Semiconductor structure
The present disclosure provides a semiconductor structure. The semiconductor includes a substrate, a block bonded on the substrate, a first die bonded on the block, a second die disposed over the first die, and a heat spreader covering the block and having a surface facing toward and proximal to the block. A thermal conductivity of the heat spreader is higher than a thermal conductivity of the block.
1. A semiconductor structure, comprising:
a substrate;
a block bonded on the substrate;
a first die bonded on the block;
a second die disposed over the first die;
a heat spreader covering the block and having a surface facing toward and proximal to the block; and
a thermal interface material (TIM) disposed between the first die and the heat spreader,
wherein
the first die includes a surface exposed from the second die from a top view perspective,
the TIM is in contact with the exposed surface of the first die and the surface of the heat spreader, and is in contact with a sidewall of at least one the first die or the second die; and
a thermal conductivity of the heat spreader is higher than a thermal conductivity of the TIM.
2. The semiconductor structure of claim 1 , wherein the TIM is disposed over the second die and separated from the block.
3. The semiconductor structure of claim 1 , wherein the first die is bonded on a surface of the block, and a portion of the surface of the block exposed from the first die faces toward the surface of the heat spreader.
4. The semiconductor structure of claim 1 , wherein the surface of the heat spreader faces towards and is separated from the substrate.
5. The semiconductor structure of claim 1 , further comprising:
a cavity disposed between the heat spreader and the substrate and surrounding the block.
6. The semiconductor structure of claim 5 , wherein the cavity further surrounds the first die and the second die.
7. The semiconductor structure of claim 5 , wherein a portion of a top surface of the block is exposed in the cavity.
8. The semiconductor structure of claim 1 , wherein the first die is disposed between the TIM and the block.
9. The semiconductor structure of claim 3 , wherein the portion of the surface of the block exposed from the first die is exposed into air.
10. The semiconductor structure of claim 1 , wherein the TIM is disposed between the second die and the heat spreader.
11. The semiconductor structure of claim 10 , wherein the heat spreader includes a sidewall facing toward and proximal to the sidewall of the second die, and the TIM is in contact with the sidewall of the second die and the sidewall of the heat spreader.
12. The semiconductor structure of claim 1 , wherein the heat spreader includes an inner surface facing a top surface of the first die and a sidewall of the second die.
13. The semiconductor structure of claim 1 , wherein a thermal conductivity of the heat spreader is between about 150 W/mK and about 450 W/mK.
14. The semiconductor structure of claim 1 , wherein the heat spreader comprises a material selected from a group consisting of aluminum, copper, copper alloy, copper tungsten, aluminum-silicon-carbide, graphite, and aluminum silicon carbide composite.
15. The semiconductor structure of claim 1 , wherein a thermal conductivity of the TIM is between about 1 W/mK and about 10 W/mK.
16. The semiconductor structure of claim 1 , further comprising:
a plurality of conductors, disposed between and electrically connecting the block and the substrate.
17. The semiconductor structure of claim 1 , further comprising:
a bonding material, bonding the heat spreader on the substrate, wherein the bonding material surrounds the block.
18. A semiconductor structure, comprising:
a substrate;
a block disposed over the substrate;
a die stack disposed over the block, the die stack comprising a plurality of dies;
a heat spreader disposed over the substrate, the heat spreader having a surface facing the block; and
a thermal interface material (TIM) disposed between the die stack and the heat spreader,
wherein
a bottommost die of the plurality of dies of the die stack includes a surface exposed from the other dies from a top view perspective,
the TIM is in contact with the exposed surface of the bottommost die and the surface of the heat spreader, and is in contact with a sidewall of at least one of the plurality of dies of the die stack; and
a thermal conductivity of the heat spreader is higher than a thermal conductivity of the TIM.
19. The semiconductor structure of claim 18 , wherein the TIM is conformal to a topography of the die stack.
20. A semiconductor structure, comprising:
a substrate;
a block disposed over the substrate;
a die stack comprising a plurality of dies disposed over the block;
a heat spreader covering the block and having a surface facing the block;
a thermal interface material (TIM) disposed between the heat spreader and the die stack; and
a cavity disposed between the heat spreader and the substrate and surrounding the block;
wherein
a bottommost die of the plurality of dies of the die stack includes a surface exposed from the other dies from a top view perspective,
the TIM is in contact with the exposed surface of the bottommost die and the surface of the heat spreader, and is in contact with a sidewall of at least one of the plurality of dies of the die stack; and
a thermal conductivity of the heat spreader is higher than a thermal conductivity of the TIM and a thermal conductivity of the block.