IP Library › Granted Patent US 11,075,053
Granted Patent B2
US 11,075,053 · App. 16/667,590 · Granted Jul 27, 2021

Charged particle source

Inventor: Shuai Li (Fremont, CA)
Assignee: ASML Netherlands B.V.
H01J37/143H01J3/20H01J37/063H01J37/065H01J37/09H01J37/14H01J37/28H01J2237/0453H01J2237/063H01J2237/0653H01J2237/06308H01J2237/06375H01J2237/083H01J2237/141H01J2237/1415H01J2237/2806H01J2237/2817
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Quick Facts
Patent No.
US 11,075,053
App. No.
16/667,590
Granted
Jul 27, 2021
Kind
B2
Abstract

This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Claims (27)

1. A method for providing an electron source for an electron beam inspection tool, comprising:

providing, with an emitter, an electron beam along an optical axis of the electron beam inspection tool;

extracting, with an extraction electrode, the electron beam from a tip of the emitter; and

generating, with a magnetic lens, a magnetic field between the tip of the emitter and the extraction electrode, wherein a strength of the magnetic field increases to a peak point away from the tip of the emitter toward the extraction electrode.

2. The method of claim 1 , wherein the strength of the magnetic field is near or at zero at the tip of the emitter.

3. The method of claim 2 , wherein the strength of the magnetic field increases along the optical axis away from the tip of the emitter until to the peak point.

4. The method of claim 3 , wherein the strength of the magnetic field decreases along the optical axis after the peak point proximate to the extraction electrode.

5. The method of claim 4 , wherein the strength of the magnetic field is near or at zero at the extraction electrode.

6. The method of claim 3 , wherein the tip of the emitter is a portion of the emitter from which a plurality of electrons are emitted to form the electron beam, and the tip of the emitter is on an emitting plane which is perpendicular to the optical axis.

7. The method of claim 6 , wherein the magnetic lens is located on the emitting plane.

8. The method of claim 7 , wherein the magnetic lens comprises a permanent magnet.

9. The method of claim 7 , wherein the magnetic lens comprises an excitation coil.

10. The method of claim 9 , further comprising:

applying an electric current to the excitation coil to generate the magnetic field.

11. An electron source for an electron beam inspection tool, comprising:

an emitter configured to provide an electron beam along an optical axis of the electron beam inspection tool;

an extraction electrode configured to extract the electron beam from a tip of the emitter; and

a magnetic lens configured to generate a magnetic field between the tip of the emitter and the extraction electrode, wherein a strength of the magnetic field increases to a peak point away from the tip of the emitter toward the extraction electrode.

12. The electron source of claim 11 , wherein the strength of the magnetic field is near or at zero at the tip of the emitter.

13. The electron source of claim 12 , wherein the strength of the magnetic field increases along the optical axis away from the tip of the emitter until to the peak point.

14. The electron source of claim 13 , wherein the strength of the magnetic field decreases along the optical axis after the peak point proximate to the extraction electrode.

15. The electron source of claim 14 , wherein the strength of the magnetic field is near or at zero at the extraction electrode.

16. The electron source of claim 13 , wherein the tip of the emitter is a portion of the emitter from which a plurality of electrons are emitted to form the electron beam, and the tip of the emitter is on an emitting plane which is perpendicular to the optical axis.

17. The electron source of claim 16 , wherein the magnetic lens is located on the emitting plane.

18. The electron source of claim 17 , wherein the magnetic lens comprises a permanent magnet.

19. The electron source of claim 17 , wherein the magnetic lens comprises an excitation coil.

20. The electron source of claim 19 , wherein an electric current is applied to the excitation coil to generate the magnetic field.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 14, 2020
From: HERMES MICROVISION, INC.
To: HERMES MICROVISION INCORPORATED B.V.
Reel/Frame 051512/0949 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 14, 2020
From: HERMES MICROVISION INCORPORATED B.V.
To: ASML NETHERLANDS B.V.
Reel/Frame 051513/0012 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 14, 2020
From: LI, SHUAI
To: HERMES MICROVISION INC.
Reel/Frame 051512/0801 →
Continuity (5)
Continuation 16042871 · Jul 23, 2018
Continuation 15404618 · Jan 12, 2017
Division 14964221 · Dec 9, 2015
Provisional Application 62089609 · Dec 9, 2014
Related Publication 20200126753A1 · Apr 23, 2020