Etching composition and method for manufacturing semiconductor device using the same
Provided are an etching composition and a method for manufacturing a semiconductor device using the same. According to embodiments, the etching composition may comprise from about 15 wt % to about 75 wt % of peracetic acid; a fluorine compound; an amine compound; and an organic solvent.
1. An etching composition, comprising:
a peracetic acid mixture including peracetic acid, acetic acid, and hydrogen peroxide;
a fluorine compound;
an amine compound including at least one among an aliphatic amine of 1 to 12 carbon atoms and a cyclic amine of 5 to 12 carbon atoms;
an organic solvent; and
wherein the peracetic acid is from about 15 wt % to about 75 wt % of the etching composition and from about 40 wt % to about 60 wt % of the peracetic acid mixture,
wherein a composition ratio of the organic solvent is from about 5 wt % to about 12 wt %, and
wherein the amine compound does not include alkanolamine.
2. The etching composition of claim 1 , wherein a composition ratio of the amine compound is from about 0.01 wt % to about 5 wt %.
3. The etching composition of claim 1 , wherein the organic solvent comprises at least one selected from a carboxylic acid compound of 1 to 5 carbon atoms and an alcohol compound of 1 to 10 carbon atoms.
4. The etching composition of claim 1 , wherein the organic solvent comprises an acetate compound of 1 to 10 carbon atoms.
5. The etching composition of claim 1 , further comprising water.
6. The etching composition of claim 1 , further comprising an aging catalyst, wherein the aging catalyst comprises at least one among sulfuric acid and methanesulfonic acid.
7. An etching composition comprising:
a peracetic acid mixture including peracetic acid, acetic acid, and hydrogen peroxide;
a fluorine compound;
from about 0.01 wt % to about 5 wt % of an amine compound; and
an organic solvent,
wherein the peracetic acid is from about 40 wt % to about 60 wt % of the peracetic acid mixture,
wherein a composition ratio of the organic solvent is from about 5 wt % to about 12 wt %, and
wherein the amine compound is free of hydroxy group.
8. The etching composition of claim 7 ,
wherein a composition ratio of the peracetic acid is from about 15 wt % to about 75 wt %.
9. The etching composition of claim 7 , wherein the amine compound comprises at least one among an aliphatic amine of 1 to 12 carbon atoms and a cyclic amine of 5 to 12 carbon atoms.
10. The etching composition of claim 7 , wherein the organic solvent comprises an acetate compound of 1 to 10 carbon atoms.
11. The etching composition of claim 7 , further comprising water.
12. The etching composition of claim 7 ,
wherein the organic solvent comprises at least one among an alcohol compound of 1 to 10 carbon atoms and a carboxylic acid compound of 1 to 5 carbon atoms,
wherein a composition ratio of the fluorine compound is from about 0.01 wt % to about 5 wt %, and
wherein the fluorine compound comprises at least one among hydrofluoric acid (HF), sodium fluoride (NaF), potassium fluoride (KF), aluminum fluoride (AlF 2 ), lithium fluoride (LiF 4 ), calcium fluoride (CaF 3 ), sodium hydrogen hexafluoride (NaHF 6 ), ammonium fluoride (NH 4 F), ammonium difluoride (NH4HF 2 ), tetramethylammonium fluoride ((CH 3 ) 4 NF), potassium bifluoride (KHF 2 ), tetrafluoroboric acid (HBF 4 ), ammonium tetrafluoroborate (NH 4 BF 4 ), potassium fluoroborate (KBF 4 ), and fluorosilicic acid (H 2 SiF 6 ).
13. An etching composition, comprising:
a peracetic acid mixture including peracetic acid, acetic acid, and hydrogen peroxide;
from about 0.01 wt % to about 5 wt % of a fluorine compound;
from about 0.01 wt % to about 5 wt % of an amine compound;
from about 5 wt % to about 12 wt % of an organic solvent; and
an aging catalyst comprising at least one among sulfuric acid and methanesulfonic acid,
wherein the peracetic acid is from about 15 wt % to about 75 wt % of the etching composition and from about 40 wt % to about 60 wt % of the peracetic acid mixture,
wherein the organic solvent comprises an acetate compound of 1 to 10 carbon atoms,
wherein the amine compound comprises at least one among an aliphatic amine of 1 to 12 carbon atoms and a cyclic amine of 5 to 12 carbon atoms, and
wherein the amine compound does not include hydroxyl group.
14. The etching composition of claim 13 ,
wherein the fluorine compound is hydrofluoric acid,
wherein the amine compound is one of the 4-picoline, 1,3-diaminopropane, propylamine, and 4,4-methylpiperidine, and
wherein the organic solvent is octyl acetate.
15. The etching composition of claim 1 ,
wherein the amine compound is one of the 4-picoline, 1,3-diaminopropane, propylamine, and 4,4-methylpiperidine.