Manufacturing method of memory device
A memory device and a manufacturing method thereof are provided. The memory device includes a word line, a bit line, an active region and a bit line contact structure. The word line is disposed in the substrate, and extends along a first direction. The bit line is disposed over the substrate, and extends along a second direction. The active region is disposed in the substrate, and extends along a third direction. The bit line contact structure is disposed between the active region and the bit line. A top view pattern of the bit line contact structure has a long axis. An angle between the extending direction of this long axis and the third direction is less than an angle between the extending direction of this long axis and the first direction, and is less than an angle between the extending direction of this long axis and the second direction.
1. A method of manufacturing a memory device, comprising:
forming an active region, a word line, and an initial bit line contact structure in a substrate; and
forming a bit line on the substrate, and removing a portion of the initial bit line contact structure not overlapped with the bit line to form a bit line contact structure,
wherein the word line extends along a first direction, the bit line extends along a second direction intersected with the first direction, the active region is intersected with the word line and the bit line and extends along a third direction different from the first direction and the second direction, and the bit line contact structure is disposed between the active region and the bit line, and
wherein a lithography process for forming the initial bit line contact structure comprises using a free-form lens array to allow a light pass through the free-form lens array before the light is incident on a photomask, the free-form lens array comprises a plurality of lenses arranged along a parallelogram-like contour having a long axis, an angle between an extending direction of the long axis and the third direction is less than an angle between the extending direction of the long axis and the first direction and is less than an angle between the extending direction of the long axis and the second direction.
2. The method of manufacturing the memory device according to claim 1 , wherein a shape of a physical portion or an opening portion of the photomask is different from an arrangement shape of the plurality of lenses, and the physical portion or the opening portion is used for defining the initial bit line contact structure.
3. The method of manufacturing the memory device according to claim 2 , wherein the shape of the physical portion or the opening portion of the photomask is substantially a rectangular shape, and the physical portion or the opening portion of the photomask has a length direction substantially parallel to the first direction and a width direction substantially parallel to the second direction.
4. The method of manufacturing the memory device according to claim 1 , wherein the initial bit line contact structure is disposed on a portion of the active region on a side of the word line, a top view pattern of the portion of the active region is substantially a parallelogram and has a long diagonal and a short diagonal intersected with each other, and wherein a long axis of the initial bit line contact structure is substantially overlapped with the long diagonal of the portion of the active region.
5. The method of manufacturing the memory device according to claim 4 , wherein the initial bit line contact structure completely covers the portion of the active region.
6. The method of manufacturing the memory device according to claim 4 , wherein a top view pattern of the initial bit line contact structure is a parallelogram-like shape and has an arc-shaped contour.
7. The method of manufacturing the memory device according to claim 1 , wherein the initial bit line contact structure extends along the first direction to opposite sides of the active region.
8. The method of manufacturing the memory device according to claim 1 , further comprising forming a trench isolation structure in the substrate before forming the bit line and the bit line contact structure, wherein the trench isolation structure surrounds the active region, and an edge portion of the initial bit line contact structure extends to the trench isolation structure.