for the first depth based on the measured impedance of the first depth; and

providing RF energy with the selected parameter at the first depth.

12. The treatment method of claim 8 , wherein the step for providing RF energy at the second depth comprises:

inserting the plurality of needles into the second depth;

measuring the impedance of the second depth in the subcutaneous area;

selecting a parameter of RF energy for the second depth based on the measured impedance of the second depth; and

providing RF energy with the selected parameter at the second depth.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 11, 2019
From: KO, KWANG CHON
To: LUTRONIC CORPORATION
Reel/Frame 049722/0951 →
Priority Claims (1)
KR 10-2011-0074202 · Jul 26, 2011 · national
Continuity (5)
Continuation 16022201 · Jun 28, 2018
Continuation 15664522 · Jul 31, 2017
Continuation 15167467 · May 27, 2016
Continuation 14234864
Related Publication 20190290926A1 · Sep 26, 2019
Cited By (1)
US 12,722,019