Marking pattern in forming staircase structure of three-dimensional memory device
Embodiments of a marking pattern in forming the staircase structure of a three-dimensional (3D) memory device are provided. In an example, a semiconductor device includes a stack structure having a plurality of insulating layers and a plurality of conductor layers arranged alternatingly over a substrate along a vertical direction. In some embodiments, the semiconductor device also includes a marking pattern having a plurality of interleaved layers of different materials over the substrate and neighboring the stack structure. The marking pattern includes a central marking structure located in a marking area, the central marking structure dividing the marking area into a first marking sub-area farther from the stack structure and a second marking sub-area closer to the stack structure, a first pattern density of the first marking sub-area being higher than or equal to a second pattern density of the second marking sub-area.
1. A semiconductor device comprising:
a stack structure comprising a plurality of insulating layers and a plurality of conductor layers arranged alternatingly over a substrate along a vertical direction; and
a marking pattern having a plurality of interleaved layers of different materials over the substrate and neighboring the stack structure, wherein:
the marking pattern comprises a central marking structure located in a marking area, the central marking structure is a single stack consisting of the plurality of interleaved layers of different materials and dividing the marking area into a first marking sub-area farther from the stack structure and a second marking sub-area closer to the stack structure, and
a first pattern density of the first marking sub-area is higher than or equal to a second pattern density of the second marking sub-area.
2. The semiconductor device of claim 1 , wherein
the first marking sub-area comprises at least one first marking structure and the second marking sub-area comprises at least one second marking structure;
a number of the at least one first marking structure is greater than or equal to a number of the at least one second marking structure; and
each of the central marking structure, the at least one first marking structure, and the at least one second marking structure comprises the plurality of interleaved layers of a first material and a second material, the first material being different from the second material.
3. The semiconductor device of claim 2 , wherein
the first pattern density of the first marking sub-area is equal to the second pattern density of the second marking sub-area; and
the at least one first marking structure and the at least one second marking structure are symmetrically distributed on opposite sides of the central marking structure along a horizontal direction.
4. The semiconductor device of claim 3 , wherein the number of the at least one first marking structure is equal to the number of the at least one second marking structure.
5. The semiconductor device of claim 4 , wherein
the at least one first marking structure and the at least one second marking structure have same shapes and same dimensions;
the central marking structure and the at least one first marking structure are evenly arranged along the horizontal direction by a same distance in the first marking sub-area; and
the central marking structure and the at least one second marking structure are evenly arranged along the horizontal direction by the same distance in the second marking sub-area.
6. The semiconductor device of claim 2 , wherein
the first pattern density of the first marking sub-area is greater than the second pattern density of the second marking sub-area; and
the at least one first marking structure and the at least one second marking structure are asymmetrically distributed on opposite sides of the central marking structure along the horizontal direction.
7. The semiconductor device of claim 6 , wherein the number of the at least one first marking structure is greater than the number of the at least one second marking structure.
8. The semiconductor device of claim 7 , wherein
the at least one first marking structure and the at least one second marking structure have same shapes and same dimensions; and
along the horizontal direction, a distance between two of the at least one first marking structure is less than a distance between two of the at least one second marking structure.
9. The semiconductor device of claim 8 , wherein along the horizontal direction, the central marking structure and the at least one first marking structure are evenly distributed by a first distance in the first marking sub-area, and the central marking structure and the at least one second marking structure are evenly distributed by a second distance in the second marking sub-area, the first distance being less than the second distance.
10. The semiconductor device of claim 1 , wherein the stack structure comprises a staircase structure, each of the plurality of insulating layers and a corresponding conductor layer forming a staircase of the staircase structure.
11. The semiconductor device of claim 10 , wherein a height of the central marking structure is equal to a thickness of at least one staircase along the vertical direction.
12. A semiconductor device comprising:
a stack structure comprising a plurality of insulating layers and a plurality of conductor layers arranged alternatingly over a substrate along a vertical direction; and
a marking pattern having a plurality of interleaved layers of different materials over the substrate and neighboring the stack structure, wherein:
the marking pattern comprises a plurality of marking structures disconnected from one another and located in a marking area, and
the plurality of marking structures comprising a central marking structure dividing the marking area into a first marking sub-area farther from the stack structure and a second marking sub-area closer to the stack structure, a first pattern density of the first marking sub-area being higher than or equal to a second pattern density of the second marking sub-area.
13. The semiconductor device of claim 12 , wherein
the first marking sub-area comprises at least one first marking structure, and the second marking sub-area comprises at least one second marking structure;
a number of the at least one first marking structure is greater than or equal to a number of the at least one second marking structure; and
each of the central marking structure, the at least one first marking structure, and the at least one second marking structure comprises the plurality of interleaved layers of a first material and a second material, the first material being different from the second material.
14. The semiconductor device of claim 13 , wherein
the first pattern density of the first marking sub-area is equal to the second pattern density of the second marking sub-area; and
the at least one first marking structure and the at least one second marking structure are symmetrically distributed on opposite sides of the central marking structure along a horizontal direction.
15. The semiconductor device of claim 14 , wherein
the number of the at least one first marking structure is equal to the number of the at least one second marking structure;
the at least one first marking structure and the at least one second marking structure have same shapes and same dimensions;
the central marking structure and the at least one first marking structure are evenly arranged along the horizontal direction by a same distance in the first marking sub-area; and
the central marking structure and the at least one second marking structure are evenly arranged along the horizontal direction by the same distance in the second marking sub-area.
16. The semiconductor device of claim 13 , wherein
the first pattern density of the first marking sub-area is greater than the second pattern density of the second marking sub-area; and
the at least one first marking structure and the at least one second marking structure are asymmetrically distributed on opposite sides of the central marking structure along the horizontal direction.
17. The semiconductor device of claim 16 , wherein
the number of the at least one first marking structure is greater than the number of the at least one second marking structure;
the at least one first marking structure and the at least one second marking structure have same shapes and same dimensions; and
along the horizontal direction, a distance between two of the at least one first marking structure is less than a distance between two of the at least one second marking structure.
18. A semiconductor device comprising:
a stack structure comprising a plurality of insulating layers and a plurality of conductor layers arranged alternatingly over a substrate along a vertical direction; and
a marking pattern consisting of a plurality of interleaved layers of different materials over the substrate and neighboring the stack structure, wherein:
the marking pattern comprises a plurality of marking structures each being a single stack of the different materials,
the plurality of marking structures comprises a central marking structure located in a marking area, the central marking structure dividing the marking area into a first marking sub-area farther from the stack structure and a second marking sub-area closer to the stack structure, a first pattern density of the first marking sub-area being higher than or equal to a second pattern density of the second marking sub-area.
19. The semiconductor device of claim 18 , wherein
the first marking sub-area comprises at least one first marking structure, and the second marking sub-area comprises at least one second marking structure;
a number of the at least one first marking structure is greater than or equal to a number of the at least one second marking structure; and
each of the central marking structure, the at least one first marking structure, and the at least one second marking structure comprises the plurality of interleaved layers of a first material and a second material, the first material being different from the second material.
20. The semiconductor device of claim 19 , wherein
the first pattern density of the first marking sub-area is equal to the second pattern density of the second marking sub-area; and
the at least one first marking structure and the at least one second marking structure are symmetrically distributed on opposite sides of the central marking structure along a horizontal direction.